Chemical liquid preparation device, and substrate processing device

Patent metadata

Field	Value
Publication number	US-12064739-B2
Application number	US-202217867693-A
Country	US
Kind code	B2
Filing date	Jul 19, 2022
Priority date	Sep 22, 2017
Publication date	Aug 20, 2024
Grant date	Aug 20, 2024

Abstract

A chemical liquid preparation method of preparing a chemical liquid for treating a film formed on a substrate, including a gas dissolving process in which an oxygen-containing gas and an inert-gas-containing gas are dissolved in the chemical liquid by supplying the oxygen-containing gas which contains oxygen gas and the inert-gas-containing gas which contains an inert gas to a chemical liquid, wherein in the gas dissolving process, a dissolved oxygen concentration in the chemical liquid is adjusted by setting a mixing ratio between the oxygen-containing gas and the inert-gas-containing gas supplied to the chemical liquid as a mixing ratio corresponding to a predetermined target dissolved oxygen concentration.

First claim

What is claimed is:

1. A chemical liquid preparation device configured to prepare a chemical liquid supplied to a film formed on a substrate in a processing unit, the device comprising:
a tank in which a chemical liquid to be supplied to the processing unit is stored; and
a gas dissolving unit configured to dissolve, in the chemical liquid stored in the tank, a mixed gas of an oxygen-containing gas which contains oxygen gas and an inert-gas-containing gas which contains an inert gas to the chemical liquid;
wherein the gas dissolving unit includes
a mixing piping through which the mixed gas is discharged into the tank,
an oxygen-containing gas piping through which the oxygen-containing gas from an oxygen-containing gas supply source is supplied to the mixed gas piping,
an inert-gas-containing gas piping through which the inert-gas-containing gas from an inert-gas-containing gas supply source is supplied to the mixed gas piping,
a first flow rate adjusting valve to change a flow rate of the oxygen-containing gas supplied from the oxygen-containing gas piping to the mixed gas piping, and
a second flow rate adjusting valve to change a flow rate of the inert-gas-containing gas supplied from the inert-gas-containing gas piping to the mixed gas piping;
the chemical liquid preparation device further comprising a controller programmed to operate the first flow rate adjusting valve and the second flow rate adjusting valve such that the first flow rate adjusting valve supplies the oxygen-containing gas with a first supply flow rate from the oxygen-containing gas piping to the mixed gas piping and that the second flow rate adjusting valve supplies the inert-gas-containing gas with a second supply flow rate from the inert-gas-containing gas piping to the mixed gas piping so as to produce the mixed gas of the oxygen-containing gas and the inert-gas-containing gas in the mixed gas piping, wherein a ratio of the first supply flow rate and the second supply flow rate are set based on a mixing ratio corresponding to a predetermined target dissolved oxygen concentration.

2. The chemical liquid preparation device according to claim 1 ,
wherein the chemical liquid to be prepared comprises a TMAH-containing chemical liquid which contains tetramethylammonium hydroxide (TMAH).

3. The chemical liquid preparation device according to claim 2 ,
wherein the mixed gas piping comprises a bubbling piping through which the mixed gas is discharged from a gas discharge port disposed in the chemical liquid stored in the tank to generate bubbles in the chemical liquid.

4. The chemical liquid preparation device according to claim 1 ,
wherein the mixed gas piping comprises a bubbling piping through which the mixed gas is discharged from a gas discharge port disposed in the chemical liquid stored in the tank to generate bubbles in the chemical liquid.

5. The chemical liquid preparation device according to claim 1 ,
wherein a chemical liquid recovered from the processing unit is stored in the tank.

