Plasma apparatus and methods for processing feed material utilizing a powder ingress preventor (PIP)

US12094688B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-12094688-B2
Application numberUS-202318451720-A
CountryUS
Kind codeB2
Filing dateAug 17, 2023
Priority dateAug 25, 2022
Publication dateSep 17, 2024
Grant dateSep 17, 2024

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

Disclosed herein are systems, methods, and devices processing feed material utilizing a microwave plasma apparatus comprising a powder ingress preventor (PIP). In some embodiments, the microwave plasma apparatus comprises a core plasma tube and a liner; and a ring structure comprising: a bearing surface, the bearing surface contacting an interior diameter of the core plasma tube; and an opening, the opening contacting an outer diameter of the liner.

First claim

Opening claim text (preview).

What is claimed is: 1. A microwave plasma apparatus for processing a material, comprising: a core plasma tube; a liner located within and concentric with the core plasma tube; a plasma applicator; and a ring structure located between the core plasma tube and the liner, the ring structure concentric with the core plasma tube and the liner, and the ring structure comprising: a bearing surface, the bearing surface contacting a bottom surface of the plasma applicator; and an opening, the opening surrounding the liner and having a diameter greater than an outer diameter of the liner. 2. The microwave plasma apparatus of claim 1 , wherein the ring structure is formed of glass or quartz. 3. The microwave plasma apparatus of claim 1 , wherein the ring structure comprises a single piece of material. 4. The microwave plasma apparatus of claim 1 , wherein the ring structure comprises an assembly comprising two or more pieces, wherein the assembly comprises a first piece comprising a flange and a second piece comprising a tube. 5. The microwave plasma apparatus of claim 1 , wherein the ring structure comprises a washer, wherein the washer comprises a plurality of holes. 6. The microwave plasma apparatus of claim 5 , wherein the plurality of holes form one or more concentric circles on a surface of the washer. 7. The microwave plasma apparatus of claim 1 , wherein the opening comprises one or more indentations or serrations. 8. The microwave plasma apparatus of claim 1 , wherein the ring structure comprises an inverted cone, wherein the inverted cone comprises a rim, the rim comprising one or more holes formed through the rim, wherein the inverted cone comprises a serrated bottom opening. 9. The microwave plasma apparatus of claim 8 , wherein the inverted cone comprises a serrated bottom opening. 10. A ring structure for preventing powder ingress within a microwave plasma apparatus, the ring structure comprising: a bearing surface, the bearing surface contacting a lower surface of a plasma applicator of the microwave plasma apparatus; and an opening, the opening the opening surrounding a liner of the microwave plasma apparatus and having a diameter greater than an outer diameter of the liner. 11. The ring structure of claim 10 , wherein the ring structure is formed of glass or quartz. 12. The ring structure of claim 10 , wherein the ring structure comprises a single piece of material. 13. The ring structure of claim 10 , wherein the ring structure comprises an assembly comprising two or more pieces, wherein the assembly comprises a first piece comprising a flange and a second piece comprising a tube. 14. The ring structure of claim 10 , wherein the ring structure comprises a washer, wherein the washer comprises a plurality of holes, wherein the plurality of holes form one or more concentric circles on a surface of the washer. 15. The ring structure of claim 10 , wherein the opening comprises one or more indentations or serrations. 16. The ring structure of claim 10 , wherein the ring structure comprises an inverted cone, the rim comprising one or more holes formed through the rim, wherein the inverted cone comprises a serrated bottom opening.

Assignees

Inventors

Classifications

  • Focus rings · CPC title

  • characterised by the means for protecting vessels or internal parts, e.g. coatings · CPC title

  • Arrangements for generating the plasma · CPC title

  • Gas supply means · CPC title

  • Generation remote from the workpiece, e.g. down-stream · CPC title

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What does patent US12094688B2 cover?
Disclosed herein are systems, methods, and devices processing feed material utilizing a microwave plasma apparatus comprising a powder ingress preventor (PIP). In some embodiments, the microwave plasma apparatus comprises a core plasma tube and a liner; and a ring structure comprising: a bearing surface, the bearing surface contacting an interior diameter of the core plasma tube; and an opening…
Who is the assignee on this patent?
6K Inc
What technology area does this patent fall under?
Primary CPC classification H01J37/32642. Mapped technology areas include Electricity.
When was this patent published?
Publication date Tue Sep 17 2024 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 12 related publications on this page (citations in our corpus or others sharing the same primary CPC).