Laser apparatus and method for manufacturing display device

Patent metadata

Field	Value
Publication number	US-12269124-B2
Application number	US-202117381631-A
Country	US
Kind code	B2
Filing date	Jul 21, 2021
Priority date	Jul 21, 2020
Publication date	Apr 8, 2025
Grant date	Apr 8, 2025

Abstract

A laser apparatus and a method for manufacturing a display device are provided. A laser apparatus includes: a stage; a laser providing unit above the stage and configured to provide a laser beam; a scanner configured to adjust an optical path of the laser beam such that the laser beam is irradiated to an irradiation line formed above the stage; and a control unit to control an operation of the scanner, and the scanner includes a shutter located on an optical path of the laser beam emitted from the laser providing unit and configured to perform an opening/closing operation.

First claim

What is claimed is:

1. A laser apparatus comprising:
a stage;
a laser provider above the stage and configured to provide a laser beam;
a scanner configured to adjust an optical path of the laser beam such that the laser beam is irradiated to an irradiation line formed above the stage; and
a controller to control an operation of the scanner,
wherein the scanner includes a shutter located on an optical path of the laser beam emitted from the laser providing unit provider and configured to perform an opening/closing operation,
wherein the controller calculates a processing area to which the laser beam is irradiated and a non-processing area to which the laser beam is not irradiated, and
wherein, when a position of a target aiming point of the laser beam is located in the processing area, the controller controls to open the shutter if a moving speed of the target aiming point of the laser beam is higher than or equal to a reference speed, and to close the shutter if the moving speed of the target aiming point of the laser beam is lower than the reference speed.

2. The laser apparatus of claim 1 , wherein the controller controls to close the shutter when the position of the target aiming point of the laser beam is located in the non-processing area.

3. The laser apparatus of claim 1 , wherein a number of scans of the laser beam per unit area in the processing area is uniform for each area.

4. The laser apparatus of claim 1 , wherein the scanner comprises at least one mirror configured to swing the laser beam, and
a target aiming point of the laser beam is moved while repeating forward movement to a first side in a moving direction and backward movement to a second side in the moving direction through the swing of the laser beam using the at least one mirror.

5. The laser apparatus of claim 4 , wherein a forward moving distance of the target aiming point of the laser beam is greater than a backward moving distance thereof.

6. The laser apparatus of claim 5 , wherein a moving speed of the target aiming point of the laser beam during the forward movement and the backward movement is constant.

7. The laser apparatus of claim 1 , wherein the laser provider emits a laser beam during a first period in which the shutter is opened to irradiate the laser beam to the irradiation line and a second period in which the shutter is closed so as not to irradiate the laser beam to the irradiation line.

8. A laser apparatus comprising:
a stage;
a laser provider above the stage and configured to provide a laser beam;
a scanner configured to adjust an optical path of the laser beam such that the laser beam is irradiated to an irradiation line formed above the stage; and
a controller to control an operation of the scanner,
wherein the scanner includes a shutter located on an optical path of the laser beam emitted from the laser provider and configured to perform an opening/closing operation,
wherein the controller calculates a processing area to which the laser beam is irradiated and a non-processing area to which the laser beam is not irradiated,
wherein the scanner comprises at least one mirror configured to swing the laser beam, and
a target aiming point of the laser beam is moved while repeating forward movement to a first side in a moving direction and backward movement to a second side in the moving direction through the swing of the laser beam using the at least one mirror, and
wherein the calculation of the processing area and the non-processing area through the controller is performed using a shape of the irradiation line, a unit forward moving distance of the laser beam, a number of scans of the laser beam per unit area, and position information of the stage.

9. A laser apparatus comprising:
a laser provider configured to emit a laser beam during a first period and a second period;
an optical path adjuster configured to adjust an angle at which the laser beam travels;
a shutter located on a traveling path of the laser beam; and
a controller to control operations of the optical path adjustment unit adjuster and the shutter,
wherein the shutter is opened during the first period to allow the emitted laser, beam to travel, and is closed during the second period to block travel of the emitted laser beam,
wherein the controller calculates a processing area to which the laser beam is irradiated and a non-processing area to which the laser beam is not irradiated, and
wherein, during the first period, a target aiming point of the laser beam is located in the processing area and moves at a speed higher than or equal to a reference speed.

10. The laser apparatus of claim 9 , wherein the first period and the second period are consecutive periods.

11. The laser apparatus of claim 9 , wherein, during the second period, the target aiming point of the laser beam is located in the non-processing area, or is located in the processing area and moves at a speed lower than the reference speed.

12. The laser apparatus of claim 9 , wherein, during the first period, a number of scans of the laser beam per unit area is uniform for each area.

Assignees

• Samsung Display Co Ltd
• Philoptics Co Ltd

Inventors

• Noh Sung Ho
• Jeong Jae Yoon
• Sim Jun Ho
• Han Jae Ku

Classifications

• H10W90/00

  Package configurations · CPC title

• H10K77/111

  Flexible substrates · CPC title

• B23K26/703

  Cooling arrangements (by using a fluid stream B23K26/14) · CPC title

• B23K2101/36

  Electric or electronic devices · CPC title

• C03B33/082

  using a focussed radiation beam, e.g. laser (C03B33/0855 takes precedence) · CPC title