Composition, film, method of forming film, method of forming pattern, method of forming organic-underlayer-film reverse pattern, and method of producing composition

Patent metadata

Field	Value
Publication number	US-12516074-B2
Application number	US-202217696982-A
Country	US
Kind code	B2
Filing date	Mar 17, 2022
Priority date	Sep 27, 2019
Publication date	Jan 6, 2026
Grant date	Jan 6, 2026

Abstract

A composition includes: a metal compound including a ligand; and a solvent. The ligand is derived from a compound represented by formula (1). L represents an oxygen atom or a single bond; R1 represents a substituted or unsubstituted monovalent hydrocarbon group having 1 to 10 carbon atoms; R2 and R3 each independently represent a hydrogen atom or a substituted or unsubstituted monovalent hydrocarbon group having 1 to 10 carbon atoms, or R2 and R3 bind with each other and represent an alicyclic structure having 3 to 20 ring atoms together with the carbon atom to which R2 and R3 bond, or R1 and either R2 or R3 bind with each other and represent a lactone ring structure having 4 to 20 ring atoms or a cyclic ketone structure having 4 to 20 ring atoms together with the atom chain to which R1 and either R2 or R3 bond.

First claim

What is claimed is:

1 . A composition comprising:
a metal compound comprising a ligand; and a solvent, wherein the ligand is derived from a compound represented by formula (1):

wherein, in the formula (1), L represents a single bond; R 1 represents a substituted or unsubstituted monovalent hydrocarbon group having 1 to 10 carbon atoms; R 2 and R 3 each independently represent a hydrogen atom or a substituted or unsubstituted monovalent hydrocarbon group having 1 to 10 carbon atoms, or R 2 and R 3 bind with each other and represent an alicyclic structure having 3 to 20 ring atoms together with the carbon atom to which R 2 and R 3 bond, or R 1 and either R 2 or R 3 bind with each other and represent a lactone ring structure having 4 to 20 ring atoms or a cyclic ketone structure having 4 to 20 ring atoms together with the atom chain to which R 1 and either R 2 or R 3 bond.

2 . The composition according to claim 1 , wherein a metal atom in the metal compound belongs to period 3 to period 7 of group 2 to group 14 in periodic table.

3 . The composition according to claim 2 , wherein the metal atom belongs to group 4, group 9, or group 10 in the periodic table.

4 . The composition according to claim 1 , wherein R 1 represents a substituted or unsubstituted monovalent chain hydrocarbon group having 1 to 10 carbon atoms.

5 . The composition according to claim 1 , wherein R 2 and R 3 each represent a hydrogen atom.

6 . A film formed from the composition according to claim 1 .

7 . A method of forming a film, the method comprising applying the composition according to claim 1 directly or indirectly on a substrate.

8 . A method of forming a pattern, the method comprising:
applying the composition according to claim 1 directly or indirectly on a substrate to form a resist underlayer film; applying an organic-resist-film-forming composition directly or indirectly on the resist underlayer film to form an organic resist film; exposing the organic resist film to a radioactive ray; and developing the organic resist film exposed.

9 . A method of forming an organic-underlayer-film reverse pattern, the method comprising:
forming an organic underlayer film directly or indirectly on a substrate; forming a resist pattern directly or indirectly on the organic underlayer film; forming an organic-underlayer-film pattern by etching the organic underlayer using the resist pattern as a mask; forming an organic-underlayer-film-reverse-pattern-forming film on the organic-underlayer-film pattern by applying the composition according to claim 1 ; and removing the organic-underlayer-film pattern to form an organic-underlayer-film reverse pattern.

10 . A method of producing the composition according to claim 1 , the method comprising:
mixing a metal alkoxide and a compound represented by formula (1) to obtain a mixture; adding water to the mixture to cause a hydrolytic condensation reaction of the metal alkoxide; and adding a solvent to the mixture to which the water is added:

wherein, in the formula (1), L represents a single bond; R 1 represents a substituted or unsubstituted monovalent hydrocarbon group having 1 to 10 carbon atoms; R 2 and R 3 each independently represent a hydrogen atom or a substituted or unsubstituted monovalent hydrocarbon group having 1 to 10 carbon atoms, or R 2 and R 3 bind with each other and represent an alicyclic structure having 3 to 20 ring atoms together with the carbon atom to which R 2 and R 3 bond, or R 1 and either R 2 or R 3 bind with each other and represent a lactone ring structure having 4 to 20 ring atoms or a cyclic ketone structure having 4 to 20 ring atoms together with the atom chain to which R 1 and either R 2 or R 3 bond.

11 . A composition comprising:
a metal compound comprising a ligand; and a solvent, wherein the ligand is derived from a compound represented by formula (1):

wherein, in the formula (1), L represents an oxygen atom or a single bond; R 1 represents a substituted or unsubstituted monovalent hydrocarbon group having 1 to 10 carbon atoms; R 2 and R 3 each represent a hydrogen atom.

12 . The composition according to claim 11 , wherein a metal atom in the metal compound belongs to period 3 to period 7 of group 2 to group 14 in periodic table.

13 . The composition according to claim 12 , wherein the metal atom belongs to group 4, group 9, or group 10 in the periodic table.

14 . The composition according to claim 11 , wherein R 1 represents a substituted or unsubstituted monovalent chain hydrocarbon group having 1 to 10 carbon atoms.

15 . A film formed from the composition according to claim 11 .

16 . A method of forming a film, the method comprising applying the composition according to claim 11 directly or indirectly on a substrate.

17 . A method of forming a pattern, the method comprising:
applying the composition according to claim 11 directly or indirectly on a substrate to form a resist underlayer film; applying an organic-resist-film-forming composition directly or indirectly on the resist underlayer film to form an organic resist film; exposing the organic resist film to a radioactive ray; and developing the organic resist film exposed.

18 . A method of forming an organic-underlayer-film reverse pattern, the method comprising:
forming an organic underlayer film directly or indirectly on a substrate; forming a resist pattern directly or indirectly on the organic underlayer film; forming an organic-underlayer-film pattern by etching the organic underlayer using the resist pattern as a mask; forming an organic-underlayer-film-reverse-pattern-forming film on the organic-underlayer-film pattern by applying the composition according to claim 11 ; and removing the organic-underlayer-film pattern to form an organic-underlayer-film reverse pattern.

19 . A method of producing the composition according to claim 11 , the method comprising:
mixing a metal alkoxide and a compound represented by formula (1) to obtain a mixture; adding water to the mixture to cause a hydrolytic condensation reaction of the metal alkoxide; and adding a solvent to the mixture to which the water is added:

wherein, in the formula (1), L represents an oxygen atom or a single bond; R 1 represents a substituted or unsubstituted monovalent hydrocarbon group having 1 to 10 carbon atoms; R 2 and R 3 each independently represent a hydrogen atom.

Assignees

• Jsr Corp

Inventors

• OOTSUBO Yuusuke
• Serizawa Ryuichi
• Sakai Kazunori

Classifications

• G03F7/20

  Exposure; Apparatus therefor (photographic printing apparatus for making copies G03B27/00) · CPC title

• G03F7/11

  having cover layers or intermediate layers, e.g. subbing layers {(G03F7/091 - G03F7/093, B41N3/03 take precedence)} · CPC title

• G03F7/039

  Macromolecular compounds which are photodegradable, e.g. positive electron resists (G03F7/075 takes precedence; macromolecular quinonediazides G03F7/023) · CPC title

• G03F7/40

  Treatment after imagewise removal, e.g. baking · CPC title

• G03F7/2004

  characterised by the use of a particular light source, e.g. fluorescent lamps or deep UV light · CPC title