Methods and apparatus for material processing using dual source cyclonic plasma reactor
US-2015274569-A1 · Oct 1, 2015 · US
US12261023B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-12261023-B2 |
| Application number | US-202318320655-A |
| Country | US |
| Kind code | B2 |
| Filing date | May 19, 2023 |
| Priority date | May 23, 2022 |
| Publication date | Mar 25, 2025 |
| Grant date | Mar 25, 2025 |
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The embodiments disclosed herein are directed to systems, methods, and devices for processing a material using a microwave plasma apparatus with an interior liner. In some embodiments, the liner comprises a reduction resistant material layer in direct contact with a hydrogen-containing plasma of a plasma processing apparatus. In some embodiments, the liner may comprise a sleeve disposed between a plasma and one or more concentric tubes of a plasma processing apparatus. In some embodiments, the liner may comprise a coating of material applied to the one or more concentric tubes. In some embodiments, the liner may comprise a flexible ceramic material, such as a ceramic ribbon that is coiled or wrapped in a helix shape spiraling around the interior of the one or more concentric tubes.
Opening claim text (preview).
What is claimed is: 1. A microwave plasma apparatus for processing a material, comprising: a quartz tube in communication with at least one microwave radiation source, a reaction chamber, and a material feeding system; and a liner disposed within the quartz tube, the liner comprising a material resistant to H 2 , CO 2 , or CH 4 gasses; wherein the liner is disposed between the quartz tube and a plasma generation zone of the microwave plasma apparatus; wherein the liner comprises a coating of the material resistant to H 2 , CO 2 , or CH 4 gasses applied to the quartz tube. 2. The microwave plasma apparatus of claim 1 , further comprising a plurality of concentric quartz tubes. 3. The microwave plasma apparatus of claim 1 , wherein the microwave radiation source is configured to provide power to the plasma generation zone to generate a microwave plasma within the plasma generation zone upon contact with a plasma gas. 4. The microwave plasma apparatus of claim 1 , further comprising an extension tube extending from the quartz tube into the reaction chamber; wherein the liner extends into the extension tube from the quartz tube. 5. The microwave plasma apparatus of claim 1 , wherein the liner comprises alumina, zirconia, or refractory material. 6. A method for processing a material, the method comprising: feeding the material to a plasma generation zone of a microwave plasma apparatus through a material feeding system; feeding a hydrogen-containing gas to the plasma generation zone; applying microwave power to the plasma generation zone to form a plasma from the hydrogen-containing gas; and contacting the material with the plasma, wherein the plasma generation zone is located within a liner disposed within a quartz tube of the microwave plasma apparatus, the liner comprising a material resistant to H 2 , CO 2 , or CH 4 gasses; wherein the liner comprises a coating of the material resistant to the H 2 , CO 2 , or CH 4 gasses applied to the quartz tube. 7. The method of claim 6 , wherein the microwave plasma apparatus comprises a plurality of concentric quartz tubes. 8. The method of claim 6 , wherein the plasma gas comprises H 2 or CH 4 . 9. The method of claim 6 , wherein the microwave plasma apparatus further comprises an extension tube extending from the quartz tube into a reaction chamber. 10. The method of claim 9 , wherein the liner extends into the extension tube from the quartz tube. 11. The method of claim 6 , wherein the liner comprises alumina, zirconia, or refractory material. 12. An interior liner disposed in a microwave plasma apparatus, the liner comprising a material resistant to H 2 , CO 2 , or CH 4 gasses and positioned between a quartz tube and a plasma generation zone of the microwave plasma apparatus, wherein the interior liner is a continuous coating of the material applied to the quartz tube. 13. The liner of claim 12 , wherein the reduction resistant material is a ceramic material. 14. The liner of claim 12 , wherein the reduction resistant material comprises alumina, zirconia, or refractory material.
Generating means · CPC title
Liner tubes · CPC title
Means for protecting the vessel against plasma · CPC title
Microwave generated discharge (H01J37/32357, H01J37/32366, H01J37/32394, H01J37/32403 take precedence) · CPC title
Gas supply means · CPC title
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