Tunable Resistive Element
US-2020235294-A1 · Jul 23, 2020 · US
US12396376B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-12396376-B2 |
| Application number | US-202217978954-A |
| Country | US |
| Kind code | B2 |
| Filing date | Nov 1, 2022 |
| Priority date | Nov 1, 2022 |
| Publication date | Aug 19, 2025 |
| Grant date | Aug 19, 2025 |
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A non-volatile memory apparatus includes a first hydrogen reservoir, which is electrically conductive; a charge of hydrogen, which is captured in the first hydrogen reservoir; a dielectric layer that has a first side that is adjacent to the first hydrogen reservoir and a second side that is opposite from the first hydrogen reservoir; a second hydrogen reservoir that is adjacent to the second side of the dielectric layer, is electrically conductive, and has a side that is opposite from the dielectric layer; and a piezoelectric layer that is adjacent to the side of the second hydrogen reservoir and that has a side that is opposite from the second hydrogen reservoir.
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What is claimed is: 1. A non-volatile memory apparatus that comprises: a first hydrogen reservoir, wherein the first hydrogen reservoir is electrically conductive; a charge of hydrogen, which is captured in the first hydrogen reservoir; a dielectric layer that has a first side that is adjacent to the first hydrogen reservoir and a second side that is opposite from the first hydrogen reservoir; a second hydrogen reservoir that is adjacent to the second side of the dielectric layer, wherein the second hydrogen reservoir is electrically conductive and has a side that is opposite from the dielectric layer; and a piezoelectric layer that is adjacent to the side of the second hydrogen reservoir and that has a side that is opposite from the second hydrogen reservoir. 2. The apparatus of claim 1 , wherein each of the first and second hydrogen reservoirs comprises a metal. 3. The apparatus of claim 2 , wherein each of the first and second hydrogen reservoirs comprises a same metal. 4. The apparatus of claim 2 , wherein each of the first and second hydrogen reservoirs comprises a metal selected from the list consisting of: palladium, platinum, vanadium, tungsten, hafnium, zirconium, niobium, tantalum, and titanium. 5. The apparatus of claim 1 , wherein the dielectric layer comprises phosphosilicate glass. 6. The apparatus of claim 1 , further comprising: a first programming contact that is electrically connected to the first hydrogen reservoir; a second programming contact that is electrically connected to the second hydrogen reservoir; a conductive neutral layer that is adjacent to the side of the piezoelectric layer that is opposite from the second hydrogen reservoir, and a readout circuit that is electrically connected to at least one of the first and second hydrogen reservoirs. 7. The apparatus of claim 6 , wherein the readout circuit is connected across the first and second hydrogen reservoirs. 8. The apparatus of claim 6 , wherein the readout circuit is connected across the second hydrogen reservoir and the neutral layer. 9. The apparatus of claim 6 , wherein the readout circuit comprises an operational amplifier. 10. The apparatus of claim 9 , wherein the readout circuit comprises a sense amplifier. 11. The apparatus of claim 10 , wherein the readout circuit comprises a latch circuit. 12. The apparatus of claim 1 , wherein each of the first and second hydrogen reservoirs comprises a film of metal that is between about 10 nm and about 50 nm thick and wherein a longest dimension of each reservoir is about 50 nm to about 100 nm. 13. The apparatus of claim 1 , wherein the piezoelectric layer comprises a material selected from the list consisting of: lead zirconate titanate, barium niobate, and ferroelectric hafnium oxide. 14. A method for operating a non-volatile memory apparatus, which comprises first and second hydrogen reservoirs, a dielectric layer that partitions the hydrogen reservoirs, a piezoelectric layer that is adjacent to the second hydrogen reservoir, and a neutral layer that is at a side of the piezoelectric layer opposite from the second hydrogen reservoir, the method comprising: setting a high bit on the memory apparatus by inducing a strain on the piezoelectric layer, wherein inducing the strain comprises: moving hydrogen from the first hydrogen reservoir through the dielectric layer to the second hydrogen reservoir, wherein moving the hydrogen comprises: applying an electric field across the hydrogen reservoirs. 15. The method of claim 14 , further comprising: reading the high bit from the memory apparatus by connecting a readout circuit to at least one of the hydrogen reservoirs. 16. The method of claim 15 , wherein connecting the readout circuit comprises connecting the readout circuit across the hydrogen reservoirs. 17. The method of claim 15 , wherein connecting the readout circuit comprises connecting the readout circuit across the second hydrogen reservoir and the neutral layer. 18. The method of claim 15 , wherein connecting the readout circuit comprises connecting a pair of operational amplifiers across the hydrogen reservoirs, wherein the pair of operational amplifiers form part of a high-input-impedance amplifier. 19. A piezoelectric memory apparatus comprising: a piezoelectric layer; programmable means for placing and removing a strain on the piezoelectric layer so as to store a value directly in the piezoelectric layer; and a readout circuit that is connected to the programmable means to read out the value stored directly in the piezoelectric layer. 20. A piezoelectric memory apparatus comprising: a piezoelectric layer; programmable means for placing and removing a strain on the piezoelectric layer; and a readout circuit that is connected to the programmable means; wherein the programmable means comprise a dielectric layer, a first hydrogen reservoir that is disposed at a first side of the dielectric layer, a second hydrogen reservoir that is disposed at a second side of the dielectric layer that is opposite from the first hydrogen reservoir and between the dielectric layer and the piezoelectric layer, and a charge of hydrogen in at least one of the hydrogen reservoirs.
Structure including two electrodes, a memory active layer and at least two other layers which can be a passive or source or reservoir layer or a less doped memory active layer · CPC title
Material having complex metal oxide, e.g. perovskite structure · CPC title
Write using strain induced by, e.g. piezoelectric, thermal effects · CPC title
Complex metal oxides, e.g. perovskites, spinels · CPC title
based on migration or redistribution of ionic species, e.g. anions, vacancies · CPC title
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