Induction coil assembly for plasma processing apparatus

Patent metadata

Field	Value
Publication number	US-12476077-B2
Application number	US-202117550158-A
Country	US
Kind code	B2
Filing date	Dec 14, 2021
Priority date	Dec 28, 2020
Publication date	Nov 18, 2025
Grant date	Nov 18, 2025

Abstract

An induction coil assembly is disclosed including two induction coils. Each induction coil includes a first winding commencing from a first terminal end in a first position in the z-direction and transitioning to a radially inner position in a plane normal to the z-direction and a second winding commencing from the radially inner position and transitioning to a radially outer position in a second plane normal to the z-direction and terminating in a second terminal end. Plasma processing apparatuses incorporating the induction coil assembly are also provided.

First claim

What is claimed is:

1 . An induction coil assembly comprising:
a first induction coil having a first winding and a second winding, the first winding commencing from a first terminal end in a first position in a z-direction and transitioning to a radially inner position in a plane normal to the z-direction, the second winding commencing from the radially inner position and transitioning to a radially outer position in a second plane normal to the z-direction and terminating in a second terminal end; and a second induction coil having a first winding and a second winding, the first winding commencing from a first terminal end in a first position in the z-direction and transitioning to a radially inner position in a plane normal to the z-direction, the second winding commencing from the radially inner position and transitioning to a radially outer position in a second plane normal to the z-direction and terminating in a second terminal end; wherein the first induction coil and second induction coil are disposed in a stacked arrangement.

2 . The induction coil assembly of claim 1 , wherein a gap is defined between the first induction coil and the second induction coil, the gap being uniform along the first and second windings of the first induction coil and the second induction coil.

3 . The induction coil assembly of claim 2 , wherein the gap is about 1 mm to about 50 mm.

4 . The induction coil assembly of claim 1 , wherein the first induction coil and second induction coil each have a uniform height in the z-direction.

5 . The induction coil assembly of claim 1 , wherein the first winding of the first induction coil and the second winding of the second induction coil each have a uniform radius decrease, and wherein the second winding of the first induction coil and the second winding of the second induction coil each have a uniform radius increase.

6 . The induction coil assembly of claim 1 , wherein the first terminal end and second terminal end of the first induction coil and the first terminal end and second terminal end of the second induction coil are spaced at different azimuthal locations.

7 . The induction coil assembly of claim 1 , wherein the first and second terminal ends of the first induction coil and the first and second terminal ends of the second induction coil are spaced generally opposite from each other in an x-direction, the x-direction being generally perpendicular to the z-direction.

8 . The induction coil assembly of claim 1 , wherein the first terminal end of the first induction coil is disposed below the second terminal end of the first induction coil in the z-direction.

9 . The induction coil assembly of claim 1 , wherein the first terminal end of the second induction coil is disposed below the second terminal end of the second induction coil in the z-direction.

10 . The induction coil assembly of claim 1 , wherein the first terminal end of the first induction coil and the first terminal end of the second induction coil are configured to be coupled to an RF power source.

11 . The induction coil assembly of claim 1 , wherein the second terminal end of the first induction coil and the second terminal end of the second induction coil are configured to be coupled to ground via a capacitor.

12 . A plasma processing apparatus, comprising:
a processing chamber; a showerhead configured to feed one or more process gases into the processing chamber; a workpiece support disposed within the processing chamber, the workpiece support configured to support a workpiece; a plasma source configured to generate a plasma from the one or more process gases in the processing chamber, the plasma source comprising: a first induction coil having a first winding and a second winding, the first winding commencing from a first terminal end in a first position in a z-direction and transitioning to a radially inner position in a plane normal to the z-direction, the second winding commencing from the radially inner position and transitioning to a radially outer position in a second plane normal to the z-direction and terminating in a second terminal end; and a second induction coil having a first winding and a second winding, the first winding commencing from a first terminal end in a first position in the z-direction and transitioning to a radially inner position in a plane normal to the z-direction, the second winding commencing from the radially inner position and transitioning to a radially outer position in a second plane normal to the z-direction and terminating in a second terminal end; wherein the first induction coil and second induction coil are disposed in a stacked arrangement.

13 . The plasma processing apparatus of claim 12 , wherein the first terminal end of the first induction coil is disposed below the second terminal end of the first induction coil in the z-direction, and wherein the first terminal end of the second induction coil is disposed beneath the second terminal end of the second induction coil in the z-direction.

Assignees

• Mattson Tech Inc
• Beijing E Town Semiconductor Tech Co Ltd

Inventors

• Long Maolin
• Guan Yu

Classifications

• H10P72/0421

  for drying etching · CPC title

• H01J37/32577

  Electrical connecting means · CPC title

• H01J37/32119

  Windows · CPC title

• H01J37/321 Primary

  the radio frequency energy being inductively coupled to the plasma · CPC title

• H01J37/3211 Primary

  Antennas, e.g. particular shapes of coils · CPC title