6. The chemical liquid preparation device according to claim 1 ,
wherein the tank comprises a first tank;
the gas dissolving unit comprises a first gas dissolving unit configured to dissolve an oxygen-containing gas and an inert-gas-containing gas in the chemical liquid by supplying the oxygen-containing gas which contains oxygen gas and the inert-gas-containing gas which contains an inert gas to the chemical liquid stored in the first tank, wherein in the first gas dissolving unit, a dissolved oxygen concentration in the chemical liquid stored in the first tank is adjusted by setting a mixing ratio between the oxygen-containing gas and the inert-gas-containing gas supplied to the chemical liquid as a predetermined mixing ratio;
the tank further comprises a second tank in which the chemical liquid obtained after gas is dissolved by the first gas dissolving unit is stored; and
the gas dissolving unit further comprises a second gas dissolving unit configured to dissolve the oxygen-containing gas and the inert-gas-containing gas in the chemical liquid by supplying the oxygen-containing gas and the inert-gas-containing gas to the chemical liquid stored in the second tank, wherein in the second gas dissolving unit, a dissolved oxygen concentration in the chemical liquid stored in the second tank is adjusted by setting a mixing ratio between the oxygen-containing gas and the inert-gas-containing gas supplied to the chemical liquid as a mixing ratio corresponding to the target dissolved oxygen concentration.

7. The chemical liquid preparation device according to claim 6 ,
wherein the mixing ratio which is a ratio of a supply flow rate of the oxygen-containing gas to a supply flow rate of the inert-gas-containing gas in the first gas dissolving unit is the same as the mixing ratio which is a ratio of the supply flow rate of the oxygen-containing gas to the supply flow rate of the inert-gas-containing gas in the second gas dissolving unit.

8. The chemical liquid preparation device according to claim 6 ,
wherein the mixing ratio which is a ratio of a supply flow rate of the oxygen-containing gas to a supply flow rate of the inert-gas-containing gas in the first gas dissolving unit is lower than the mixing ratio which is a ratio of the supply flow rate of the oxygen-containing gas to the supply flow rate of the inert-gas-containing gas in the second gas dissolving unit.

9. The chemical liquid preparation device according to claim 1 , further comprising
a third tank in which the chemical liquid obtained after gas is dissolved by the gas dissolving unit is stored;
a measurement unit configured to measure a dissolved oxygen concentration of the chemical liquid stored in the third tank;
an inert gas dissolving unit configured to dissolve the inert-gas-containing gas in the chemical liquid by supplying the inert-gas-containing gas to the chemical liquid stored in the third tank;
an oxygen gas dissolving unit configured to dissolve the oxygen-containing gas in the chemical liquid by supplying the oxygen-containing gas to the chemical liquid stored in the third tank; and
a controller configured to control the measurement unit, the inert gas dissolving unit and the oxygen gas dissolving unit,
wherein the controller performs a measurement process in which a dissolved oxygen concentration of the chemical liquid stored in the third tank is measured by the measurement unit;
an inert gas dissolving process in which, when the dissolved oxygen concentration measured in the measurement process is higher than the target dissolved oxygen concentration, the inert-gas-containing gas is dissolved in the chemical liquid stored in the third tank; and
an oxygen-containing gas dissolving process in which, when the dissolved oxygen concentration measured in the measurement process is lower than the target dissolved oxygen concentration, the oxygen-containing gas is dissolved in the chemical liquid stored in the third tank.

10. The chemical liquid preparation device according to claim 1 , wherein
the controller includes a storage that stores a correspondence relationship between a supply flow rate ratio between the oxygen-containing gas and the inert-gas-containing gas and a convergent dissolved oxygen concentration in the chemical liquid that is converged to when the oxygen-containing gas and the inert-gas-containing gas are supplied into the chemical liquid at the flow rate ratio, and
the controller is programmed to refer to the correspondence stored in the storage with the predetermined target dissolved oxygen concentration set as the convergent dissolved oxygen concentration, to acquire the supply flow rate ratio between the oxygen-containing gas and the inert-gas

Assignees

• Screen Holdings Co Ltd

Inventors

• Nishide Hajime
• Izuta Takashi
• Hayashi Takatoshi
• Fukui Katsuhiro
• Okamoto Koichi
• Fujita Kazuhiro
• Miura Atsuyasu
• Kobayashi Kenji
• Negoro Sei
• Tsujikawa Hiroki

Classifications

• H10P72/0424 Primary

  using mainly spraying means, e.g. nozzles · CPC title

• H10P72/0422

  for wet etching · CPC title

• H10P72/0414

  using mainly spraying means, e.g. nozzles · CPC title

• H10P72/0406

  for cleaning followed by drying, rinsing, stripping, blasting or the like · CPC title

• H10P72/0402

  Apparatus for fluid treatment (H10P72/0441, H10P72/0448 take precedence) · CPC title