Substrate processing apparatus and substrate processing method
US-10903092-B2 · Jan 26, 2021 · US
Substrate processing method
US12255061B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-12255061-B2 |
| Application number | US-202118007267-A |
| Country | US |
| Kind code | B2 |
| Filing date | Jun 22, 2021 |
| Priority date | Jul 31, 2020 |
| Publication date | Mar 18, 2025 |
| Grant date | Mar 18, 2025 |
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- Title
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Abstract
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A substrate processing method is provided. The substrate processing method includes: (S7) supplying a water repellent agent (SMT) to a substrate (W); (S11) supplying dilute isopropyl alcohol (dIPA) to the substrate (W) after the supplying a water repellent agent (SMT), the dilute isopropyl alcohol (dIPA) being obtained by diluting isopropyl alcohol; and (S12) drying the substrate (W) after the supplying dilute isopropyl alcohol (dIPA).
First claim
Opening claim text (preview).
The invention claimed is: 1. A substrate processing method for processing a substrate, comprising: supplying a water repellent agent to the substrate; supplying dilute isopropyl alcohol to the substrate after supplying the water repellent agent, the dilute isopropyl alcohol being obtained by diluting isopropyl alcohol; supplying isopropyl alcohol to the substrate after supplying the dilute isopropyl alcohol; and drying the substrate after supplying the isopropyl alcohol; wherein isopropyl alcohol is supplied immediately before the drying, and wherein the dilute isopropyl alcohol includes DIW (deionized water) and isopropyl alcohol, and wherein the ratio of the DIW to the isopropyl alcohol is at least 10% and no greater than 30%. 2. The substrate processing method according to claim 1 , further comprising supplying isopropyl alcohol to the substrate after supplying the water repellent agent. 3. The substrate processing method according to claim 1 , further comprising supplying isopropyl alcohol to the substrate after supplying the water repellent agent and before supplying the dilute isopropyl alcohol. 4. The substrate processing method according to claim 2 , further comprising supplying isopropyl alcohol to the substrate after supplying the water repellent agent and before supplying the dilute isopropyl alcohol.
Assignees
Inventors
Classifications
- H10P70/20Primary
Cleaning during device manufacture · CPC title
for cleaning followed by drying, rinsing, stripping, blasting or the like · CPC title
- B08B3/08Primary
the liquid having chemical or dissolving effect · CPC title
- H01L21/02057Primary
Electricity · mapped topic
Cleaning only by supercritical fluids · CPC title
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- What does patent US12255061B2 cover?
- A substrate processing method is provided. The substrate processing method includes: (S7) supplying a water repellent agent (SMT) to a substrate (W); (S11) supplying dilute isopropyl alcohol (dIPA) to the substrate (W) after the supplying a water repellent agent (SMT), the dilute isopropyl alcohol (dIPA) being obtained by diluting isopropyl alcohol; and (S12) drying the substrate (W) after the …
- Who is the assignee on this patent?
- Screen Holdings Co Ltd
- What technology area does this patent fall under?
- Primary CPC classification H10P70/20. Mapped technology areas include Electricity.
- When was this patent published?
- Publication date Tue Mar 18 2025 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
- What related patents are in patentsdb?
- We list 7 related publications on this page (citations in our corpus or others sharing the same primary CPC).