Process apparatus and process method

Patent metadata

Field	Value
Publication number	US-12157029-B2
Application number	US-202117305535-A
Country	US
Kind code	B2
Filing date	Jul 9, 2021
Priority date	Jan 25, 2019
Publication date	Dec 3, 2024
Grant date	Dec 3, 2024

Abstract

According to an embodiment, a process apparatus performs processing on a byproduct generated in a reaction of a raw material including silicon and a halogen element or in a reaction between a raw material including silicon and a raw material including a halogen element. The apparatus includes a process liquid tank, a processing tank, a supplier and an exhauster. A process target member including the byproduct is introduced into the processing tank. The supplier supplies the process liquid from the process liquid tank to the processing tank and performs processing on the byproduct with the supplied process liquid. The exhauster exhausts a gas generated by reaction between the process liquid and the byproduct from the processing tank.

First claim

What is claimed is:

1. A process apparatus that performs processing on a byproduct generated in a reaction of a raw material including silicon and a halogen element or in a reaction between a raw material including silicon and a raw material including a halogen element, the apparatus comprising:
a process liquid tank that stores process liquid including a basic aqueous solution;
a processing tank into which a process target member including the byproduct is introduced;
a supplier that supplies the process liquid from the process liquid tank to the processing tank and performs processing on the byproduct in the processing tank with the supplied process liquid;
an exhauster that exhausts a gas generated by reaction between the process liquid and the byproduct from the processing tank; and
a jig that maintains the process target member in a predetermined posture in the process liquid in the processing tank, and in a state where an opening of a pipe of the process target member faces a side where a liquid surface of the process liquid is located.

2. The process apparatus according to claim 1 , further comprising a sensor that detects a parameter relating to a state of progress of the reaction between the process liquid and the byproduct in the processing tank.

3. The process apparatus according to claim 1 , further comprising one or more of:
a disperser that disperses a mass of the byproduct in the process liquid in the processing tank;
a stirrer that stirs the process liquid in the processing tank; and
a liquid circulator that forms a flow in which the process liquid circulates in the processing tank.

4. The process apparatus according to claim 1 , further comprising a liquid emitter that emits, from the processing tank, the process liquid which reacted with the byproduct in the processing tank.

5. A process method performed on a byproduct generated in a reaction of a raw material including silicon and a halogen element or in a reaction between a raw material including silicon and a raw material including a halogen element, the method comprising:
introducing a process target member including the byproduct into a processing tank;
storing process liquid including a basic aqueous solution in the processing tank;
maintaining the process target member in a predetermined posture in the process liquid in the processing tank, and in a state where an opening of a pipe of the process target member faces a side where a liquid surface of the process liquid is located;
performing processing on the byproduct in the processing tank with the stored process liquid; and
exhausting a gas generated by reaction between the process liquid and the byproduct from the processing tank.

6. The method according to claim 5 , further comprising detecting a parameter relating to a state of progress of the reaction between the process liquid and the byproduct in the processing tank, and determining a state of progress of processing on the byproduct based on a detection result of the parameter.

7. The method according to claim 5 , further comprising performing, in parallel with detoxification of the byproduct with the process liquid, one or more of:
dispersing a mass of the byproduct in the process liquid in the processing tank;
stirring the process liquid in the processing tank; and
forming a flow in which the process liquid circulates in the processing tank.

8. The method according to claim 5 , further comprising emitting, from the processing tank, the process liquid which reacted with the byproduct in the processing tank.

Assignees

• Toshiba Kk
• Kioxia Corp
• Univ Tohoku

Inventors

• Uchida Kenya
• Fukui Hiroyuki
• Uematsu Ikuo
• Iwamoto Takeaki
• Kwon Eunsang

Classifications

• H10P14/24

  using chemical vapour deposition [CVD] · CPC title

• H10P14/3411

  Silicon, silicon germanium or germanium · CPC title

• C23C16/4412 Primary

  Details relating to the exhausts, e.g. pumps, filters, scrubbers, particle traps · CPC title

• A62D2101/49

  containing halogen · CPC title

• C30B25/14

  Feed and outlet means for the gases; Modifying the flow of the reactive gases · CPC title