Method for thermo-mechanical control of a heat sensitive element and device for use in a lithographic production process

Patent metadata

Field	Value
Publication number	US-12339592-B2
Application number	US-202118010637-A
Country	US
Kind code	B2
Filing date	Jun 2, 2021
Priority date	Jul 1, 2020
Publication date	Jun 24, 2025
Grant date	Jun 24, 2025

Abstract

The invention provides a method for thermo-mechanical control of a heat sensitive element (MI) subject to a heat load, comprising: —providing a non-linear thermo-mechanical model of the heat sensitive element describing a dynamical relationship between characteristics of the heat load and deformation of the heat sensitive element; —calculating a control signal on the basis of an optimization calculation of the non-linear model, —providing an actuation signal to a heater (HE), wherein the actuation signal is at least partially based on the control signal, —heating the heat sensitive element by the heater on the basis of the actuation signal.

First claim

The invention claimed is:

1. A method for thermo-mechanical control of a heat sensitive element subject to a heat load, comprising:
providing a non-linear thermo-mechanical model of the heat sensitive element describing a dynamical relationship between the heat load on the heat sensitive element and deformation of the heat sensitive element,
at a first time step, calculating, for each of a plurality of future time steps including a next time step, a feedforward control signal on the basis of an optimization calculation of the non-linear model, the optimization calculation configured to optimize the deformation of the heat sensitive element throughout a prediction horizon corresponding to the plurality of future time steps, taking into account constraints on actuation limits of the heater,
at the next time step, providing an actuation signal to a heater, wherein the actuation signal is at least partially based on the control signal calculated at the first time step, and
heating the heat sensitive element by the heater on the basis of the actuation signal.

2. The method of claim 1 , wherein the non-linear model comprises a 3D model of the heat sensitive element describing a spatially non-uniform dynamical relationship between the heat load and the deformation of the heat sensitive element.

3. The method of claim 1 , wherein the heat load comprises heat of a radiation beam impinging on the heat sensitive element and heat provided by the heater,
wherein the method comprises:
measuring aberration signals representative for wavefront aberrations of the radiation beam, and
using the aberration signals to calculate the control signal.

4. The method of claim 1 , wherein the heater comprises multiple heater segments, which are configured to be individually controlled and are arranged to heat different parts of the heat sensitive element,
wherein the step of providing the actuation signal to the heater comprises providing an individual actuation signal to each of the heater segments.

5. The method of claim 1 , wherein the method comprises:
measuring one or more strain signals at one or more measurement locations of the heat sensitive element, wherein the one or more strain signals are representative for deformation of the heat sensitive element at the one or more measurement locations, and
using the strain signals to calculate the control signal.

6. The method of claim 1 , wherein the method comprises:
determining a feedback signal on the basis of the temperature signals, wherein the feedback signal is part of the actuation signal provided to the heater.

7. The method of claim 1 , wherein the heat sensitive element is a mirror or lens of a projection system of a lithographic apparatus,
wherein the optimization calculation is configured to minimize thermo-mechanical effects that result in wave front errors of the radiation beam.

8. The method of claim 1 , wherein the method comprises the step of updating the non-linear model on the basis of system setting data and/or system calibration data.

9. The method of claim 1 , wherein the non-linear model is a full-order model,
wherein the optimization calculation comprises an iterative calculation method using solutions for lower-dimensional problems to correct full-order calculations.

10. The method of claim 1 , wherein the optimization calculation comprises using a cost function to find a control signal value sequence over a finite time horizon that minimizes the cost function.

11. The method of claim 10 , wherein the cost function comprises any of the following functions: root-mean-square cost function, Zernike functions, pattern shift, best focus, or critical dimension uniformity.

12. The method of claim 1 , further comprising:
measuring one or more temperature signals of one or more measurement locations of the heat sensitive element, and
using the temperature signals to calculate the control signal.

13. A device for use in a lithographic production process, the device comprising:
a light source arranged to provide a radiation beam,
a heat sensitive element arranged to be impinged by the radiation beam,
a heater arranged to heat the heat sensitive element to control a temperature of the heat sensitive element, and
a control device configured to provide a feedforward control signal as part of the actuation signal, wherein the control device comprises a non-linear thermo-mechanical model of the heat sensitive element describing a dynamical relationship between a heat load on the heat sensitive element and a deformation of the heat sensitive element, and wherein the control device is configured to:
at a first time step, calculate, for each of a plurality of future time steps including a next time step, the control signal on the basis of an optimization calculation of the non-linear model, the optimization calculation configured to optimize the deformation of the heat sensitive element throughout a prediction horizon corresponding to the plurality of future timesteps, taking into account constraints on actuation limits of the heater,
at the next time step, provide an actuation signal to the heater, the actuation signal being at least partially based on the control signal calculated at the first time step, and
heat the heat sensitive element by the heater on the basis of the actuation signal.

14. The method of claim 1 , wherein the heat sensitive element is a mirror or lens of a projection system of a lithographic apparatus,
wherein the optimization calculation includes optimization for scanner and imaging characteristics.

15. The method of claim 14 , wherein the scanner and imaging characteristics include overlay, focus, and critical dimension of a lithographic process.

16. The device of claim 13 , wherein the heat load comprises heat of a radiation beam impinging on the heat sensitive element and heat provided by the heater.

17. A device for use in a lithographic production process, the device comprising:
a heater arranged to heat a heat sensitive element in a path of a radiation beam, the heater configured to control a temperature of the heat sensitive element, and
a control device comprising a non-linear thermo-mechanical model of the heat sensitive element describing a dynamical relationship between a heat load on the heat sensitive element and a deformation of the heat sensitive element, wherein the control device is configured to:
at a first time step, calculate, for each of a plurality of time steps including a next time step, a feedforward control signal on the basis of an optimization calculation of the non-linear model, the optimization calculation configured to optimize the deformation of the heat sensitive element throughout a prediction horizon corresponding to the plurality of future time steps, taking into account constraints on actuation limits of the heater,
at the next time step, provide an actuation signal to the heater, the actuation signal being at least partially based on the control signal calculated at the first time step, and
heat the heat sensitive element by the heater on the basis of the actuation signal.

18. The device of claim 17 , wherein the heat load comprises heat of a radiation beam impinging on the heat sensitive element and heat provided by the heater.

19. A method for thermo-mechanical control of a heat sensitive optical element subject to heating by a radiation beam, the method comprising:
optimizing, over a time series as a whole, a modelled deformation of the heat sensitive optical element, taking into account heating by the

Assignees

• Asml Netherlands Bv

Inventors

• Dolk Victor Sebastiaan
• Van Berkel Koos
• Schneiders Mauritius Gerardus Elisabeth

Classifications

• G03F7/706

  Aberration measurement · CPC title

• G03F7/70525

  Controlling normal operating mode, e.g. matching different apparatus, remote control or prediction of failure · CPC title

• G03F7/70504

  Optical system modelling, e.g. lens heating models · CPC title

• G03F7/7085

  Detection arrangement, e.g. detectors of apparatus alignment possibly mounted on wafers, exposure dose, photo-cleaning flux, stray light, thermal load · CPC title

• G03F7/705

  Modelling or simulating from physical phenomena up to complete wafer processes or whole workflow in wafer productions · CPC title