Liquid supply system and liquid preparation method

Patent metadata

Field	Value
Publication number	US-12448271-B2
Application number	US-202318495793-A
Country	US
Kind code	B2
Filing date	Oct 27, 2023
Priority date	Mar 26, 2021
Publication date	Oct 21, 2025
Grant date	Oct 21, 2025

Abstract

A liquid preparation method is provided. The method includes measuring, with a detection member, a quantity of a liquid stored in a liquid tank by emitting a detection signal toward a floating member positioned in a tube. The tube extends in a height direction of the liquid tank and fluidly connects to two connecting ports of the liquid tank that are located at opposite sides of a surface of the liquid, and the position of the floating member in the tube varies according to a level of the liquid in the liquid tank. The method also includes regulating the liquid in the liquid tank in response to the quantity of the liquid in the liquid tank.

First claim

What is claimed is:

1. A liquid preparation method in a liquid supply system, comprising:
supplying a liquid from a liquid tank to a processing tool in which a wafer is located;
measuring, with a detection member, a quantity of the liquid stored in the liquid tank by emitting a detection signal toward a floating member positioned in a tube, wherein the tube extends in a height direction of the liquid tank and fluidly connects to two connecting ports of the liquid tank that are located at opposite sides of a surface of the liquid, and the position of the floating member in the tube varies according to a level of the liquid in the liquid tank; and
regulating the liquid in the liquid tank in response to the quantity of the liquid in the liquid tank,
wherein the detection signal is transmitted to the tube via an upper connecting line that connects an upper end of the tube to the liquid tank, and the detection signal from the detection member in the upper connecting line travels along a longitudinal direction of the tube.

2. The liquid preparation method of claim 1 , wherein the detection signal projecting on the floating member and reflected by the floating member are both transmitted parallel to the longitudinal direction of the tube.

3. The liquid preparation method of claim 1 , wherein the detection signal is reflected by a flat surface of the floating member.

4. The liquid preparation method of claim 3 , wherein the flat surface is on a top surface of the floating member.

5. The liquid preparation method of claim 3 , wherein the flat surface is on a bottom surface of the floating member.

6. The liquid preparation method of claim 1 , wherein the detection signal comprises a laser beam.

7. The liquid preparation method of claim 1 , wherein the regulating the liquid in the liquid tank comprises refilling the liquid tank with the liquid, mixing at least two liquids in the liquid tank, initiating a circulation process of the liquid, and stopping a delivery of the liquid from the liquid tank.

8. The liquid preparation method of claim 1 , wherein the measurement of the quantity of the liquid stored in the liquid tank comprises:
calculating a time interval (Δt) between a first time point (t1) when the detection signal is generated by a signal source of the detection member and a second time point (t2) when a signal receiver of the detection member receives the detection signal reflected from the floating member; and
calculating a distance (D) between the detection member and the floating member according to the equation of D=c*Δt/2, where c is speed of light.

9. The liquid preparation method of claim 1 , further comprising monitoring whether an abnormality occurs in the liquid supply system based on the measurement of the quantity of the liquid stored in the liquid tank.

10. The liquid preparation method of claim 1 , wherein the detection signal transmitted in the tube travels in a direction parallel to the height direction of the liquid tank.

11. A liquid preparation method in a liquid supply system, comprising:
supplying a liquid from a liquid tank to a processing tool through a discharging piping;
determining whether an abnormal of the supplying of the liquid occurs by measuring a height of chemical liquid in a tube which is connected to the liquid tank, wherein the measurement of the height of chemical liquid comprises:
emitting, by a signal source, a detection signal toward a floating member which is positioned in the tube that positioned outside of the liquid tank; and
calculating a time interval (Δt) between a first time point (t1) when the detection signal is generated by the signal source and a second time point (t2) when a signal receiver receives the detection signal reflected from the floating member, wherein when the time interval (Δt) is greater than a predetermined value, a controller determines the abnormality occurs.

12. The liquid preparation method of claim 11 , wherein the abnormal of the supplying of the liquid represents a leakage of chemical liquid outside of the discharging piping.

13. The liquid preparation method of claim 11 , wherein the measurement of the height of chemical liquid further comprises calculating a distance (D) between the signal source and the floating member according to the equation of D=c*Δt/2, where c is speed of light.

14. The liquid preparation method of claim 11 , wherein the signal source is mounted on an upper end of the tube which is made of transparent material, the detection signal generated by the signal source passes through the upper end of the tube and then is transmitted to the floating member.

15. The liquid preparation method of claim 11 , wherein the detection signal comprises a laser beam.

16. A liquid preparation method in a liquid supply system, comprising:
preparing a liquid mixture by the following operations:
supplying a liquid tank with a first type of liquid;
measuring, with a detection member, the amount of the first type of liquid filled into the liquid tank by emitting a detection signal toward a floating member positioned in a tube, wherein the tube extends in a height direction of the liquid tank and fluidly connects to two connecting ports of the liquid tank that are located at opposite sides of a surface of the liquid mixture, and the position of the floating member in the tube varies according to a level of the liquid mixture in the liquid tank; and
stopping the supply of the first type of liquid when the amount of the first type of liquid filled into the liquid tank reaches a first desired amount; and

supplying the liquid mixture in the liquid tank to a processing tool for processing a semiconductor wafer after the preparation of the liquid mixture,
wherein the preparation of the liquid mixture further comprises:
supplying the liquid tank with a second type of liquid;
measuring, with the detection member, the amount of the second type of liquid filled into the liquid tank;
stopping the supply of the second type of liquid when the amount of the second type of liquid filled into the liquid tank reaches a second desired amount; and
blending the first type of liquid and the second type of liquid in the liquid tank.

17. The liquid preparation method of claim 16 , wherein the detection signal projecting on the floating member and reflected by the floating member are both transmitted parallel to a longitudinal direction of the tube.

18. The liquid preparation method of claim 16 , wherein the detection member is mounted on an upper end of the tube which is made of transparent material, the detection signal generated by the detection member passes through the upper end of the tube and then is transmitted to the floating member.

19. The liquid preparation method of claim 16 , wherein the detection signal comprises a laser beam.

20. The liquid preparation method of claim 16 , wherein the detection signal transmitted in the tube travels in a direction parallel to the height direction of the liquid tank.

Assignees

• Taiwan Semiconductor Mfg Co Ltd

Inventors

• Chiang Fang-Pin
• Lai Chi-Tung
• Tseng Heng-Yi

Classifications

• H10P72/0402

  Apparatus for fluid treatment (H10P72/0441, H10P72/0448 take precedence) · CPC title

• H10P72/0604

  Process monitoring, e.g. flow or thickness monitoring · CPC title

• H10P72/0422

  for wet etching · CPC title

• H10P72/0411

  for wet cleaning or washing · CPC title

• H10P72/0404 Primary

  for general liquid treatment, e.g. etching followed by cleaning · CPC title