Copper alloy powder, method of producing additively-manufactured article, and additively-manufactured article

US12084745B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-12084745-B2
Application numberUS-202117192125-A
CountryUS
Kind codeB2
Filing dateMar 4, 2021
Priority dateOct 25, 2016
Publication dateSep 10, 2024
Grant dateSep 10, 2024

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

A copper alloy powder is a copper alloy powder for additive manufacturing. The copper alloy powder contains more than 1.00 mass % and not more than 2.80 mass % of chromium, and a balance of copper. A method for producing an additively-manufactured article includes a first step of preparing a copper alloy powder containing more than 1.00 mass % and not more than 2.80 mass % of chromium and a balance of copper and a second step of producing the additively-manufactured article from the copper alloy powder, and the additively-manufactured article is produced such that forming a powder layer including the copper alloy powder, and solidifying the copper alloy powder at a predetermined position in the powder layer to form a shaped layer are sequentially repeated to stack such shaped layers to thus produce the additively-manufactured article.

First claim

Opening claim text (preview).

What is claimed is: 1. A method of using a copper alloy powder, the method comprising: preparing the copper alloy powder; using the copper alloy powder as a raw material for a laser, electron beam or plasma additively manufactured article; and heat-treating the laser, electron beam or plasma additively manufactured article such that the laser, electron beam or plasma additively manufactured article has an electrical conductivity of not less than 70% IACS, wherein the copper alloy powder is solidified into a predetermine shape by irradiating the copper alloy powder with at least one of the laser, the electron beam or the plasma, the copper alloy powder consists of more than 1.00 mass % and not more than 2.80 mass % of chromium; optionally oxygen in an impurity content; and a balance of copper. 2. The method of using a copper alloy powder according to claim 1 , wherein the copper alloy powder contains more than 1.05 mass % and not more than 2.80 mass % of chromium. 3. The method of using a copper alloy powder according to claim 1 , wherein the copper alloy powder contains more than 1.00 mass % and not more than 2.00 mass % of chromium. 4. The method of using a copper alloy powder according to claim 3 , wherein the copper alloy powder contains more than 1.05 mass % and not more than 2.00 mass % of chromium. 5. The method of using a copper alloy powder according to claim 1 , wherein the copper alloy powder contains not less than 1.46 mass % and not more than 2.80 mass % of chromium. 6. The method of using a copper alloy powder according to claim 1 , wherein the copper alloy powder contains more than 1.00 mass % and not more than 1.22 mass % of chromium.

Assignees

Inventors

Classifications

  • B22F10/28Primary

    Powder bed fusion, e.g. selective laser melting [SLM] or electron beam melting [EBM] · CPC title

  • Alloys based on copper · CPC title

  • Thermal after-treatment · CPC title

  • After-treatment of workpieces or articles {(B22F3/1146 takes precedence)} · CPC title

  • Products made by additive manufacturing · CPC title

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What does patent US12084745B2 cover?
A copper alloy powder is a copper alloy powder for additive manufacturing. The copper alloy powder contains more than 1.00 mass % and not more than 2.80 mass % of chromium, and a balance of copper. A method for producing an additively-manufactured article includes a first step of preparing a copper alloy powder containing more than 1.00 mass % and not more than 2.80 mass % of chromium and a bal…
Who is the assignee on this patent?
Daihen Corp, Osaka Res Inst Ind Science & Tech
What technology area does this patent fall under?
Primary CPC classification B22F10/28. Mapped technology areas include Operations & Transport.
When was this patent published?
Publication date Tue Sep 10 2024 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).