Susceptor improvement

Patent metadata

Field	Value
Publication number	US-12512362-B2
Application number	US-202318108272-A
Country	US
Kind code	B2
Filing date	Feb 10, 2023
Priority date	Feb 10, 2023
Publication date	Dec 30, 2025
Grant date	Dec 30, 2025

Abstract

A susceptor for processing a substrate is provided including a base and a coating formed over the base. The base includes an outer rim having an inner edge, an outer edge, and a top connecting the inner edge to the outer edge; and an inner dish disposed inside the outer rim and coupled to the outer rim, the inner dish recessed from the top of the outer rim, the inner dish having a front side and an opposing back side. The coating has an outer surface that includes a first portion formed over the front side of the inner dish. The first portion of the outer surface of the coating includes a first region and a second region, the first region has a first average level of roughness, the second region has a second average level of roughness.

First claim

What is claimed is:

1 . A susceptor for processing a substrate, comprising:
a base comprising:
an outer rim having an inner edge, an outer edge, and a top connecting the inner edge to the outer edge; and
an inner dish disposed inside the outer rim and coupled to the outer rim, the inner dish recessed from the top of the outer rim, the inner dish having a front side and an opposing back side; and
a coating formed over the base, the coating having an outer surface that includes a first portion formed over the front side of the inner dish, wherein
the first portion of the outer surface of the coating includes a first region and a second region,
the first region has a first average level of roughness,
the second region has a second average level of roughness,
the first average level of roughness is at least 50% greater than or 33% less than the second average level of roughness; and
a level of roughness in the first region gradually changes from a first level at a first border of the first region to a second level at a second border of the first region.

2 . The susceptor of claim 1 , wherein the first region and the second region are each a ring-shaped region.

3 . The susceptor of claim 1 , wherein the first portion of the outer surface further includes a third region that is spaced apart from the first region by the second region.

4 . The susceptor of claim 3 , wherein the first region, the second region, and the third region are each a ring-shaped region.

5 . The susceptor of claim 3 , wherein the third region surrounds the first region and the second region.

6 . The susceptor of claim 3 , wherein the third region has a third average level of roughness that is substantially different from the first average level of roughness and the second average level of roughness.

7 . The susceptor of claim 3 , wherein the third region has an average level of roughness that is substantially the same as the first average level of roughness.

8 . The susceptor of claim 1 , wherein the first average level of roughness is at least ten times greater than or ten times less than the second average level of roughness.

9 . A susceptor for processing a substrate, comprising:
a base comprising:
an outer rim having an inner edge, an outer edge, and a top connecting the inner edge to the outer edge; and
an inner dish disposed inside the outer rim and coupled to the outer rim, the inner dish recessed from the top of the outer rim, the inner dish having a front side and an opposing back side, wherein:
an outer surface of the base includes a portion on the front side of the inner dish or the back side of the inner dish,
the portion includes a primary region and a secondary region,
an average level of roughness of the primary region is at least 50% greater than or 33% less than an average level of roughness of the secondary region; and

a coating formed over the base, the coating having an outer surface that includes a first portion formed over the back side of the inner dish, wherein:
the first portion of the outer surface of the coating includes a first region and a second region,
the first region has a first average level of roughness,
the second region has a second average level of roughness, and
the first average level of roughness is at least 50% greater than or 33% less than the second average level of roughness.

10 . The susceptor of claim 9 , wherein the first region and the second region are each a ring-shaped region.

11 . The susceptor of claim 9 , wherein the first portion of the outer surface further includes a third region that is spaced apart from the first region by the second region.

12 . The susceptor of claim 11 , wherein the first region, the second region, and the third region are each a ring-shaped region.

13 . The susceptor of claim 11 , wherein the third region surrounds the first region and the second region.

14 . The susceptor of claim 11 , wherein the third region has a third average level of roughness that is substantially different from the first average level of roughness and the second average level of roughness.

15 . The susceptor of claim 11 , wherein the third region has an average level of roughness that is substantially the same as the first average level of roughness.

16 . The susceptor of claim 9 , wherein the first average level of roughness is at least ten times greater than or ten times less than the second average level of roughness.

17 . A susceptor for processing a substrate, comprising:
a base comprising:
an outer rim having an inner edge, an outer edge, and a top connecting the inner edge to the outer edge; and
an inner dish disposed inside the outer rim and coupled to the outer rim, the inner dish recessed from the top of the outer rim, the inner dish having a front side and an opposing back side, wherein
an outer surface of the base includes a first portion on the front side of the base or the back side of the base,
the first portion includes a first region and a second region,
the first region has a first average level of roughness,
the second region has a second average level of roughness, and
the first average level of roughness is at least 50% greater than or 33% less than the second average level of roughness; and

a coating formed over the first region and the second region of the first portion of the base.

18 . The susceptor of claim 17 , the first portion of the outer surface of the base is on the front side of the base.

19 . The susceptor of claim 17 , the first portion of the outer surface of the base is on the back side of the base.

20 . The susceptor of claim 17 , wherein
the first portion of the outer surface further includes a third region that is spaced apart from the first region by the second region, and the third region has a third average level of roughness that is substantially different from the second average level of roughness.

Assignees

• Applied Materials Inc

Inventors

• Goodman Matthew Gabriel
• Tolle John
• Thomas Shawn
• Washington Lori D
• Luan Xinning
• Cong Zhepeng

Classifications

• H10P72/7624

  characterised by the mechanical construction of the susceptor, stage or support · CPC title

• H10P72/7611

  characterised by edge profile or support profile · CPC title

• H10P72/0436

  mainly by radiation · CPC title

• H10P72/7616 Primary

  characterised by a coating, a hardness or a material · CPC title

• C30B25/105

  by irradiation or electric discharge · CPC title