Three-dimensional memory and method for manufacturing the same

US12302559B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-12302559-B2
Application numberUS-202217582871-A
CountryUS
Kind codeB2
Filing dateJan 24, 2022
Priority dateNov 25, 2020
Publication dateMay 13, 2025
Grant dateMay 13, 2025

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

The present disclosure relates to a three-dimensional memory and a method for manufacturing the same. The three-dimensional memory includes a gate stack structure including a core area and a step area which are disposed in juxtaposition and in direct contact in a first direction; a dummy separation structure penetrating through the step area in the first direction; and a gate separation structure penetrating through the core area in the first direction, the gate separation structure having a first end in contact with the dummy separation structure in the first direction, the dummy separation structure having a second end in contact with the gate separation structure in the first direction, and the first end being located within the second end.

First claim

Opening claim text (preview).

What is claimed is: 1. A three-dimensional memory, comprising: a gate stack structure comprising a core area and a step area which are disposed in juxtaposition and in direct contact in a first direction; a dummy separation structure penetrating through the step area in the first direction; and a gate separation structure penetrating through the core area in the first direction, the gate separation structure having a first end in contact with the dummy separation structure in the first direction, the dummy separation structure having a second end in contact with the gate separation structure in the first direction, and the first end being located within the second end. 2. The three-dimensional memory of claim 1 , wherein the second end comprises two holding sub-parts, the first end is located between the two holding sub-parts in a second direction perpendicular to the first direction and is in direct contact with the two holding sub-parts. 3. The three-dimensional memory of claim 2 , wherein widths of the holding sub-parts in the second direction perpendicular to the first direction gradually increase from the step area towards the core area in the first direction. 4. The three-dimensional memory of claim 2 , wherein the second end further comprises a connection sub-part which is connected with the two holding sub-parts. 5. The three-dimensional memory of claim 4 , wherein the connection sub-part is in direct contact with the first end. 6. The three-dimensional memory of claim 1 , wherein the dummy separation structure further comprises a second extending part which is disposed in juxtaposition to and in direct contact with the second end. 7. The three-dimensional memory of claim 6 , wherein the second extending part extends in the first direction. 8. The three-dimensional memory of claim 6 , wherein a width of the second end in a second direction perpendicular to the first direction is greater than a width of the second extending part in the second direction. 9. The three-dimensional memory of claim 8 , wherein the width of the second end in the second direction gradually increases from the step area towards the core area in the first direction. 10. The three-dimensional memory of claim 8 , wherein the width of the second end in the second direction first gradually increases and then gradually decreases from the step area towards the core area in the first direction. 11. The three-dimensional memory of claim 1 , wherein a material of the dummy separation structure is an insulation material. 12. The three-dimensional memory of claim 1 , wherein the gate separation structure further comprises a first extending part which is disposed in juxtaposition to and in direct contact with the first end, and the first end is surrounded by the first extending part and the second end together on the circumference. 13. The three-dimensional memory of claim 12 , wherein the first extending part extends in the first direction. 14. The three-dimensional memory of claim 12 , wherein a width of at least part of the first end in a second direction perpendicular to the first direction is greater than a width of the first extending part in the second direction. 15. The three-dimensional memory of claim 14 , wherein a width of the first end in the second direction gradually increases from the core area towards the step area in the first direction. 16. The three-dimensional memory of claim 14 , wherein a width of the first end in the second direction first gradually increases and then gradually decreases from the core area towards the step area in the first direction. 17. The three-dimensional memory of claim 1 , wherein the first end extends into the step area in the first direction. 18. The three-dimensional memory of claim 1 , wherein a maximum width of the first end in a second direction perpendicular to the first direction is not greater than a minimum width of the second end in the second direction. 19. The three-dimensional memory of claim 1 , wherein the gate separation structure comprises a conductive structure and an electric insulation layer located between the conductive structure and the gate stack structure in the second direction perpendicular to the first direction. 20. The three-dimensional memory of claim 1 , wherein the second end comprises two holding sub-parts, the first end is located between the two holding sub-parts in the second direction perpendicular to the first direction and is in direct contact with the two holding sub-parts, the three-dimensional memory further comprises: a plurality of channel structures located in the core area, the plurality of channel structures penetrating through the core area in a third direction intersected with the first direction and the second direction; and a plurality of dummy channel structures located in the step area, the plurality of dummy channel structures penetrating through the step area in the third direction.

Assignees

Inventors

Classifications

  • the channels comprising vertical portions, e.g. U-shaped channels · CPC title

  • characterised by the boundary region between the core and peripheral circuit regions · CPC title

  • H10B43/10Primary

    characterised by the top-view layout · CPC title

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What does patent US12302559B2 cover?
The present disclosure relates to a three-dimensional memory and a method for manufacturing the same. The three-dimensional memory includes a gate stack structure including a core area and a step area which are disposed in juxtaposition and in direct contact in a first direction; a dummy separation structure penetrating through the step area in the first direction; and a gate separation structu…
Who is the assignee on this patent?
Yangtze Memory Tech Co Ltd
What technology area does this patent fall under?
Primary CPC classification H10B43/10. Mapped technology areas include Electricity.
When was this patent published?
Publication date Tue May 13 2025 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 3 related publications on this page (citations in our corpus or others sharing the same primary CPC).