Flexible optoelectronic device and process for manufacturing same

US12557440B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-12557440-B2
Application numberUS-202118016853-A
CountryUS
Kind codeB2
Filing dateJul 16, 2021
Priority dateJul 22, 2020
Publication dateFeb 17, 2026
Grant dateFeb 17, 2026

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  1. Title

    What the patent document calls the invention.

  2. Abstract

    A short plain-language summary of the technical disclosure.

  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

    Technology tags used to group this patent with similar filings.

  7. Citations and related patents

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Abstract

Official abstract text for this publication.

An optoelectronic device including an optoelectronic circuit including light-emitting diodes, thin-film transistors, and a stack of electrically-insulating layers, said stack being located between the light-emitting diodes, and the transistors stack further including conductive elements, between and through the insulating layers, the conductive elements connecting at least some of the transistors to the light-emitting diodes The device further includes a support having a surface, the support being flexible and/or the surface being curved and non-planar, the optoelectronic circuit being connected to the surface on the side of the thin-film transistors.

First claim

Opening claim text (preview).

The invention claimed is: 1 . An optoelectronic device comprising: an optoelectronic circuit comprising light-emitting diodes; thin-film transistors, and a stack of electrically-insulating layers, said stack being located between the light-emitting diodes and the transistors, said stack further comprising electrically-conductive elements, between and through said electrically-insulating layers, said electrically-conductive elements connecting at least some of the transistors to the light-emitting diodes; and a support having a surface, the support being flexible and/or the surface being curved and non-planar, the optoelectronic circuit being connected to the surface of the support on a thin-film side of the optoelectronic circuit; wherein the light-emitting diodes comprise wire-shaped, conical, or frustoconical semiconductor elements. 2 . The optoelectronic device according to claim 1 , wherein the support comprises electrically-conductive tracks, each electrically-conductive track being connected to one of the transistors. 3 . The optoelectronic device according to claim 2 , further comprising a circuit for controlling the optoelectronic circuit coupled to the electrically-conductive tracks. 4 . The optoelectronic device according to claim 1 , wherein the total thickness of the optoelectronic circuit is in the range from 0.1 μm to 500 μm. 5 . The optoelectronic device according to claim 1 , wherein the thickness of the support is in the range from 5 μm to 1,000 μm. 6 . The optoelectronic device according to claim 1 , wherein the support is at least partly made of polyethylene naphthalate, of polyethylene terephthalate, of polyimide, of cellulose triacetate, of cycloolefin copolymer, of polyetheretherketone, or of a mixture of at least two of these compounds. 7 . The optoelectronic device according to claim 1 , wherein the transistors are distributed in at least one stage of thin-film transistors. 8 . The optoelectronic device according to claim 7 , wherein each stage comprises an electrically-insulating layer forming the gate insulator of all the transistors of this stage. 9 . The optoelectronic device according to claim 1 , wherein, for at least one of the transistors, the source and drain regions and the gate of the transistor are located in a same electrically-insulating layer. 10 . The optoelectronic device according to claim 3 , wherein the control circuit rests on the support. 11 . The optoelectronic device according to claim 1 , wherein the optoelectronic circuit has a monolithic structure. 12 . The optoelectronic device according to claim 1 , comprising a single copy of the optoelectronic circuit. 13 . The optoelectronic device according to claim 1 , comprising a plurality of copies of the optoelectronic circuit attached to the support and spaced apart from one another. 14 . The optoelectronic device according to claim 13 , wherein said plurality of copies of the optoelectronic circuit are arranged in rows and in columns, the electrically-conductive tracks extending along the rows and the columns, each electrically-conductive tracks being connected to transistors of a plurality of optoelectronic circuits. 15 . A method of manufacturing the optoelectronic device according to claim 1 , comprising the forming of an optoelectronic circuit comprising the successive steps of: a) forming light-emitting diodes; b) forming, on the light-emitting diodes, a stack of electrically-insulating layers, said stack further comprising electrically-conductive elements between and through said electrically-insulating layers; and c) forming, on said stack, thin-film transistors, said stack being located between the light-emitting diodes and the transistors, said electrically-conductive elements connecting at least some of the transistors to the light-emitting diodes, the assembly comprising the light-emitting diodes, the stack, and the thin-film transistors forming an optoelectronic circuit. 16 . The method of claim 15 , further comprising the following step, after step c): d) attaching the optoelectronic circuit to the surface of the support, the support being flexible and/or the surface being curved and non-planar. 17 . The method according to claim 15 , wherein the optoelectronic circuit is formed in a plurality of copies forming a one-piece structure, the method further comprising the following step, after step c): e) separation of each copy of the optoelectronic circuit. 18 . The method according to claim 15 , wherein the total thickness of the optoelectronic circuit is in the range from 0.1 μm to 500 μm. 19 . The method according to claim 15 , wherein step a) comprises the forming of wire-shaped, conical, or frustoconical semiconductor elements. 20 . The method according to claim 19 , wherein step a) comprises the forming of electrically-conductive or semiconductor seed pads on a substrate and the growth of the semiconductor elements on the seed pads. 21 . The method according to claim 15 , wherein steps b) and c) are carried out at temperatures smaller than 180° C.

Assignees

Inventors

Classifications

  • H10W90/00Primary

    Package configurations · CPC title

  • Containers · CPC title

  • Interconnections, e.g. lead-frames, bond wires or solder balls · CPC title

  • Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED] · CPC title

  • H10H20/819Primary

    characterised by their shape, e.g. curved or truncated substrates · CPC title

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What does patent US12557440B2 cover?
An optoelectronic device including an optoelectronic circuit including light-emitting diodes, thin-film transistors, and a stack of electrically-insulating layers, said stack being located between the light-emitting diodes, and the transistors stack further including conductive elements, between and through the insulating layers, the conductive elements connecting at least some of the transisto…
Who is the assignee on this patent?
Aledia
What technology area does this patent fall under?
Primary CPC classification H10W90/00. Mapped technology areas include Electricity.
When was this patent published?
Publication date Tue Feb 17 2026 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 12 related publications on this page (citations in our corpus or others sharing the same primary CPC).