Method of plating and apparatus for plating

Patent metadata

Field	Value
Publication number	US-12516437-B2
Application number	US-202117923567-A
Country	US
Kind code	B2
Filing date	Oct 18, 2021
Priority date	Oct 18, 2021
Publication date	Jan 6, 2026
Grant date	Jan 6, 2026

Abstract

One object of the present disclosure is to provide a technique of suppressing deterioration of a seed layer of a substrate. There is provided a method of plating, comprising: a process of holding a substrate by a substrate holder, such that a sealed space is formed to protect a contact provided to supply electricity to the substrate, from a plating solution while the substrate holder holds the substrate, and that a contact location between the substrate and the contact is locally covered with a liquid in the sealed space; a process of soaking the substrate held by the substrate holder in the plating solution and placing the substrate to be opposed to an anode; and a process of performing a plating process of the substrate with supplying electric current between the substrate and the anode, in a state that the contact location between the substrate and the contact is covered with a liquid.

First claim

The invention claimed is:

1 . A method of plating, comprising:
holding a substrate by a substrate holder, the process comprising forming a sealed space to protect a contact provided to supply electricity to the substrate, from a plating solution while the substrate holder holds the substrate, causing the substrate to come into contact with the contact cleaned and covered with a liquid having electric conductivity controlled to be lower than a predetermined reference value, and locally covering a contact location between the substrate and the contact with the liquid in the sealed space; soaking the substrate held by the substrate holder in the plating solution and placing the substrate to be opposed to an anode; and performing a plating process on the substrate by supplying electric current between the substrate and the anode, wherein the contact location between the substrate and the contact is covered with the liquid during the plating process, cleaning the contact by supplying liquid from a cleaning nozzle to the contact, the contact being disposed in a recess of the substrate holder, wherein, after cleaning, the liquid remains around the contact in an amount equal to or greater than a predetermined amount, and wherein the cleaning nozzle is a component separate from the substrate holder.

2 . The method of plating according to claim 1 , further comprising:
prior to holding the substrate by the substrate holder, cleaning the contact of the substrate holder with the liquid until electric conductivity of the liquid used for cleaning becomes lower than a predetermined reference value and covering the contact with the liquid having electric conductivity controlled to be lower than the predetermined reference value.

3 . The method of plating according to claim 1 ,
wherein the contact is cleaned again when a predetermined time period has elapsed before the substrate is held by the substrate holder after cleaning of the contact, and the contact is covered again with the liquid having the electric conductivity controlled to be lower than the predetermined reference value.

4 . The method of plating according to claim 1 ,
wherein the contact location between the substrate and the contact is covered with the liquid, such that a distance from a gas-liquid interface between the liquid and air in the sealed space to the contact location between the substrate and the contact becomes not shorter than a predetermined distance value.

5 . The method of plating according to claim 1 ,
wherein the substrate is wet before being held by the substrate holder.

6 . The method of plating according to claim 5 , further comprising:
prior to holding the substrate by the substrate holder, causing both the substrate and the contact of the substrate holder to be wet in advance.

7 . The method of plating according to claim 5 , further comprising:
prior to holding the substrate by the substrate holder, performing a pre-wet process that wets the substrate with a liquid and causes air inside of a pattern formed on a surface of the substrate to be displaced with the liquid.

8 . The method of plating according to claim 1 , further comprising:
cleaning the substrate after the plating process with a liquid; and transferring the cleaned substrate in a wet state to a next process.

Assignees

• Ebara Corp

Inventors

• Masuda Yasuyuki
• Wakuda Yohei
• Shimoyama Masashi
• Nagai Mizuki

Classifications

• C25D21/12

  Process control or regulation (controlling or regulating in general G05) · CPC title

• C25D21/08

  Rinsing · CPC title

• C25D17/02 Primary

  Tanks; Installations therefor · CPC title

• C25D17/005

  Contacting devices · CPC title

• C25D17/004

  Sealing devices · CPC title