Electrostatic discharge protection circuit

US12463115B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-12463115-B2
Application numberUS-202418442671-A
CountryUS
Kind codeB2
Filing dateFeb 15, 2024
Priority dateNov 23, 2020
Publication dateNov 4, 2025
Grant dateNov 4, 2025

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

    Technology tags used to group this patent with similar filings.

  7. Citations and related patents

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Abstract

Official abstract text for this publication.

An electrostatic discharge protection circuit includes: a first electrostatic discharge protection device structure; a first contact pad above the first electrostatic discharge protection device structure in a cross-sectional view; and below the first electrostatic discharge protection device structure in the cross-sectional view, a metal connection coupling the first electrostatic discharge protection device structure to a second contact pad remote from the first contact pad, wherein the metal connection in the cross-sectional view only partially overlaps the first electrostatic discharge protection device structure.

First claim

Opening claim text (preview).

What is claimed is: 1 . An electrostatic discharge protection circuit, comprising: a first electrostatic discharge protection device structure; a first contact pad above the first electrostatic discharge protection device structure in a cross-sectional view; and below the first electrostatic discharge protection device structure in the cross-sectional view, a metal connection coupling the first electrostatic discharge protection device structure to a second contact pad remote from the first contact pad, wherein the metal connection in the cross-sectional view only partially overlaps the first electrostatic discharge protection device structure, wherein the first electrostatic discharge protection device structure is laterally surrounded by a dielectric material, wherein at least part of the second contact pad is uncovered by a hole in the dielectric material, wherein the metal connection contacts the second contact pad through the hole in the dielectric material, wherein the first contact pad and the second contact pad are each a metal pad. 2 . The circuit of claim 1 , further comprising a molded carrier. 3 . The circuit of claim 1 , wherein the first electrostatic discharge protection device structure comprises one or more doped layers adjacent to the first contact pad. 4 . The circuit of claim 1 , wherein the first electrostatic discharge protection device structure is formed in a first area on a front side of a semiconductor substrate, wherein the second contact pad is formed in a second area on the front side of the semiconductor substrate, and wherein the metal connection connects the first electrostatic discharge protection device structure to the second area. 5 . The circuit of claim 4 , further comprising a carrier at a back side of the semiconductor substrate. 6 . The circuit of claim 5 , wherein the carrier is molded on the back side of the semiconductor substrate. 7 . The circuit of claim 4 , wherein a space between the first area and the second area is filled by the dielectric material. 8 . The circuit of claim 4 , wherein the metal connection is partly covered by the dielectric material. 9 . The circuit of claim 1 , wherein the first electrostatic discharge protection device structure comprises a Zener diode structure. 10 . The circuit of claim 1 , further comprising a passivation layer covering the metal connection such that the metal connection is sandwiched between the dielectric material and the passivation layer. 11 . The circuit of claim 10 , further comprising a mold compound layer covering the passivation layer such that the passivation layer is sandwiched between the dielectric material and the mold compound layer.

Assignees

Inventors

Classifications

  • Manufacture or treatment · CPC title

  • H10W20/40Primary

    Interconnections external to wafers or substrates, e.g. back-end-of-line [BEOL] metallisations or vias connecting to gate electrodes · CPC title

  • using diodes as protective elements · CPC title

  • H10D89/921Primary

    characterised by the configuration of the interconnections connecting the protective arrangements, e.g. ESD buses · CPC title

  • using silicon technology, e.g. SiGe · CPC title

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Frequently asked questions

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What does patent US12463115B2 cover?
An electrostatic discharge protection circuit includes: a first electrostatic discharge protection device structure; a first contact pad above the first electrostatic discharge protection device structure in a cross-sectional view; and below the first electrostatic discharge protection device structure in the cross-sectional view, a metal connection coupling the first electrostatic discharge pr…
Who is the assignee on this patent?
Infineon Technologies Ag
What technology area does this patent fall under?
Primary CPC classification H10W20/40. Mapped technology areas include Electricity.
When was this patent published?
Publication date Tue Nov 04 2025 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 11 related publications on this page (citations in our corpus or others sharing the same primary CPC).