Method of manufacturing printed circuit board
US-12144122-B2 · Nov 12, 2024 · US
US12371798B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-12371798-B2 |
| Application number | US-202117998980-A |
| Country | US |
| Kind code | B2 |
| Filing date | Nov 16, 2021 |
| Priority date | Nov 24, 2020 |
| Publication date | Jul 29, 2025 |
| Grant date | Jul 29, 2025 |
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A regenerating method of a removal liquid including: removing a nickel-chromium-containing layer from a substrate using the removal liquid at a time of manufacturing a printed circuit board by a semi-additive method, the substrate including the nickel-chromium-containing layer and a copper-containing layer; collecting the removal liquid that has been used; and contacting the collected removal liquid in collecting the removal liquid with a chelate resin, wherein the chelate resin includes a functional group represented by a following formula (1):where a plurality of Rs are identical divalent hydrocarbon groups having 1 to 5 carbons, and a portion of hydrogen atoms in the hydrocarbon groups are substituted with halogen atoms or not substituted with a halogen atom.
Opening claim text (preview).
The invention claimed is: 1. A regenerating method of a removal liquid comprising: removing a nickel-chromium-containing layer from a substrate using the removal liquid at a time of manufacturing a printed circuit board by a semi-additive method, the substrate including the nickel-chromium-containing layer and a copper-containing layer; collecting the removal liquid that has been used; and contacting the collected removal liquid in collecting the removal liquid with a chelate resin, wherein the chelate resin includes a functional group represented by a following formula (1): where a plurality of Rs are identical divalent hydrocarbon groups having 1 to 5 carbons, and some of hydrogen atoms in the hydrocarbon groups are substituted with halogen atoms or not substituted with a halogen atom. 2. The regenerating method according to claim 1 , the functional group is a bis(2-pyridylmethyl)amino group. 3. A regenerated removal liquid used in a semi-additive method obtained by the regenerating method according to claim 1 , the regenerated removal liquid comprising: a pyridine-based compound that includes the functional group represented by the following formula (1): chloride ions; and copper ions, wherein the pyridine-based compound is present at a concentration of more than 0 ppm and 5,000 ppm or less, the copper ions are present at a concentration of 1 ppm or more and 2,000 ppm or less, and a pH of the regenerated removal liquid is 1 or less.
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