Method and apparatus for controlling a lithographic apparatus, and a lithographic apparatus
US-2026079406-A1 · Mar 19, 2026 · US
Optical system modelling, e.g. lens heating models
Optical system modelling, e.g. lens heating models · Cooperative Patent Classification (CPC)
Computing, optics, measurement, and control technologies.
Related technology areas
Mapped technology topics for this CPC code.
| Metric | Value |
|---|---|
| CPC code | G03F7/70504 |
| Official title | {Optical system modelling, e.g. lens heating models} |
| Display label | Optical system modelling, e.g. lens heating models |
| Total patents | 52 |
Filing trend
Year-over-year patent counts classified under this CPC code.
Filing activity over the last five years is rapidly growing.
| Year | Patents |
|---|---|
| 2017 | 2 |
| 2019 | 2 |
| 2020 | 2 |
| 2021 | 1 |
| 2022 | 4 |
| 2023 | 8 |
| 2024 | 11 |
| 2025 | 18 |
| 2026 | 4 |
Representative patents
Representative publications under this CPC code from precomputed stats, or recent filings when stats are unavailable.
Method for calibrating a manipulable optical module
US-12578654-B2 · Mar 17, 2026 · US
Method for operating a solid-state actuator in a microlithographic projection exposure apparatus
US-2026072357-A1 · Mar 12, 2026 · US
Extreme ultraviolet lithography device and operating method thereof
US-2026036913-A1 · Feb 5, 2026 · US
Method for optimizing mask absorption material based on surface plasmon multilayer structure, and plasmonic superlens
US-2025355145-A1 · Nov 20, 2025 · US
Method for simulating illumination and imaging properties of an optical production system when an object is illuminated and imaged by means of an optical measurement system
US-2025334886-A1 · Oct 30, 2025 · US
Method and computer device for determining the exposure position of exposure tool
US-2025328772-A1 · Oct 23, 2025 · US
Apparatus and method for correcting mask for fabricating semiconductor device
US-2025306454-A1 · Oct 2, 2025 · US
Lithography system and semiconductor device manufacturing method using the same
US-2025284203-A1 · Sep 11, 2025 · US
Projection exposure apparatus with manipulators
US-2025271772-A1 · Aug 28, 2025 · US
Mirror element, lithography system, and method for providing a mirror element
US-2025264643-A1 · Aug 21, 2025 · US
Diffraction-based pupil determination for optimization of lithographic processes
US-2025264808-A1 · Aug 21, 2025 · US
Laser processing system, laser processing method, and method for manufacturing electronic device
US-2025258438-A1 · Aug 14, 2025 · US
Exposure apparatus, control method of exposure apparatus, information processing apparatus, information processing method, and article manufacturing method
US-12386272-B2 · Aug 12, 2025 · US
Metrology in the presence of CMOS under array (CUA) structures utilizing an effective medium model with classification of CUA structures
US-12372882-B2 · Jul 29, 2025 · US
Apparatus and method for determining an angular reflectivity profile
US-2025237962-A1 · Jul 24, 2025 · US
Method for heating an optical element in a microlithographic projection exposure apparatus and optical system
US-12353141-B2 · Jul 8, 2025 · US
Method for thermo-mechanical control of a heat sensitive element and device for use in a lithographic production process
US-12339592-B2 · Jun 24, 2025 · US
Method of configuring extreme ultra-violet (euv) illumination system, and euv exposure method using the euv illumination system
US-2025138434-A1 · May 1, 2025 · US
Method of configuring extreme ultra-violet (euv) light source and euv exposure method using the euv light source
US-2025138431-A1 · May 1, 2025 · US
Frequently asked questions
Answers are generated from the same data shown on this page.
- What is CPC G03F7/70504?
- CPC G03F7/70504 is the Cooperative Patent Classification code for “Optical system modelling, e.g. lens heating models.”
- How many patents are filed under CPC G03F7/70504 (Optical system modelling, e.g. lens heating models)?
- Our database includes 52 publications tagged with this CPC code.
- Is patent activity under CPC G03F7/70504 growing?
- Publication counts under this code: 11 in 2024 vs 18 in 2025 (latest complete years).