Reduced diameter carrier ring hardware for substrate processing systems

Patent metadata

Field	Value
Publication number	US-12480210-B2
Application number	US-202017619500-A
Country	US
Kind code	B2
Filing date	Jun 15, 2020
Priority date	Jun 18, 2019
Publication date	Nov 25, 2025
Grant date	Nov 25, 2025

Abstract

A substrate support for a substrate processing system includes a baseplate, a ceramic layer arranged on the baseplate, and a carrier ring arranged on the ceramic layer. The ceramic layer has a first outer diameter, the carrier ring has a second outer diameter that is less than the first outer diameter, the ceramic layer includes a shoulder that extends from the second outer diameter of the carrier ring to the first outer diameter, and the shoulder slopes downward toward the first outer diameter.

First claim

What is claimed is:

1 . A substrate support for a substrate processing system, the substrate support comprising:
a baseplate; a ceramic layer arranged directly on the baseplate, wherein the ceramic layer has a first outer diameter, a second outer diameter, and a third outer diameter, and the first outer diameter of the ceramic layer defines a support surface configured to support a substrate; and a carrier ring arranged directly on the ceramic layer, wherein the carrier ring has a fourth outer diameter that is greater than the second outer diameter of the ceramic layer and is less than the third outer diameter of the ceramic layer, the fourth outer diameter is an outermost diameter of the carrier ring, the ceramic layer includes a shoulder that extends from the second outer diameter of the ceramic layer to the third outer diameter, and the shoulder slopes downward from a location nearby the second outer diameter of the ceramic layer toward the third outer diameter at an angle between 10 and 45 degrees, wherein the shoulder of the ceramic layer is configured to reduce material accumulation on the carrier ring, wherein, the ceramic layer includes a downward step at the second outer diameter of the ceramic layer, and the downward step is below a bottom surface of a radially outer portion of the carrier ring to prevent contact between the shoulder of the ceramic layer and the bottom surface of the carrier ring.

2 . The substrate support of claim 1 , wherein the shoulder slopes downward from the second outer diameter to the third outer diameter.

3 . The substrate support of claim 1 , wherein the shoulder includes a sloped portion and a non-sloped portion.

4 . The substrate support of claim 3 , wherein the sloped portion extends from the second outer diameter to the non-sloped portion and the non-sloped portion extends from the sloped portion to the third outer diameter.

5 . The substrate support of claim 1 , wherein the ceramic layer is configured to support a 200 mm substrate.

6 . The substrate support of claim 5 , wherein an inner diameter of the carrier ring is less than a diameter of the substrate.

7 . The substrate support of claim 1 , wherein the shoulder slopes downward from the downward step to the third outer diameter.

8 . A processing chamber comprising the substrate support of claim 1 and further comprising a showerhead having a fifth outer diameter that is less than the second outer diameter.

9 . The processing chamber of claim 8 , wherein the fifth outer diameter is greater than an inner diameter of the carrier ring.

10 . The processing chamber of claim 8 , wherein a bottom outer edge of the showerhead is radiused.

11 . A substrate support for a substrate processing system, the substrate support comprising:
a baseplate; a ceramic layer arranged directly on the baseplate, wherein the ceramic layer has a first outer diameter, a second outer diameter, and a third outer diameter, and the first outer diameter of the ceramic layer defines a support surface configured to support a substrate; and a carrier ring arranged directly on the ceramic layer, wherein the carrier ring has a fourth outer diameter that is greater than the second outer diameter of the ceramic layer and is less than the third outer diameter of the ceramic layer, the fourth outer diameter is an outermost diameter of the carrier ring, and the ceramic layer includes a shoulder that slopes downward from a location nearby the second outer diameter of the ceramic layer to the third outer diameter, wherein the shoulder of the ceramic layer is configured to reduce material accumulation on the carrier ring, wherein, the ceramic layer includes a downward step at the second outer diameter of the ceramic layer, and the downward step is below a bottom surface of a radially outer portion of the carrier ring to prevent contact between the shoulder of the ceramic layer and the bottom surface of the carrier ring.

12 . The substrate support of claim 11 , wherein the shoulder includes a sloped portion and a non-sloped portion.

13 . The substrate support of claim 11 , wherein the ceramic layer is configured to support a 200 mm substrate.

14 . The substrate support of claim 13 , wherein an inner diameter of the carrier ring is less than a diameter of the substrate.

15 . The substrate support of claim 11 , wherein the downward step is at least 50% of a thickness of the ceramic layer.

Assignees

• Lam Res Corp

Inventors

• Madsen Eric

Classifications

• H10P72/7616

  characterised by a coating, a hardness or a material · CPC title

• H10P72/7611

  characterised by edge profile or support profile · CPC title

• H01J37/32715 Primary

  Workpiece holder · CPC title

• C23C16/45565

  Shower nozzles · CPC title

• H01J37/32642

  Focus rings · CPC title