Substrate treating apparatus and substrate treating method

US12463086B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-12463086-B2
Application numberUS-202217965050-A
CountryUS
Kind codeB2
Filing dateOct 13, 2022
Priority dateOct 14, 2021
Publication dateNov 4, 2025
Grant dateNov 4, 2025

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  1. Title

    What the patent document calls the invention.

  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

    Technology tags used to group this patent with similar filings.

  7. Citations and related patents

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Abstract

Official abstract text for this publication.

Provided is an apparatus for treating a substrate including: a processing vessel having a processing space; a support unit for supporting the substrate in the processing space and rotating the substrate; a liquid supply unit for supplying a processing liquid to the substrate; and a heating unit for heating the substrate, wherein the support unit includes: a spin chuck; a rotation driver for rotating the spin chuck; a chuck pin installed on the spin chuck to be rotated with the spin chuck; a chuck pin moving unit for moving the chuck pin between a contact position wherein the chuck pin is in contact with a side portion of the substrate and an open position at which the chuck pin is spaced apart from the side portion of the substrate, and the chuck pin moving unit moves the chuck pin while the substrate is rotated by the spin chuck.

First claim

Opening claim text (preview).

What is claimed is: 1 . An apparatus for treating a substrate, the apparatus comprising: a processing vessel having a processing space; a support unit for supporting the substrate in the processing space and rotating the substrate; a liquid supply unit for supplying a processing liquid to the substrate supported by the support unit; and a heating unit for heating the substrate, wherein the support unit includes: a spin chuck; a rotation driver for rotating the spin chuck; a chuck pin installed on the spin chuck so as to be rotated together with the spin chuck; and a chuck pin moving unit including a cam ring, a cam ring driver for rotating the cam ring, and a slip-ring assembly for providing power to the cam ring driver, wherein the chuck pin moving unit is configured for moving the chuck pin between a contact position at which the chuck pin is in contact with a side portion of the substrate and an open position at which the chuck pin is spaced apart from the side portion of the substrate, and the chuck pin moving unit moves the chuck pin while the substrate is rotated by the spin chuck. 2 . The apparatus of claim 1 , wherein the slip-ring assembly includes: a ring member rotated together with the spin chuck; and a brush member provided to be movable with respect to the ring member; and a moving member for moving the brush member in a direction closer to the ring member or a direction away from the ring member. 3 . The apparatus unit of claim 2 , wherein the brush member is provided to be selectively contactable to the ring member by the moving member. 4 . The apparatus of claim 2 , wherein the cam ring includes a protrusion protruding from an outer surface, and the chuck pin moving unit includes a rod member having one end coupled to the chuck pin and the other end that is in contact with the protrusion. 5 . The apparatus of claim 4 , wherein the protrusion includes a first inclined surface having a first inclination angle with respect to the outer surface of the cam ring, and a second inclined surface having a second inclination angle greater than the first inclination angle, and the other end of the rod member is provided to be movable along the first inclined surface of the protrusion. 6 . The apparatus of claim 5 , wherein the protrusion includes a first position closest to the outer surface of the cam ring on the first inclined surface, and a second position located farthest apart from the outer surface of the cam ring on the first inclined surface, and the other end of the rod member is moved between the first position and the second position. 7 . The apparatus of claim 6 , wherein when the other end of the rod member is located at the first position, the chuck pin is located at the contact position, and when the other end of the rod member is located at the second position, the chuck pin is located at the open position. 8 . The apparatus of claim 7 , wherein the spin chuck is rotated such that the substrate is rotated at a first speed or a second speed faster than the first speed, and the chuck pin moving unit locates the chuck pin at the open position while the substrate is rotated at the first speed. 9 . The apparatus of claim 7 , wherein the spin chuck is rotated such that the substrate is rotated at a first speed or a second speed faster than the first speed, the brush member is in contact with the ring member when the substrate is rotated at the first speed, and the brush member is not in contact with the ring member when the substrate is rotated at the second speed. 