Scrubber system and wet cleaning method using the same

Patent metadata

Field	Value
Publication number	US-12409404-B2
Application number	US-202418442528-A
Country	US
Kind code	B2
Filing date	Feb 15, 2024
Priority date	Jan 19, 2021
Publication date	Sep 9, 2025
Grant date	Sep 9, 2025

Abstract

A scrubber system may include a scrubber housing including a vertically extended cleaning space, an inflow chamber coupled to a bottom portion of the scrubber housing, and first and second inflow portions, each of which is configured to supply a gas into the inflow chamber. The inflow chamber may include a mixing space, and the mixing space may be connected to the cleaning space. The first inflow portion may include a first connection pipe coupled to the inflow chamber to provide a first connection path and the second inflow portion may include a second connection pipe coupled to the inflow chamber to provide a second connection path. The first and second connection paths may be extended toward the mixing space in opposite directions, respectively, and may be connected to opposite portions of the mixing space, respectively.

First claim

What is claimed is:

1. A wet cleaning method, comprising:
supplying a first gas from a first process chamber into an inflow chamber through a first inflow portion;
supplying a second gas from a second process chamber into the inflow chamber through a second inflow portion;
colliding the first and second gases with each other within the inflow chamber;
rising the first and second gases toward a scrubber housing that is placed on the inflow chamber, the first and second inflow portions being below the scrubber housing;
downwardly spraying a cleaning solution through a spray nozzle in the scrubber housing above the inflow chamber and the first and second inflow portions; and
hydrolyzing an ingredient, the ingredient being included in at least one of the first gas or the second gas, with the cleaning solution sprayed through the spray nozzle.

2. The method of claim 1 , wherein the colliding of the first and second gases is performed to produce powder.

3. The method of claim 2 , wherein the first gas or the second gas include at least one of TiCl4, NH3, HCl, or Cl2.

4. The method of claim 1 , wherein at least one of the first process chamber or the second process chamber include an atomic layer deposition (ALD) chamber.

5. The method of claim 1 , wherein the cleaning solution dissolves the ingredient and then is drained to a wet tank below the scrubber housing.

6. The method of claim 1 , wherein the scrubber housing including a cleaning space, the cleaning space being vertically extended.

7. The method of claim 6 , wherein the scrubber housing having a bottom surface extending under the cleaning space.

8. The method of claim 7 , wherein the inflow chamber includes a mixing space.

9. The method of claim 8 , wherein the mixing space surrounded by and defined by an outer wall of the inflow chamber, the outer wall of the inflow chamber laterally overlapping with an outer wall of the scrubber housing and extending axially below the bottom surface of the scrubber housing.

10. The method of claim 8 , wherein the mixing space surrounded by and defined by an outer wall of the inflow chamber, the outer wall of the inflow chamber extending axially below the bottom surface of the scrubber housing.

11. A wet cleaning method, comprising:
supplying a first gas from a first process chamber into an inflow chamber through a first inflow portion;
supplying a second gas from a second process chamber into the inflow chamber through a second inflow portion;
colliding the first and second gases with each other within the inflow chamber;
rising the first and second gases toward a scrubber housing that is placed on the inflow chamber;
downwardly spraying a cleaning solution through a spray nozzle in the scrubber housing; and
hydrolyzing an ingredient, the ingredient being included in at least one of the first gas or the second gas, with the cleaning solution sprayed through the spray nozzle,
wherein the scrubber housing including a cleaning space, the cleaning space being vertically extended, the scrubber housing having a bottom surface extending under the cleaning space, and
wherein the inflow chamber includes a mixing space surrounded by and defined by an outer wall of the inflow chamber, the outer wall of the inflow chamber laterally overlapping with an outer wall of the scrubber housing and extending axially below the bottom surface of the scrubber housing.

Assignees

• Samsung Electronics Co Ltd
• Global Standard Tech Co Ltd

Inventors

• Roh Young Seok
• Gim Suji
• Kim Heesub
• Park Hee Ock
• Bae Jongyong
• Yoon Sung Chul
• Lee Sunsoo
• Jeon Dong Keun
• Joo Jinkyoung

Classifications

• H01J37/32844

  Treating effluent gases · CPC title

• B08B9/0813

  by the force of jets or sprays · CPC title

• C23C16/4407

  Cleaning of reactor or reactor parts by using wet or mechanical methods · CPC title

• C23C16/4412

  Details relating to the exhausts, e.g. pumps, filters, scrubbers, particle traps · CPC title

• B01D53/78

  with gas-liquid contact · CPC title