Substrate processing apparatus

Patent metadata

Field	Value
Publication number	US-12488963-B2
Application number	US-202017778757-A
Country	US
Kind code	B2
Filing date	Nov 19, 2020
Priority date	Nov 21, 2019
Publication date	Dec 2, 2025
Grant date	Dec 2, 2025

Abstract

In accordance with an exemplary embodiment of the present invention, an apparatus for processing substrate comprising: a support plate; an antenna disposed in parallel to one surface of the support plate and having 1st to n-th turns (n=an integer greater than 3) wound along one direction from an inner end; and a distance control unit capable of adjusting separation distances formed between the 1st to n-th turns.

First claim

What is claimed is:

1 . An apparatus for processing substrate comprising:
a support plate; an antenna disposed in parallel to one surface of the support plate, the antenna having 1st to n-th turns (n=an integer greater than 4) spaced apart from each other and wound along one direction from an inner end; a plurality of supporters fixed between the (m−1)-th turn and the m-th turn of the antenna to limit movement of the (m−1)-th turn and the m-th turn (m=an integer greater than 3 and less than n); and a distance control unit capable of adjusting separation distances formed between the 1st to the (m−1)-th turns by rotating the inner end of the antenna in the one direction or in a direction opposite to the one direction, the distance control unit including a holder connected to the inner end of the antenna and a driving motor connected to the holder to rotate the antenna, wherein the antenna includes: an inner part having the 1st to the (m−1)-th turns and being located inside the supporters, the separation distances formed between the 1st to the (m−1)-th turns being adjustable when the antenna is rotated; and an outer part having the m-th to the n-th turns and being located outside the supporters, the separation distances formed between the m-th to the n-th turns being maintained substantially the same when the antenna is rotated, and wherein outward movement of the (m−1)-th turn and inward movement of the m-th turn are limited by the supporters.

2 . The apparatus of claim 1 , wherein an outer end of the antenna is fixed.

3 . The apparatus of claim 1 , wherein the support plate has a plurality of fixing grooves arranged to be spaced apart from a center, and the supporters are respectively inserted and fixed to the fixing grooves.

4 . The apparatus according to claim 1 , the apparatus further comprising:
a chamber having an inner space in which a process is performed on a substrate, and an upper portion thereof being opened; and a susceptor installed in the chamber on which the substrate is placed, wherein the support plate is installed above the chamber.

5 . The apparatus according to claim 2 , the apparatus further comprising:
a chamber having an inner space in which a process is performed on a substrate, and an upper portion thereof being opened; and a susceptor installed in the chamber on which the substrate is placed, wherein the support plate is installed above the chamber.

6 . The apparatus according to claim 3 , the apparatus further comprising:
a chamber having an inner space in which a process is performed on a substrate, and an upper portion thereof being opened; and a susceptor installed in the chamber on which the substrate is placed, wherein the support plate is installed above the chamber.

Assignees

• Eugene Technology Co Ltd

Inventors

• Kim Yong Ki
• Shin Yang Sik
• Huh Dong Been
• Lee Tae Ho

Classifications

• H10P72/00

  Handling or holding of wafers, substrates or devices during manufacture or treatment thereof · CPC title

• H10P95/00

  Generic processes or apparatus for manufacture or treatments not covered by the other groups of this subclass · CPC title

• H01J37/32715

  Workpiece holder · CPC title

• H01J37/32

  Gas-filled discharge tubes (heating by discharge H05B) · CPC title

• H01J37/3211 Primary

  Antennas, e.g. particular shapes of coils · CPC title