Irradiating module, and substrate treating apparatus including the same

Patent metadata

Field	Value
Publication number	US-12517440-B2
Application number	US-202217864506-A
Country	US
Kind code	B2
Filing date	Jul 14, 2022
Priority date	Dec 28, 2021
Publication date	Jan 6, 2026
Grant date	Jan 6, 2026

Abstract

The present invention provides a substrate treating apparatus including: a support unit supporting and rotating the substrate in a treatment space; a liquid supply unit supplying a liquid to the substrate supported by the support unit; and an irradiating module irradiating light to the substrate supported by the support unit, in which the irradiating module includes: a housing having an accommodation space; a laser unit located in the accommodation space, and including a laser irradiation unit irradiating laser light, and an irradiation end having one end protruding from the housing and irradiating the laser light irradiated from the laser irradiation unit to the substrate supported by the support unit; and a cooling unit located in the accommodation space and cooling the laser irradiation unit.

First claim

What is claimed is:

1 . A substrate treating apparatus, comprising:
a support unit configured to support and rotate a substrate in a treatment space; a liquid supply unit configured to supply a liquid to the substrate supported by the support unit; and an irradiating module configured to irradiate light to the substrate supported by the support unit, wherein the irradiating module includes
a housing having an accommodation space,
a laser unit in the accommodation space, the laser unit including a laser irradiation unit configured to irradiate laser light and an irradiation end having one end protruding from the housing and configured to irradiate the laser light irradiated from the laser irradiation unit to the substrate supported by the support unit,
a cooling unit in the accommodation space, the cooling unit configured to cool the laser irradiation unit, and
a cover having an inner space and configured to accommodate therein the one end of the irradiation end protruding from the housing.

2 . The substrate treating apparatus of claim 1 ,
the cover includes an opening on a bottom surface thereof at a position overlapping the laser light irradiated from the irradiation end, when viewed from a top.

3 . The substrate treating apparatus of claim 2 , wherein a boundary of the opening is rounded from an upper end of the bottom surface to a lower end of the bottom surface.

4 . The substrate treating apparatus of claim 2 , wherein the cover includes one or a plurality of side holes defined on a side surface thereof.

5 . The substrate treating apparatus of claim 3 , wherein the cooling unit includes a plate having a flow path through which a cooling fluid is configured to flow therein, and
the flow path is configured to pass the cooling fluid therethrough and flow into the inner space.

6 . The substrate treating apparatus of claim 5 , wherein one end of the flow path is between an outer surface of the irradiation end and an inner surface of the housing.

7 . The substrate treating apparatus of claim 5 , wherein a purge port connected to one end of the flow path is at a lower end of the housing,
a supply port configured to supply the cooling fluid to the inner space is on a side surface of the cover, and the substrate treating apparatus further comprises a flow cover which is coupled to the side surface of the cover to connect the purge port and the supply port, and has a flow space in which the cooling fluid flows therein.

8 . The substrate treating apparatus of claim 7 , wherein the supply port is at a position spaced apart from a central axis of the irradiation end when viewed from a front.

9 . The substrate treating apparatus of claim 1 , further comprising:
a photographing unit configured to photograph the laser light irradiated from the laser unit, wherein the photographing unit is in the accommodation space.

10 . The substrate treating apparatus of claim 9 , wherein the laser unit further includes a beam expander configured to control a characteristic of the laser light irradiated by the laser irradiation unit, and
the photographing unit includes
an image unit photographing the laser light irradiated by the laser unit and/or an image of the substrate, and
a lighting unit providing light so that the image unit acquires the image, and
when viewed from a top, an irradiation direction of the laser light, a photographing direction of the image unit, and an irradiation direction of the light are coaxial.

11 . An irradiating module for irradiating light to a substrate, the irradiating module comprising:
a housing having an accommodation space; a laser unit in the accommodation space, the laser unit including a laser irradiation unit configured to irradiate laser light and an irradiation end having one end protruding from the housing and configured to irradiate the laser light irradiated from the laser irradiation unit to the substrate supported by a support unit; and a cooling unit in the accommodation space and in contact with the laser irradiation unit, the cooling unit configured to exchange heat with the laser irradiation unit.

12 . The irradiating module of claim 11 , further comprising:
a cover having an inner space configured to accommodate therein one end of the irradiation end protruding from the housing, wherein the cover includes an opening on a bottom surface thereof at a position overlapping the laser light irradiated from the irradiation end, when viewed from a top.

13 . The irradiating module of claim 12 , wherein the cooling unit includes:
a plate include a flow path through which a cooling fluid exchanging heat with the laser irradiation unit is configured to flow; and the plate is in contact with the laser irradiation unit.

14 . The irradiating module of claim 13 , wherein the flow path is configured to pass the cooling fluid therethrough and supply to the inner space.

15 . The irradiating module of claim 14 , wherein a boundary of the opening is curved from an upper end of the bottom surface to a lower end of the bottom surface.

16 . The irradiating module of claim 14 , wherein the cover includes at least one side hole at a side surface thereof.

17 . A substrate treating apparatus for treating a mask including a plurality of cells, the substrate treating apparatus comprising:
a support unit configured to support and rotate a mask in which a first pattern is in each of the plurality of cells and a second pattern different from the first pattern is outside the cells; a liquid supply unit configured to supply a liquid to the mask supported by the support unit; and an irradiating module configured to irradiate light to the substrate supported by the support unit, wherein the irradiating module includes
a housing having an accommodation space,
a laser unit in the accommodation space, the laser unit including a laser irradiation unit configured to irradiate laser light and an irradiation end having one end protruding from the housing and configured to irradiate the laser light irradiated from the laser irradiation unit to the second pattern between the first pattern and the second pattern,
a cooling unit in the accommodation space and including a flow path configured to exchange heat with the laser irradiation unit, and
a cover having an inner space configured to accommodate therein one end of the irradiation end protruding from the housing, and
an opening is a position overlapping the laser light irradiated from the irradiation end on a bottom surface of the cover when viewed from a top.

18 . The substrate treating apparatus of claim 17 , wherein the flow path is configured to pass a cooling fluid therethrough and supply to the inner space.

19 . The substrate treating apparatus of claim 18 , wherein the opening is rounded from an upper end of the bottom surface to a lower end of the bottom surface.

20 . The substrate treating apparatus of claim 18 , wherein the cover includes one or a plurality of side holes on a side surface thereof.

Assignees

• Semes Co Ltd

Inventors

• Son Won Sik
• Yoon Hyun
• Choi Ki Hoon
• Yang Hyo Won
• Kim Tae Hee
• Jung In Ki

Classifications

• H10P72/7618

  characterised by a movable susceptor, stage or support, others than those only rotating on their own vertical axis, e.g. susceptors on a rotating carrousel · CPC title

• H10P72/0436 Primary

  mainly by radiation · CPC title

• H10P72/0404 Primary

  for general liquid treatment, e.g. etching followed by cleaning · CPC title

• B23K26/06

  Shaping the laser beam, e.g. by masks or multi-focusing · CPC title

• B23K26/703

  Cooling arrangements (by using a fluid stream B23K26/14) · CPC title