Substrate processing apparatus

Patent metadata

Field	Value
Publication number	US-12538753-B2
Application number	US-202217880827-A
Country	US
Kind code	B2
Filing date	Aug 4, 2022
Priority date	Sep 24, 2021
Publication date	Jan 27, 2026
Grant date	Jan 27, 2026

Abstract

In a substrate processing apparatus for supplying a processing liquid onto a substrate being rotated, to thereby process the substrate, an upper support body which is a placement member is separably placed on a lower support body for supporting the substrate. The upper support body is moved up and down by an up-and-down moving part. The upper support body includes a first contact part outside an outer periphery of the substrate in a radial direction. When a second contact part of the up-and-down moving part goes up, the second contact part comes into contact with the first contact part, to thereby move the upper support body up. When the second contact part goes down, the upper support body is placed on the lower support body and the second contact part is separated from the first contact part, and in this state, the lower support body is rotatable.

First claim

The invention claimed is:

1 . A substrate processing apparatus for supplying a processing liquid onto a substrate to process said substrate, comprising:
a support part for directly or indirectly supporting the substrate in a horizontal position; a rotating part for rotating said support part around a central axis oriented in an up-and-down direction; a placement member which is separably placed on said support part and covers above at least an outer edge portion of said substrate supported by said support part; an up-and-down moving part for moving said placement member up and down relative to said support part; and a processing liquid supply part for supplying a processing liquid onto an upper surface or a lower surface of said substrate supported by said support part, wherein said placement member includes a first contact part which is contactable with said up-and-down moving part in the up-and-down direction outside an outer periphery of said substrate supported by said support part in a radial direction, said up-and-down moving part includes a second contact part extending toward said first contact part of said placement member from an outward portion in the radial direction and an up-and-down-move driving part for moving said second contact part up and down, when said second contact part is moved up by said up-and-down-move driving part, said second contact part comes into contact with said first contact part to separate said placement member upward from said support part, when said second contact part is moved down by said up-and-down-move driving part, said placement member is placed on said support part to separate said second contact part from said first contact part, and said support part is rotatable in a state where said first contact part and said second contact part are separated from each other.

2 . The substrate processing apparatus according to claim 1 , wherein
a position of said first contact part in a height direction is not higher than 150 mm from an upper surface of said support part in a state where said placement member is placed on said support part.

3 . The substrate processing apparatus according to claim 1 , wherein
said placement member has an annular shape.

4 . The substrate processing apparatus according to claim 1 , wherein
said first contact part and said second contact part include position deviation preventing structures which are fitted to each other when these come into contact with each other.

5 . The substrate processing apparatus according to claim 1 , wherein
when said first contact part comes into contact with said second contact part, an annular surface of said first contact part around said central axis comes into contact with said second contact part.

6 . The substrate processing apparatus according to claim 1 , further comprising:
an annular cover disposed outside said placement member in the radial direction in a still state, wherein an upper portion of said annular cover gets closer to an outer peripheral surface of said placement member while going inward in the radial direction, and said up-and-down-move driving part is provided on said annular cover.

7 . A substrate processing apparatus for supplying a processing liquid onto a substrate to process said substrate, comprising:
a supporter for directly or indirectly supporting the substrate in a horizontal position; a rotator for rotating said supporter around a central axis oriented in an up-and-down direction; a substrate cover which is separably placed on said supporter and covers above at least an outer edge portion of said substrate supported by said supporter; an elevator for moving said substrate cover up and down relative to said supporter; and a nozzle for supplying a processing liquid onto an upper surface or a lower surface of said substrate supported by said supporter, wherein said substrate cover includes a first contact part which is contactable with said elevator in the up-and-down direction outside an outer periphery of said substrate supported by said supporter in a radial direction, said elevator includes a second contact part extending toward said first contact part of said substrate cover from an outward portion in the radial direction and an actuator for moving said second contact part up and down, when said second contact part is moved up by said actuator, said second contact part comes into contact with said first contact part to separate said substrate cover from said supporter, when said second contact part is moved down by said actuator, said substrate cover is placed on said supporter to separate said second contact part from said first contact part, and said supporter is rotatable in a state where said first contact part and said second contact part are separated from each other.

8 . The substrate processing apparatus according to claim 7 , wherein
a position of said first contact part in a height direction is not higher than 150 mm from an upper surface of said supporter in a state where said substrate cover is placed on said supporter.

9 . The substrate processing apparatus according to claim 7 , wherein
said substrate cover has an annular shape.

10 . The substrate processing apparatus according to claim 7 , wherein
said first contact part and said second contact part are fitted to each other to prevent position deviation when these come into contact with each other.

11 . The substrate processing apparatus according to claim 7 , wherein
when said first contact part comes into contact with said second contact part, an annular surface of said first contact part around said central axis comes into contact with said second contact part.

12 . The substrate processing apparatus according to claim 7 , further comprising:
an annular cover disposed outside said substrate cover in the radial direction in a still state, wherein an upper portion of said annular cover gets closer to an outer peripheral surface of said substrate cover while going inward in the radial direction, and said elevator is provided on said annular cover.

Assignees

• Screen Holdings Co Ltd

Inventors

• YASUTAKE Yosuke
• Muramoto Ryo

Classifications

• H01L21/67023

  Electricity · mapped topic

• H01L21/68764 Primary

  Electricity · mapped topic

• H10P72/7624

  characterised by the mechanical construction of the susceptor, stage or support · CPC title

• H10P72/7612

  characterised by lifting arrangements, e.g. lift pins · CPC title

• H10P72/7611

  characterised by edge profile or support profile · CPC title