Pulse etching for finfet and gaa source/drain epi film growth control
US-2026068550-A1 · Mar 5, 2026 · US
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Tolle John patents
Tolle John is listed as an inventor on 103 patents in our database. Major assignees and classification codes are summarized below.
| Metric | Value |
|---|---|
| Inventor | Tolle John |
| Total patents | 103 |
| First publication | Jan 15, 2015 |
| Latest publication | Mar 5, 2026 |
Notable patents
Publications ranked by popularity score, then publication date.
Cyclic processing methods for defect reduction, and related apparatus, devices, and processing chambers
US-2026068564-A1 · Mar 5, 2026 · US
Structure and method of forming a silicon germanium containing layered stack for use in semiconductor devices
US-2026040669-A1 · Feb 5, 2026 · US
Epitaxial growth of fully-strained and defect-free cfet superlattices using carbon doping and layered middle dielectric isolation
US-2026040668-A1 · Feb 5, 2026 · US
Susceptor improvement
US-12512362-B2 · Dec 30, 2025 · US
Gate-all-around (gaa) interface modifications to improve abruptness
US-2025372373-A1 · Dec 4, 2025 · US
Uv energy sources for processing chambers, and related apparatus and methods
US-2025361647-A1 · Nov 27, 2025 · US
Inhibitors for selective epitaxial deposition
US-2025354291-A1 · Nov 20, 2025 · US
Flow guide structures and heat shield structures, and related methods, for deposition uniformity and process adjustability
US-12428731-B2 · Sep 30, 2025 · US
Method for depositing boron and gallium containing silicon germanium layers
US-12406846-B2 · Sep 2, 2025 · US
Recent patents
Latest publications not already listed above.
Method for depositing boron and gallium containing silicon germanium layers
US-2025273464-A1 · Aug 28, 2025 · US
Method for depositing a Group IV semiconductor and related semiconductor device structures
US-12363960-B2 · Jul 15, 2025 · US
Monolithic complementary field-effect transistors having carbon-doped release layers
US-2025194243-A1 · Jun 12, 2025 · US
Monolithic complementary field-effect transistors having carbon-doped release layers
US-12262559-B2 · Mar 25, 2025 · US
Gas-phase reactor system-with a reaction chamber, a solid precursor source vessel, a gas distribution system, and a flange assembly
US-2025092566-A1 · Mar 20, 2025 · US
Method for cleaning quartz epitaxial chambers
US-12252785-B2 · Mar 18, 2025 · US
Methods of forming abrupt interfaces between silicon-and-carbon-containing materials and silicon-and-oxygen-containing materials
US-2025037987-A1 · Jan 30, 2025 · US
Gas-phase reactor system-with a reaction chamber, a solid precursor source vessel, a gas distribution system, and a flange assembly
US-12195876-B2 · Jan 14, 2025 · US
Semiconductor processing apparatus and methods for calibrating a semiconductor processing apparatus
US-2024321605-A1 · Sep 26, 2024 · US
Susceptor improvement
US-2024274464-A1 · Aug 15, 2024 · US
Semiconductor processing apparatus and methods for calibrating a semiconductor processing apparatus
US-12040200-B2 · Jul 16, 2024 · US
Surface modifiers for enhanced epitaxial nucleation and wetting
US-2024145241-A1 · May 2, 2024 · US
Uniform epitaxial growth over crystalline template
US-2024088222-A1 · Mar 14, 2024 · US
Method and device for depositing silicon onto substrates
US-2024079231-A1 · Mar 7, 2024 · US
Method and device for depositing silicon onto substrates
US-11901179-B2 · Feb 13, 2024 · US
Substrate modification for superlattice critical thickness improvement
US-2024038531-A1 · Feb 1, 2024 · US
Flow guide structures and heat shield structures, and related methods, for deposition uniformity and process adjustability
US-2024018658-A1 · Jan 18, 2024 · US
Gas-phase reactor system-with a reaction chamber, a solid precursor source vessel, a gas distribution system, and a flange assembly
US-2024011189-A1 · Jan 11, 2024 · US
Gas-phase reactor system-with a reaction chamber, a solid precursor source vessel, a gas distribution system, and a flange assembly
US-11814747-B2 · Nov 14, 2023 · US
Monolithic complementary field-effect transistors having carbon-doped release layers
US-2023326925-A1 · Oct 12, 2023 · US
Major assignees
Companies most often associated with this inventor's publications.
| Assignee | Patents |
|---|---|
| Asm Ip Holding Bv | 80 |
| Applied Materials Inc | 21 |
| Asm Ip Holdings B V | 3 |
| IBM | 2 |
| Shell Usa Inc | 1 |
Top CPC classifications
Most common classification codes across this inventor's patents.
| CPC | Patents |
|---|---|
| H10P14/3411 | 58 |
| H10P14/24 | 52 |
| H01L21/02532 | 49 |
| H01L21/0262 | 39 |
| H10P14/3444 | 38 |