Fabrication of multilayer circuit elements

Patent metadata

Field	Value
Publication number	US-2016013262-A1
Application number	US-201414326659-A
Country	US
Kind code	A1
Filing date	Jul 9, 2014
Priority date	Jul 9, 2014
Publication date	Jan 14, 2016
Grant date	—

Abstract

Wafer-level methods of forming circuit elements, such as multilayer inductors or transformers, are provided. The methods include, for instance: forming, in at least one layer above a substrate, at least one conductive portion of the circuit element; providing an uncured polymer-dielectric material surrounding, at least in part, and overlying the conductive portion(s) of the element; partially curing the polymer-dielectric material to obtain a partially-hardened, polymer-dielectric material; and polishing the partially-hardened, polymer-dielectric material down to the conductive portion(s). The polishing planarizes the partially-hardened, polymer-dielectric material and exposes an upper surface of the conductive portion(s) to facilitate forming at least one other conductive portion of the element above and in electrical contact with the conductive portion(s). After polishing, curing of the polymer-dielectric material is completed. In one embodiment, the conductive portion(s) and the other conductive portion(s) define, at least in part, a conductive coil(s) of the element.

First claim

What is claimed is:

1 . A method comprising:
forming a circuit element above a substrate, the forming comprising:
forming, in at least one layer above the substrate, at least one conductive portion of the circuit element;
providing an uncured polymer-dielectric material surrounding, at least in part, and overlying the at least one conductive portion of the circuit element;
partially curing the polymer-dielectric material to obtain a partially-hardened, polymer-dielectric material;
polishing the partially-hardened, polymer-dielectric material down to the at least one conductive portion of the circuit element; and
forming at least one other conductive portion of the circuit element above and in electrical contact with the at least one conductive portion of the circuit element.

2 . The method of claim 1 , further comprising, subsequent to the polishing, completing curing of the polymer-dielectric material to obtain a hardened polymer-dielectric material, the hardened polymer-dielectric material surrounding, at least in part, the at least one conductive portion of the circuit element, and having an upper surface coplanar with an upper surface of the at least one conductive portion of the circuit element.

3 . The method of claim 2 , further comprising depositing a dielectric material layer over the hardened polymer-dielectric material, and providing and patterning a magnetic material layer over the dielectric material layer and above the at least one conductive portion of the circuit element prior to forming the at least one other conductive portion of the circuit element.

4 . The method of claim 1 , wherein the at least one conductive portion comprises a lower conductive portion of the circuit element, and wherein the polishing further planarizes an upper surface of the lower conductive portion.

5 . The method of claim 4 , wherein the at least one other conductive portion of the circuit element comprises a conductive vias portion of the circuit element in contact with the lower conductive portion.

6 . The method of claim 5 , wherein the circuit element comprises one of a multilayer inductor or a multilayer transformer, and the method further comprises providing a magnetic material layer above the lower conductive portion of the circuit element, the magnetic material layer residing, at least partially, within a region defined by the conductive vias portion of the circuit element.

7 . The method of claim 5 , wherein forming the conductive vias portion of the circuit element comprises, at least in part, forming the conductive vias portion by electroplating above the lower conductive portion of the circuit element.

8 . The method of claim 5 , further comprising, subsequent to forming the conductive vias portion of the circuit element, providing another layer of the uncured polymer-dielectric material surrounding, at least in part, and overlying the conductive vias portion of the circuit element, partially hardening the another layer of uncured polymer-dielectric material over the conductive vias portion of the circuit element to obtain a partially-hardened, upper polymer-dielectric material, and polishing the partially-hardened, upper polymer-dielectric material down to the conductive vias portion of the circuit element, the polishing of the partially-hardened, upper polymer-dielectric material planarizing the partially-hardened, upper polymer-dielectric material and exposing upper surfaces of the conductive vias portion of the circuit element to facilitate the forming of the circuit element.

9 . The method of claim 8 , further comprising providing an upper conductive portion of the circuit element above and in electrical contact with the conductive vias portion of the circuit element.

10 . The method of claim 9 , wherein the lower conductive portion of the circuit element comprises a lower conductive coil portion of the circuit element, and the upper conductive portion of the circuit element comprises an upper conductive coil portion of the circuit element, and wherein the lower conductive coil portion, the conductive vias portion, and the upper conductive coil portion of the circuit element form, at least in part, at least one coil which extends around the magnetic material layer above the lower conductive coil portion of the circuit element.

11 . The method of claim 1 , wherein the at least one conductive portion comprises a lower conductive portion of the circuit element, and the forming thereof comprises:
depositing a dielectric material layer over the substrate; providing a seed layer deposition over the dielectric material layer to facilitate electroplating; coating a photoresist material over the seed layer and patterning the photoresist material to define multiple channels therein; electroplating within the multiple channels to define a lower conductive coil portion of the circuit element; and removing the photoresist material and etching the seed layer.

12 . The method of claim 1 , wherein the at least one conductive portion comprises a lower conductive portion, and a conductive vias portion of the circuit element disposed over and in electrical contact with the lower conductive portion thereof, and wherein the uncured polymer-dielectric material surrounds, at least partially, and overlies the conductive vias portion of the circuit element, and wherein the polishing planarizes the partially-hardened, polymer-dielectric material and exposes an upper surface of the conductive vias portion of the circuit element to facilitate the forming of the at least one other conductive portion of the circuit element in electrical contact therewith.

13 . The method of claim 12 , wherein the at least one other conductive portion comprises an upper conductive portion of the circuit element disposed over and in electrical contact with the conductive vias portion of the circuit element.

14 . The method of claim 13 , wherein the circuit element comprises one of an inductor or a transformer, and the lower conductive portion, the conductive vias portion, and the upper conductive portion together define at least one coil of the circuit element.

15 . The method of claim 14 , further comprising providing at least one magnetic material layer disposed, at least partially, within a region defined by the at least one coil of the circuit element.

16 . The method of claim 1 , wherein the polishing comprises chemical-mechanical polishing the partially-hardened, polymer-dielectric material to planarize an upper surface thereof, and to planarize an exposed upper surface of the at least one conductive portion of the circuit element.

17 . The method of claim 1 , wherein the partially curing comprises annealing the uncured polymer-dielectric material to obtained the partially-hardened, polymer-dielectric material, and wherein the polishing comprises chemical-mechanical polishing the partially-hardened, polymer-dielectric material.

18 . The method of claim 1 , wherein the substrate comprises a semiconductor wafer.

19 . The method of claim 1 , wherein the circuit element is one of a multilayer inductor or a multilayer transformer.

20 . The method of claim 19 , wherein forming circuit element comprises forming the circuit element with a quad-flat-no-lead (QFN) outline, and dicing the substrate to separate the circuit element.

Assignees

• Globalfoundries Inc

Inventors

• England Luke
• Bhatkar Mahesh Anant
• Yi Wanbing
• Tan Juan Boon

Classifications

• H10P95/90

  Thermal treatments, e.g. annealing or sintering · CPC title

• H10P95/08

  Planarisation of organic insulating materials · CPC title

• H10P76/4083

  characterised by their behaviours during the lithography processes, e.g. soluble masks or redeposited masks · CPC title

• H10P54/00

  Cutting or separating of wafers, substrates or parts of devices · CPC title

• H10P52/403

  of conductive or resistive materials · CPC title