Vapor chamber

US12501582B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-12501582-B2
Application numberUS-202318308501-A
CountryUS
Kind codeB2
Filing dateApr 27, 2023
Priority dateMar 31, 2021
Publication dateDec 16, 2025
Grant dateDec 16, 2025

How to read this patent

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  1. Title

    What the patent document calls the invention.

  2. Abstract

    A short plain-language summary of the technical disclosure.

  3. Assignees and inventors

    Who owns or filed the patent and who is credited as inventor.

  4. Key dates

    Filing, priority, publication, and grant dates set the timeline.

  5. First independent claim

    The legal scope of protection — read this for what is actually claimed.

  6. CPC / IPC classifications

    Technology tags used to group this patent with similar filings.

  7. Citations and related patents

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Abstract

Official abstract text for this publication.

A vapor chamber including a container having a cavity portion formed inside, and including a first surface and a second surface opposing the first surface, a working fluid sealed in the cavity portion, and a vapor flow path through which the working fluid in a gas phase flows, the vapor flow path being provided in the cavity portion, wherein a container inner surface area increasing unit including a protruding part is formed on an inner surface of the first surface, and a first wick structure is provided on a surface of the protruding part.

First claim

Opening claim text (preview).

What is claimed is: 1 . A vapor chamber comprising a container having a cavity portion formed inside, and including a first plate-shaped body and a second plate-shaped body opposing the first plate-shaped body, a working fluid sealed in the cavity portion, and a vapor flow path through which the working fluid in a gas phase flows, the vapor flow path being provided in the cavity portion, wherein the container is formed by overlapping the first plate-shaped body and the second plate-shaped body opposing the first plate-shaped body, wherein an evaporator including a protruding part is formed on an inner surface of the first plate-shaped body, a first wick structure is provided on a surface of the protruding part, a third wick structure is provided outside the evaporator, on the first plate-shaped body, and the third wick structure is connected to the first wick structure, wherein a second wick structure is further provided on the first wick structure, the second wick structure comprising a first plurality of second wick structures and, a second plurality of second wick structures, a vertically laminated structure of wick structures having the first wick structure and one of the first plurality of second wick structures, wherein the vertically laminated structure of wick structures is between a top surface of the protruding part and an inner surface of the second plate-shaped body, the one of the first plurality of second wick structures extends in an inner surface direction of the second plate-shaped body from a tip end of the protruding part, and contacts the inner surface of the second plate-shaped body, the evaporator includes a plurality of protruding parts comprising the protruding part, and the plurality of protruding parts are separated from each other by 0.4 mm or more, one of the second plurality of second wick structures is provided on the first wick structure and between the plurality of protruding parts, wherein the one of the second plurality of second wick structures is separated from another one of the second plurality of second wick structures by one protruding part of the plurality of protruding parts, the cavity portion is formed between the first plurality of second wick structures, projection parts that project to the second plate-shaped body from the tip ends of the protruding parts and are disposed in another inner surface direction are provided at some protruding parts of the plurality of protruding parts, the projection parts next to each other are connected by the first plurality of second wick structures, and the inner surface of the second plate-shaped body is included in the vapor flow path. 2 . The vapor chamber according to claim 1 , wherein a ratio of a height of the protruding part to a thickness of the protruding part is 1.0 or more and 3.0 or less. 3 . The vapor chamber according to claim 1 , wherein a thickness of the first wick structure is 0.1 mm or more and 1.0 mm or less. 4 . The vapor chamber according to claim 1 , wherein the surface of the protruding part is covered with the first wick structure. 5 . The vapor chamber according to claim 4 , wherein the first wick structure extends among the plurality of the protruding parts on the inner surface of the first plate-shaped body. 6 . The vapor chamber according to claim 1 , wherein the first wick structure extends among the plurality of the protruding parts on the inner surface of the first plate-shaped body. 7 . The vapor chamber according to claim 1 , wherein the second wick structure has a smaller capillary force than the first wick structure. 8 . The vapor chamber according to claim 7 , wherein the one of the first plurality of second wick structures is further provided on the first wick structure among the plurality of the protruding parts on the inner surface of the first plate-shaped body. 9 . The vapor chamber according to claim 1 , wherein the one of the first plurality of second wick structures contacts the inner surface of the second plate-shaped body. 10 . The vapor chamber according to claim 1 , wherein the one of the first plurality of second wick structures is further provided on the first wick structure among the plurality of the protruding parts on the inner surface of the first plate-shaped body. 11 . The vapor chamber according to claim 1 , wherein the first wick structure is a sintered body of powder, and the second wick structure is a sintered body of powder. 12 . The vapor chamber according to claim 11 , wherein an average primary particle size of a first powder that is a raw material of the first wick structure is smaller than an average primary particle size of a second powder that is a raw material of the second wick structure. 13 . The vapor chamber according to claim 1 , wherein the evaporator comprises plate-shaped fins, pin fins and/or recesses. 14 . The vapor chamber according to claim 1 , wherein an entire first planar-shaped body is a planar part, and the evaporator is formed on an inner surface of the planar part. 15 . The vapor chamber according to claim 1 , wherein the container includes a planar portion and a projection portion projected in an outward direction from the planar portion. 16 . The vapor chamber according to claim 1 , wherein a block-shaped wick member is further provided between the first plurality of second wick structures and the second plate-shaped body. 17 . The vapor chamber according to claim 1 , wherein the one of the second plurality of second wick structures is further provided between the cavity portion and the first wick structure.

Assignees

Inventors

Classifications

  • for cooling by change of state · CPC title

  • Elements constructed in the shape of a hollow panel, e.g. with channels {(F28D1/02, F28D1/03 take precedence)} · CPC title

  • the conduits having a particular shape, e.g. non-circular cross-section, annular (F28D15/0241, F28D15/0266 take precedence) · CPC title

  • Heat pipes, e.g. wicks or capillary pumps · CPC title

  • F28D15/04Primary

    with tubes having a capillary structure · CPC title

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Frequently asked questions

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What does patent US12501582B2 cover?
A vapor chamber including a container having a cavity portion formed inside, and including a first surface and a second surface opposing the first surface, a working fluid sealed in the cavity portion, and a vapor flow path through which the working fluid in a gas phase flows, the vapor flow path being provided in the cavity portion, wherein a container inner surface area increasing unit includ…
Who is the assignee on this patent?
Furukawa Electric Co Ltd
What technology area does this patent fall under?
Primary CPC classification H05K7/20336. Mapped technology areas include Electricity.
When was this patent published?
Publication date Tue Dec 16 2025 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 3 related publications on this page (citations in our corpus or others sharing the same primary CPC).