Methods for forming a unitized crucible assembly

US12084787B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-12084787-B2
Application numberUS-202318179633-A
CountryUS
Kind codeB2
Filing dateMar 7, 2023
Priority dateFeb 20, 2020
Publication dateSep 10, 2024
Grant dateSep 10, 2024

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

Methods for forming a unitized crucible assembly for holding a melt of silicon for forming a silicon ingot are disclosed. In some embodiments, the methods involve a porous crucible mold having a channel network with a bottom channel, an outer sidewall channel that extends from the bottom channel, and a central weir channel that extends from the bottom channel. A slip slurry may be added to the channel network and the liquid carrier of the slip slurry may be drawn into the mold. The resulting green body may be sintered to form the crucible assembly.

First claim

Opening claim text (preview).

What is claimed is: 1. A method for forming a unitized crucible assembly for holding a melt of silicon for forming a silicon ingot by the Czochralski method, the method comprising: providing a crucible mold, the crucible mold comprising: a porous body and a channel network disposed within the porous body, the channel network comprising: a bottom channel; an outer sidewall channel that extends from the bottom channel; and an inner weir channel that extends from the bottom channel, the inner weir channel being disposed interior to the outer sidewall channel, the outer sidewall channel and the inner weir channel being interconnected; a first inner weir channel riser that is in fluid communication with the inner weir channel, the first inner weir channel comprising a cone portion and a duct, the cone portion being disposed above the duct and in fluid communication with the duct; a second inner weir channel riser that is in fluid communication with the inner weir channel, the second inner weir channel comprising a cone portion and a duct, the cone portion being disposed above the duct and in fluid communication with the duct; a first outer sidewall channel riser that is in fluid communication with the outer sidewall channel, the first outer sidewall channel comprising a cone portion and a duct, the cone portion being disposed above the duct and in fluid communication with the duct; and a second outer sidewall channel riser that is in fluid communication with the outer sidewall channel, the second outer sidewall channel comprising a cone portion and a duct, the cone portion being disposed above the duct and in fluid communication with the duct, wherein the first and second inner weir channel risers and the first and second outer sidewall channel risers extend through an upper surface of the crucible mold; and introducing a slip slurry into the cone of at least one of (1) the first inner weir channel riser, (2) the second inner weir channel riser, (3) the first outer sidewall channel riser, and (4) the second outer sidewall channel riser to fill the bottom channel, outer sidewall channel and inner weir channel with the slip slurry, the slip slurry comprising silica and a liquid carrier; drawing at least a portion of the liquid carrier into the crucible mold by capillary action to form a green body; separating the green body from the crucible mold; and sintering the green body to dry and densify the green body to form the unitized crucible assembly. 2. The method as set forth in claim 1 wherein the crucible mold comprises a porous body and draws the liquid carrier into the crucible mold by capillary action. 3. The method as set forth in claim 2 wherein the porous body is made of porous silica. 4. The method as set forth in claim 1 wherein a moisture content of the green body is less than about 50 wt %. 5. The method as set forth in claim 1 wherein the bottom channel, outer sidewall channel, and inner weir channel are each fluidly connected to each other. 6. The method as set forth in claim 5 wherein the bottom channel is rounded and the unitized crucible assembly is transparent and includes a single layer bottom. 7. The method as set forth in claim 1 wherein the unitized crucible assembly comprises: a bottom; an outer sidewall that extends upward from the bottom; and an inner weir that extends upward from the bottom, the inner weir being disposed radially inward of the outer sidewall channel. 8. The method as set forth in claim 1 wherein the slip slurry and/or crucible mold are selected to form a unitized crucible assembly having a concentration of calcium of less than about 1 ppmw, a concentration of sodium of less than about 0.5 ppmw, a concentration of potassium of less than about 0.5 ppmw, a concentration of lithium of less than about 0.5 ppmw, and a concentration of iron of less than about 0.5 ppmw. 9. The method as set forth in claim 1 comprising withdrawing air from at least one of (1) the second inner weir channel riser and (2) the second outer sidewall channel riser while slip slurry is introduced into at least one of (1) the inner weir channel riser and (2) the outer sidewall channel riser. 10. The method as set forth in claim 1 wherein the inner weir channel riser and the outer sidewall channel riser are aligned.

Assignees

Inventors

Classifications

  • C30B29/06Primary

    Silicon · CPC title

  • C30B15/12Primary

    Double crucible methods · CPC title

  • Moulds for making shaped articles with cavities or holes open to the surface {, e.g. with blind holes} · CPC title

  • Moulds or cores (uniquely adapted to particular casting processes B22D); Moulding processes · CPC title

  • Crucibles or containers · CPC title

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What does patent US12084787B2 cover?
Methods for forming a unitized crucible assembly for holding a melt of silicon for forming a silicon ingot are disclosed. In some embodiments, the methods involve a porous crucible mold having a channel network with a bottom channel, an outer sidewall channel that extends from the bottom channel, and a central weir channel that extends from the bottom channel. A slip slurry may be added to the …
Who is the assignee on this patent?
Globalwafers Co Ltd
What technology area does this patent fall under?
Primary CPC classification C30B29/06. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Tue Sep 10 2024 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 9 related publications on this page (citations in our corpus or others sharing the same primary CPC).