Lamination transfer films for forming antireflective structures

Patent metadata

Field	Value
Publication number	US-10436946-B2
Application number	US-201715493871-A
Country	US
Kind code	B2
Filing date	Apr 21, 2017
Priority date	Jan 20, 2014
Publication date	Oct 8, 2019
Grant date	Oct 8, 2019

Abstract

Transfer films, articles made therewith, and methods of making and using transfer films that include antireflective structures are disclosed.

First claim

What is claimed is:

1. A method, comprising:
laminating a planar surface of a transfer film onto a receptor substrate, the transfer film comprising:
a carrier film;
a sacrificial template layer disposed on the carrier film and comprising nanostructure template features, each nanostructure template feature comprising a portion of a discontinuous masking layer and having a longest dimension of 1 nm to 2000 nm and a height to width ratio of 5:1 to 200:1 and formed by reactive ion etching; and
a thermally stable backfill layer having a structured surface opposite of the planar surface, the structured surface conforming to the nanostructure template features; and

baking out the sacrificial template layer to form a thermally stable backfill layer having nanostructure features, wherein the portion of a discontinuous masking layer remains in each nanostructure feature.

2. The method according to claim 1 , further comprising removing the carrier film from the sacrificial template layer before the baking out step.

3. The method according to claim 1 , wherein the nanostructure features of the thermally stable backfill layer are disposed on microstructure features of the thermally stable backfill layer.

4. The method according to claim 1 , wherein the receptor substrate is glass.

5. The method according to claim 1 , wherein the receptor substrate is sapphire.

6. The method according to claim 1 , wherein the nanostructure features of the thermally stable backfill layer are antireflective nanostructure features.

7. The method according to claim 1 , wherein the nanostructure features of the thermally stable backfill are quasi-periodic, engineered, antireflective nanostructure template features.

8. The method according to claim 1 , wherein the thermally stable backfill layer comprises polysiloxane, polysilazane, polyimide, silsesquioxane, or a combination thereof.

9. The method according to claim 1 , wherein the thermally stable backfill layer comprises polysiloxane.

10. The method according to claim 1 , wherein the thermally stable backfill layer exhibits an average reflectance of between about 0.7% and about 7% when measured at a 10° incidence angle.

11. The method according to claim 1 , wherein the nanostructure features of the thermally stable backfill layer are random, engineered, antireflective nanostructure features.

12. The method according to claim 1 , wherein the discontinuous masking layer is applied by a sputtering technique.

13. The method according to claim 12 , wherein the reactive ion etching is performed simultaneously with the sputtering of the discontinuous masking layer.

Assignees

• 3M Innovative Properties Co

Inventors

• Free Michael Benton
• Meyer Justin P
• Benson Jr Olester
• Collier Terry O
• Mazurek Mieczyslaw H
• Wolk Martin B
• David Moses M

Classifications

• B32B37/025

  Transfer laminating · CPC title

• C03C2217/77

  Coatings having a rough surface · CPC title

• B32B2037/243

  Coating · CPC title

• C03C2217/732

  made of a single layer · CPC title

• B32B38/10

  Removing layers, or parts of layers, mechanically or chemically · CPC title