Deposition system and method
US-2022336297-A1 · Oct 20, 2022 · US
Substrate processing apparatus and substrate monitoring method
US12500102B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-12500102-B2 |
| Application number | US-202318525785-A |
| Country | US |
| Kind code | B2 |
| Filing date | Nov 30, 2023 |
| Priority date | Dec 5, 2022 |
| Publication date | Dec 16, 2025 |
| Grant date | Dec 16, 2025 |
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- Title
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Abstract
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Provided is a substrate processing apparatus including a chamber providing a processing space in which a process is performed on a substrate coated with an organic solvent using a fluid in a supercritical state, a tray unit supporting the substrate and provided to be inserted into the chamber and withdraw from the chamber through an opening of the chamber, and a detector configured to measure a resistance of the substrate.
First claim
Opening claim text (preview).
What is claimed is: 1 . A substrate processing apparatus comprising: a chamber providing a processing space in which a process is performed on a substrate coated with an organic solvent using a fluid in a supercritical state; a tray unit supporting the substrate and provided to be inserted into the chamber and withdrawn from the chamber through an opening of the chamber; and a detector configured to measure a resistance of the substrate, wherein the tray unit includes a tray supporting the substrate, and a cover provided at an end of the tray and sealing the opening, and the detector is connected to the cover. 2 . The substrate processing apparatus of claim 1 , wherein the detector detects at least one of a progress of the process for the substrate and an amount of the organic solvent on the substrate. 3 . The substrate processing apparatus of claim 1 , wherein the detector measures the resistance of the substrate with the tray unit. 4 . The substrate processing apparatus of claim 1 , wherein the detector includes an ammeter configured to measure a current and a voltmeter configured to measure a voltage. 5 . A substrate processing apparatus comprising: a chamber providing a processing space in which a process is performed on a substrate coated with an organic solvent using a fluid in a supercritical state; a tray unit supporting the substrate and provided to be inserted into the chamber and withdrawn from the chamber through an opening of the chamber; and a detector configured to measure a resistance of the substrate, wherein the tray unit includes a tray supporting the substrate, and a plurality of protruding terminals that protrude from an upper surface of the tray and are connected to the detector and on which the substrate is placed. 6 . The substrate processing apparatus of claim 5 , wherein the detector detects at least one of a progress of the process for the substrate and an amount of the organic solvent on the substrate. 7 . The substrate processing apparatus of claim 5 , wherein the detector measures the resistance of the substrate with the tray unit. 8 . The substrate processing apparatus of claim 5 , wherein the detector includes an ammeter configured to measure a current and a voltmeter configured to measure a voltage.
Assignees
Inventors
Classifications
for wet cleaning or washing · CPC title
Cleaning only by supercritical fluids · CPC title
characterised by the mechanical construction of the susceptor, stage or support · CPC title
characterised by lifting arrangements, e.g. lift pins · CPC title
- H10P72/0408Primary
for drying · CPC title
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- What does patent US12500102B2 cover?
- Provided is a substrate processing apparatus including a chamber providing a processing space in which a process is performed on a substrate coated with an organic solvent using a fluid in a supercritical state, a tray unit supporting the substrate and provided to be inserted into the chamber and withdraw from the chamber through an opening of the chamber, and a detector configured to measure a…
- Who is the assignee on this patent?
- Tes Co Ltd
- What technology area does this patent fall under?
- Primary CPC classification H10P72/0408. Mapped technology areas include Electricity.
- When was this patent published?
- Publication date Tue Dec 16 2025 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
- What related patents are in patentsdb?
- We list 3 related publications on this page (citations in our corpus or others sharing the same primary CPC).