High force low voltage piezoelectric micromirror actuator

Patent metadata

Field	Value
Publication number	US-12339588-B2
Application number	US-202118038601-A
Country	US
Kind code	B2
Filing date	Nov 12, 2021
Priority date	Nov 30, 2020
Publication date	Jun 24, 2025
Grant date	Jun 24, 2025

Abstract

A micromirror array comprises a substrate, a plurality of mirrors for reflecting incident light and, for each mirror of the plurality of mirrors, at least one multilayer piezoelectric actuator for displacing the mirror, wherein the at least one multilayer piezoelectric actuator is connected to the substrate, and wherein the at least one multilayer piezoelectric actuator comprises a plurality of piezoelectric layers of piezoelectric material interleaved with a plurality of electrode layers to form a stack of layers. Also disclosed is a method of forming such a micromirror array. The micromirror array may be used in a programmable illuminator. The programmable illuminator may be used in a lithographic apparatus and/or in an inspection and/or metrology apparatus.

First claim

The invention claimed is:

1. A microelectromechanical system, MEMS, comprising:
a substrate;
a plurality of MEMS elements;
for each MEMS element of the plurality of MEMS elements, at least one multilayer piezoelectric actuator configured to displace the MEMS element and connected to the substrate; and
one or more pillars connecting the MEMS element to the at least one multilayer piezoelectric actuator,
wherein the at least one multilayer piezoelectric actuator comprises a plurality of piezoelectric layers of piezoelectric material interleaved with a plurality of electrode layers to form a stack of layers,
wherein the at least one multilayer piezoelectric actuator comprises a strip of flexible material connected at a first end to the substrate and at a second end to a respective one of the one or more pillars,
wherein the stack of layers is connected to the strip of flexible material and is configured to cause the strip to bend during use,
wherein the at least one multilayer piezoelectric actuator comprises a hinge connected to one of the first or second ends of the strip of flexible material and to the respective one of the one or more pillars, and wherein the hinge has a smaller cross section than the strip of flexible material in an elongation direction of the strip, and
wherein the at least one multilayer piezoelectric actuator is disposed between the MEMS element and the substrate.

2. The microelectromechanical system, MEMS, of claim 1 , comprising, for each MEMS element of the plurality of MEMS elements, at least one sensing element connected to the at least one multilayer piezoelectric actuator for sensing displacement of the MEMS element.

3. The microelectromechanical system, MEMS, of claim 2 , wherein the at least one sensing element comprises a piezoresistor arranged so that displacement of the MEMS element causes the piezoresistor to deflect.

4. The microelectromechanical system, MEMS, of claim 3 , wherein the at least one sensing element further comprises a temperature sensor to measure the temperature of the piezoresistor.

5. The microelectromechanical system, MEMS, of claim 1 , comprising, for each MEMS element of the plurality of MEMS elements, a heat diffuser for diffusing heat from the MEMS element, the heat diffuser comprising a heat sink and a thermally conductive post connecting the heat sink to the MEMS element.

6. The microelectromechanical system, MEMS, of claim 5 , wherein the heat sink comprises a flexible membrane that allows the thermally conductive post to pivot when the MEMS element is displaced.

7. The microelectromechanical system, MEMS, of claim 6 , wherein the flexible membrane comprises a patterned silicon layer.

8. The microelectromechanical system, MEMS, of claim 1 , wherein the MEMS is a micromirror array and wherein each MEMS element of the plurality of MEMS elements is associated with a mirror for reflecting incident light.

9. A programmable illuminator comprising:
the microelectromechanical system, MEMS, of claim 1 , configured to condition a radiation beam,
wherein the MEMS is a micromirror array, and
wherein each MEMS element of the plurality of MEMS elements is associated with a mirror configured to reflect incident light.

10. The programmable illuminator of claim 9 , comprising a displacement control feedback system configured to determine for each mirror of the plurality of mirrors, a position of the mirror and to adjust a voltage applied to the at least one multilayer piezoelectric actuator based on the determined position and based on a predefined target position of the mirror.

11. A lithographic apparatus arranged to project a pattern from a patterning device onto a substrate, comprising:
a programmable illuminator comprising the microelectromechanical system, MEMS, of claim 1 , configured to condition a radiation beam used to illuminate the patterning device and/or a radiation beam used to measure a target structure on the substrate,
wherein the MEMS is a micromirror array, and
wherein each MEMS element of the plurality of MEMS elements is associated with a mirror configured to reflect incident light.

12. An inspection and/or metrology apparatus, comprising:
a programmable illuminator comprising the microelectromechanical system, MEMS, of claim 1 , configured to condition a radiation beam used to measure a target structure on a substrate,
wherein the MEMS is a micromirror array, and
wherein each MEMS element of the plurality of MEMS elements is associated with a mirror configured to reflect incident light.

13. A method of forming a microelectromechanical system, MEMS, comprising:
providing a substrate;
forming a plurality of MEMS elements for reflecting incident light;
for each MEMS element of the plurality of MEMS elements, forming at least one multilayer piezoelectric actuator comprising a plurality of piezoelectric layers of piezoelectric material interleaved with a plurality of electrode layers to form a stack of layers for displacing the MEMS element and connected to the substrate; and
forming one or more pillars connecting the MEMS element to the at least one multilayer piezoelectric actuator,
wherein the at least one multilayer piezoelectric actuator comprises a strip of flexible material connected at a first end to the substrate and at a second end to a respective one of the pillars, and wherein the stack of layers is provided on the strip of flexible material and is configured to cause the strip to bend during use,
wherein forming at the least one multilayer piezoelectric actuator further comprises:
forming a curved strip of flexible material having a first end connected to the substrate and a second end connected to the respective one of the pillars, the stack of layers being formed on the respective one of the pillars, and
forming a hinge connected to an end of the curved strip of flexible materials and to the respective one of the pillars, wherein the hinge is thinner than the curved strip of flexible material, and

wherein the at least one multilayer piezoelectric actuator is disposed between the MEMS element and the substrate.

Assignees

• Asml Netherlands Bv

Inventors

• Haspeslagh Luc Roger Simonne
• Pandey Nitesh
• Van Der Woord Ties Wouter
• Yeǧen Halil Gökay
• Brondani Torri Guilherme
• Goorden Sebastianus Adrianus
• Klein Alexander Ludwig
• Overkamp Jim Vincent
• Osorio Oliveros Edgar Alberto

Classifications

• H02N2/108

  around multiple axes of rotation, e.g. spherical rotor motors · CPC title

• H02N2/009

  Thermal details, e.g. cooling means · CPC title

• G03F7/70625

  Dimensions, e.g. line width, critical dimension [CD], profile, sidewall angle or edge roughness · CPC title

• G03F7/7015

  Details of optical elements · CPC title

• G02B26/0858

  the reflecting means being moved or deformed by piezoelectric means · CPC title