Lamination transfer films for forming antireflective structures
US-10436946-B2 · Oct 8, 2019 · US
US12429763B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-12429763-B2 |
| Application number | US-202017616312-A |
| Country | US |
| Kind code | B2 |
| Filing date | Jun 3, 2020 |
| Priority date | Jun 3, 2019 |
| Publication date | Sep 30, 2025 |
| Grant date | Sep 30, 2025 |
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Processes for producing layered components that may include depositing a strike layer on a substrate; forming a nanomaterial layer on the strike layer, the nanomaterial layer having a nanotextured surface comprising a plurality of nanofeatures; embedding a polymeric material at least partially within the nanotextured surface; and separating the strike layer from the substrate to obtain the layered component. Layered components that may include a nanomaterial layer having a nanotextured surface comprising a plurality of nanofeatures; and a polymeric material at least partially embedded within the nanotextured surface. Nanotextured polymeric materials and layered components produced by various processes.
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What is claimed is: 1. A process for producing a layered component, the process comprising: depositing a strike layer on a substrate; forming a nanomaterial layer on the strike layer, the nanomaterial layer having nanotextured surface comprising a plurality of nanofeatures; embedding a polymeric material at least partially within the nanotextured surface; and separating the strike layer from the substrate to obtain the layered component, with at least a portion of the strike layer remaining with the layered component; wherein an adhesion between the strike layer and the substrate is weaker than an adhesion between the strike layer and the nanomaterial layer such that a portion of the strike layer remains with the layered component. 2. The process according to claim 1 , wherein the plurality of nanofeatures are selected from the group consisting of nanorods, nanosheets, nanobumps, nanoholes, nanocracks, and combinations thereof. 3. The process according to claim 1 , wherein the substrate comprises a first metallic material, wherein the strike layer comprises a second metallic material, and wherein the first metallic material and the second metallic material do not form an alloy. 4. The process according to claim 1 , wherein forming the nanomaterial layer on the strike layer comprises growing the nanomaterial layer on the strike layer by partially or completely consuming the strike layer to form an alloy or mixed oxide. 5. The process according to claim 4 , wherein the alloy or mixed oxide is one selected from the group consisting of Ag—Cu, Au—Cu, Cu—CuO, Au—CuO, CuO—ZnO, AgO—ZnO, AuO—ZnO, AlO—ZnO, CuO—NiO, AgO—NiO, AuO—NiO, AlO—NiO, and Au—Si. 6. The process according to claim 1 , wherein forming the nanomaterial layer comprises one selected from the group consisting of etching the strike layer to form the nanomaterial layer, depositing the nanomaterial layer onto the strike layer, and combinations thereof. 7. The process according to claim 1 , further comprising etching one selected from the group consisting of the strike layer, the nanomaterial layer, and combinations thereof to expose a nanotextured surface of the polymeric material. 8. The process according to claim 1 , further comprising curing the polymeric material. 9. The process according to claim 1 , wherein the polymeric material comprises one selected from the group consisting of an epoxy, a urethane, a thermoplastic resin, a thermoset resin, a photoresin, and combinations thereof.
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