10 . The apparatus of claim 9 , wherein when the brush member is in contact with the ring member, the slip-ring assembly provides power to the cam ring driver, and when the brush member is not in contact with the ring member, the slip-ring assembly does not provide power to the cam ring driver. 11 . The apparatus of claim 1 , wherein the spin chuck has a through-hole penetrating in a vertical direction, and the heating unit heats a bottom surface of the substrate through the through-hole. 12 . The apparatus of claim 11 , wherein the heating unit includes a laser. 13 . The apparatus of claim 12 , wherein the spin chuck includes: a body portion; and an extension portion extending upwardly from an upper end of the body portion, and wherein an inner diameter of the extension portion increases toward the upper direction. 14 . An apparatus for treating a substrate, the apparatus comprising: a processing vessel having a processing space; a support unit for supporting the substrate in the processing space and rotating the substrate; and a liquid supply unit for supplying a processing liquid to the substrate supported by the support unit; wherein the support unit includes: a spin chuck; a rotation driver for rotating the spin chuck; a chuck pin installed on the spin chuck so as to be rotated together with the spin chuck; and a chuck pin moving unit including a cam ring, a cam ring driver for rotating the cam ring, and a slip-ring assembly for providing power to the cam ring driver, wherein the chuck pin moving unit is configured for moving the chuck pin between a contact position at which the chuck pin is in contact with a side portion of the substrate and an open position at which the chuck pin is spaced apart from the side portion of the substrate. 15 . The apparatus of claim 14 , wherein the slip-ring assembly includes: a ring member rotated together with the spin chuck; and a brush member provided to be movable with respect to the ring member; and a moving member for moving the brush member in a direction closer to the ring member or a direction away from the ring member, wherein the brush member is provided to be selectively contactable to the ring member by the moving member. 16 . The apparatus of claim 15 , wherein the cam ring includes a protrusion protruding from an outer surface, and the chuck pin moving unit includes a rod member having one end coupled to the chuck pin and the other end that is in contact with the protrusion. 17 . The apparatus of claim 16 , wherein the protrusion includes a first inclined surface having a first inclination angle with respect to the outer surface of the cam ring, and a second inclined surface having a second inclination angle greater than the first inclination angle, and the other end of the rod member is provided to be movable along the first inclined surface of the protrusion. 18 . The apparatus of claim 17 , wherein the protrusion includes a first position closest to the outer surface of the cam ring on the first inclined surface, and a second position located farthest apart from the outer surface of the cam ring on the first inclined surface, and the other end of the rod member is moved between the first position and the second position. 19 . The apparatus of claim 18 , wherein when the other end of the rod member is located at the first position, the chuck pin is located at the contact position, and when the other end of the rod member is located at the second position, the chuck pin is located at the open position. 20 . The apparatus of claim 15 , wherein when the brush member is in contact with the ring member, the slip-ring assembly provides power to the cam ring driver, and when the brush member is not in contact with the ring member, the slip-ring assembly does not provide power to the cam ring driver.

Assignees

Inventors

Classifications

  • characterised by the construction of the shaft · CPC title

  • characterised by a plurality of individual support members, e.g. support posts or protrusions · CPC title

  • characterised by a plurality of separate clamping members, e.g. clamping fingers · CPC title

  • mainly by radiation · CPC title

  • using mainly spraying means, e.g. nozzles · CPC title

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What does patent US12463086B2 cover?
Provided is an apparatus for treating a substrate including: a processing vessel having a processing space; a support unit for supporting the substrate in the processing space and rotating the substrate; a liquid supply unit for supplying a processing liquid to the substrate; and a heating unit for heating the substrate, wherein the support unit includes: a spin chuck; a rotation driver for rot…
Who is the assignee on this patent?
Semes Co Ltd
What technology area does this patent fall under?
Primary CPC classification H10P72/7608. Mapped technology areas include Electricity.
When was this patent published?
Publication date Tue Nov 04 2025 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 9 related publications on this page (citations in our corpus or others sharing the same primary CPC).