Dual micro-electro mechanical system and manufacturing method thereof

US12595167B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-12595167-B2
Application numberUS-202418640142-A
CountryUS
Kind codeB2
Filing dateApr 19, 2024
Priority dateOct 30, 2019
Publication dateApr 7, 2026
Grant dateApr 7, 2026

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

A micro electro mechanical system (MEMS) includes a circuit substrate, a first MEMS structure disposed over the circuit substrate, and a second MEMS structure disposed over the first MEMS structure.

First claim

Opening claim text (preview).

What is claimed is: 1 . A device, comprising: a substrate; a first structure disposed over the substrate; a second structure disposed over the first structure; and a cover disposed over the second structure, wherein the first structure includes a first capacitance sensor configured to detect movement along a first direction and a second capacitance sensor configured to detect movement along a second direction perpendicular to the first direction, the first structure includes one or more first anchors and a first proof mass, wherein the first proof mass is supported by one or more springs each connected to one of the one or more first anchors, the second structure includes a second anchor and a second proof mass, wherein the second anchor is connected to one of the one or more first anchors by a first via electrode, and the second proof mass is connected to the first proof mass by a second via electrode. 2 . The device of claim 1 , wherein an area of the first via electrode is greater than an area of the second via electrode. 3 . The device of claim 1 , wherein an area of the second via electrode is 30% to 80% of the area of the first via electrode. 4 . The device of claim 1 , wherein a bottom of the second via electrode is located at a middle of the first proof mass. 5 . The device of claim 1 , wherein the first via electrode is electrically connected to the substrate. 6 . A device, comprising: a substrate; a first structure disposed over the substrate; a second structure disposed over the first structure; and a cover disposed over the second structure, wherein the first structure includes one or more first anchors and a first proof mass and the first proof mass is supported by one or more springs each connected to one of the one or more first anchors, and one or more recesses are formed at a bottom of the first proof mass facing the substrate. 7 . The device of claim 6 , wherein each of the one or more springs has a pulse-wave shape in plan view. 8 . The device of claim 6 , wherein the second structure includes a second anchor and a second proof mass, wherein the second anchor is connected to one of the one or more first anchors by a first via electrode. 9 . The device of claim 8 , wherein the second proof mass is connected to the first proof mass by a second via electrode. 10 . The device of claim 6 , wherein: the first structure further includes a third via electrode coupled to one of the one or more first anchors different from the one of the one or more first anchors including the first via electrode, and the third via electrode is electrically connected to the substrate. 11 . A device, comprising: a substrate; a first structure disposed over the substrate; a second structure disposed over the first structure; and a cover disposed over the second structure, wherein the first structure includes: one or more of first anchors, a plurality of first electrodes arranged along a first direction and coupled to one of the one or more first anchors, and a plurality of second electrodes arranged along the first direction and coupled to a first proof mass, and wherein the first electrodes and second electrodes are alternately arranged along the first direction. 12 . The device of claim 11 , wherein the first structure further comprises a plurality of third electrodes arranged along a second direction perpendicular to the first direction and coupled to a second anchor, and a plurality of fourth electrodes arranged along the second direction and coupled to the first proof mass, and wherein the third electrodes and fourth electrodes are alternately arranged along the second direction. 13 . The device of claim 12 , wherein the second structure includes a third anchor, a second proof mass and a plurality of fifth electrodes coupled to the second anchor. 14 . The device of claim 13 , wherein the third anchor and the first anchor are coupled to the substrate by the first via electrode. 15 . The device of claim 11 , wherein the first proof mass is supported by one or more springs each connected to one of the one or more first anchors. 16 . The device of claim 15 , wherein each of the one or more springs has a pulse-wave shape in plan view. 17 . The device of claim 1 , wherein the proof mass has a frame shape in plan view. 18 . The device of claim 6 , wherein the proof mass has a frame shape in plan view. 19 . The device of claim 11 , wherein the proof mass has a frame shape in plan view. 20 . The device of claim 9 , wherein an area of the first via electrode is greater than an area of the second via electrode.

Assignees

Inventors

Classifications

  • Comb structures · CPC title

  • Comb drives · CPC title

  • removing a sacrificial layer (B81C1/00912 takes precedence) · CPC title

  • Processes for releasing structures not provided for in group B81C1/00476 · CPC title

  • Releasing structures · CPC title

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Frequently asked questions

Answers are generated from the same data shown on this page.

What does patent US12595167B2 cover?
A micro electro mechanical system (MEMS) includes a circuit substrate, a first MEMS structure disposed over the circuit substrate, and a second MEMS structure disposed over the first MEMS structure.
Who is the assignee on this patent?
Taiwan Semiconductor Mfg Company Ltd
What technology area does this patent fall under?
Primary CPC classification B81B7/04. Mapped technology areas include Operations & Transport.
When was this patent published?
Publication date Tue Apr 07 2026 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 12 related publications on this page (citations in our corpus or others sharing the same primary CPC).