Substrate heating apparatus and method for processing a substrate

Patent metadata

Field	Value
Publication number	US-12225634-B2
Application number	US-202117348753-A
Country	US
Kind code	B2
Filing date	Jun 15, 2021
Priority date	Nov 16, 2020
Publication date	Feb 11, 2025
Grant date	Feb 11, 2025

Abstract

A substrate heating apparatus includes: a plurality of heating lamps disposed on a chuck stage; a window disposed on the chuck stage and including a window base and a central lens, wherein the chuck stage and the window are each configured to support a substrate above the heating lamps; and a mirror disposed between the heating lamps and the chuck stage, the mirror including a mirror base, a central reflector, and an edge reflector, wherein the plurality of heating lamps are configured to heat the substrate by emitting light through the window onto the substrate and emitting light onto the mirror, wherein the mirror is configured to reflect the light through the window onto the substrate, including reflecting portions of the light via the central and edge reflectors, and wherein the central lens is configured to focus the light onto the central portion of the substrate.

First claim

What is claimed is:

1. A substrate heating apparatus comprising:
a support shaft extending in a first direction;
a chuck stage including a central axis, wherein the chuck stage is disposed on and coupled to the support shaft;
a plurality of heating lamps disposed on the chuck stage concentrically around the central axis, wherein each of the plurality of heating lamps has a ring shape;
a window disposed on the chuck stage, the window including a window base and a central lens disposed in at least one of an upper surface or a lower surface of a central portion of the window base, wherein the central lens at least partially overlaps the support shaft in the first direction and wherein the chuck stage and the window are each configured to support a substrate above the plurality of heating lamps; and
a mirror disposed between the plurality of heating lamps and the chuck stage, the mirror including a mirror base, a central reflector disposed on the mirror base and adjacent to a heating lamp, and an edge reflector disposed on an edge portion of the mirror base and adjacent to a heating lamp, wherein the plurality of heating lamps are configured to heat the substrate by emitting first light through the window onto the substrate and emitting second light onto the mirror,
wherein the mirror is configured to reflect the second light through the window onto the substrate, including reflecting a central portion of the second light via the central reflector through the window onto a central portion of the substrate and reflecting an edge portion of the second light through the window onto an edge portion of the substrate, and
wherein the central lens is configured to focus a first portion of the first light and a first portion of the second light onto the central portion of the substrate.

2. The substrate heating apparatus according to claim 1 , wherein the window further includes an edge lens disposed in at least one of an upper surface or a lower surface of an edge portion of the window base, and wherein the edge lens is configured to focus a second portion of the first light and a second portion of the second light onto the edge portion of the substrate.

3. The substrate heating apparatus according to claim 2 , wherein the edge lens has a ring shape.

4. The substrate heating apparatus according to claim 1 , wherein the central lens has a circular shape.

5. The substrate heating apparatus according to claim 1 , wherein the central reflector includes a reflective surface facing the central portion of the substrate.

6. The substrate heating apparatus according to claim 1 , wherein the edge reflector includes a reflective surface facing the edge portion of the substrate.

7. The substrate heating apparatus according to claim 1 , wherein the mirror further includes an additional reflector disposed between the central reflector and the edge reflector, and wherein the mirror is configured to reflect the second light through the window onto the substrate, including reflecting a portion of the second light via the additional reflector through the window onto a portion of the substrate between the edge portion and the central portion of the substrate.

8. The substrate heating apparatus according to claim 1 , wherein each of the central reflector and the edge reflector include reflective surfaces, and wherein the reflective surfaces of the central reflector and the edge reflector are round.

9. The substrate heating apparatus according to claim 1 , wherein the window base has a ring shape and the central lens extends in a circumferential direction and surrounds the central portion of the window base.

10. The substrate heating apparatus according to claim 1 , wherein the window base includes a horizontal portion extending horizontally and a support portion extending vertically from the horizontal portion and supported by the chuck stage, and wherein an inner corner of the window base joining the horizontal portion and the support portion includes a curved surface having a radius of curvature of less than 0.5 mm.

11. The substrate heating apparatus according to claim 1 , wherein the window base includes a horizontal portion extending horizontally and a support portion extending diagonally from the horizontal portion and supported by the chuck stage.

12. A substrate processing method comprising:
providing a substrate onto a substrate heating apparatus comprised in a substrate processing apparatus, the substrate heating apparatus including:
a plurality of heating lamps,
a window including a window base and a central lens disposed in at least one of an upper surface or a lower surface of a central portion of the window base, wherein the window supports the substrate above the plurality of heating lamps and wherein the central lens is spaced apart from the substrate, and
a mirror disposed below the plurality of heating lamps, the mirror including a mirror base, a central reflector disposed on the mirror base, and an edge reflector disposed on an edge portion of the mirror base;

supplying a processing solution onto the substrate by a solution supply assembly comprised in the substrate processing apparatus; and
heating the substrate, wherein the heating the substrate comprises:
emitting first light via the plurality of heating lamps onto the substrate through the window,
emitting second light via the plurality of heating lamps onto the mirror,
reflecting the second light via the mirror through the window onto the substrate, including reflecting a central portion of the second light via the central reflector through the window onto a central portion of the substrate and reflecting an edge portion of the second light via the edge reflector through the window onto an edge portion of the substrate, and
focusing a first portion of the first light and a first portion of the second light via the central lens onto the central portion of the substrate.

13. The substrate processing method according to claim 12 , wherein the window base further includes an edge lens disposed on at least one of an upper surface or a lower surface of an edge portion of the window base, and wherein heating the substrate further comprises focusing a second portion of the first light and a second portion of the second light via the edge lens through the window onto the edge portion of the substrate.

14. A substrate heating apparatus comprising:
a support shaft extending in a first direction;
a chuck stage disposed on and coupled to the support shaft;
a plurality of heating lamps disposed on the chuck stage; and
a window disposed on the chuck stage, the window including a window base and a central lens disposed in a surface of the window base, wherein the central lens at least partially overlaps the support shaft in the first direction and wherein the chuck stage and the window are each configured to support a substrate above the plurality of heating lamps,
wherein the plurality of heating lamps are configured to heat the substrate by emitting light through the window onto the substrate, and
wherein the central lens is configured to focus a portion of the light onto the central portion of the substrate.

15. The substrate heating apparatus according to claim 14 , wherein the window further includes an edge lens disposed in a surface of an edge portion of the window base, and wherein the edge lens is configured to focus a second portion of the light onto the edge portion of the substrate.

16. The substrate heating apparatus according to claim 15 , wherein the edge lens has a ring shape.

17. The substrate heating apparatus a

Assignees

• Samsung Electronics Co Ltd

Inventors

• Kim Taehong
• Kim Younghoo
• Park Sunghyun
• Lee Kuntack

Classifications

• H10P72/7624

  characterised by the mechanical construction of the susceptor, stage or support · CPC title

• H10P72/0436 Primary

  mainly by radiation · CPC title

• H10P72/7614

  characterised by a plurality of individual support members, e.g. support posts or protrusions · CPC title

• H10P72/7608

  characterised by a plurality of separate clamping members, e.g. clamping fingers · CPC title

• H05B3/0047

  for semiconductor manufacture · CPC title