Substrate treatment method and substrate treatment apparatus
US-2024162032-A1 · May 16, 2024 · US
Device for supplying water containing dissolved gas and process for producing water containing dissolved gas
US9302298B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-9302298-B2 |
| Application number | US-201013138655-A |
| Country | US |
| Kind code | B2 |
| Filing date | Mar 29, 2010 |
| Priority date | Mar 31, 2009 |
| Publication date | Apr 5, 2016 |
| Grant date | Apr 5, 2016 |
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- Title
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Abstract
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A device for supplying water containing dissolved gas includes a gas permeable film module that is partitioned into a gas phase chamber having a connection port at a bottom part and a liquid phase chamber by a gas permeable film, a feed unit feeding water to be treated to the liquid phase chamber, a gas supply unit supplying gas to the gas phase chamber, and a vacuum evacuation unit, connected with the gas phase chamber with the connection port, so that the gas is supplied to the gas phase chamber by the gas supply unit while the gas phase chamber is evacuated by the vacuum evacuation unit.
First claim
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The invention claimed is: 1. A process for producing water containing dissolved gas using a device for supplying water containing dissolved gas comprising: a gas permeable film module that is partitioned into a gas phase chamber and a liquid phase chamber by a gas permeable film, the gas phase chamber having a gas supply portion at an upper portion and a connection port at a lower portion; a feed unit feeding water to be treated to the liquid phase chamber; a gas supply unit supplying gas to the gas phase chamber through the gas supply portion; a vacuum evacuation unit connected with the gas phase chamber through the connection port; and a vacuum pump discharging condensed water in the gas phase chamber with vacuum generated therewith, the process comprising: feeding the water to be treated to the liquid phase chamber, and supplying the gas to the gas phase chamber while the gas phase chamber is evacuated so that the gas supplied to the gas phase chamber through the gas supply portion by the gas supply unit is evacuated by the vacuum evacuation unit to thereby constantly discharge the condensed water in the gas phase chamber, wherein a degree of vacuum in the gas phase chamber is higher than a deaeration degree of the water to be treated so that the gas in the gas phase chamber permeates the gas permeable film and dissolves in the water to be treated in the liquid phase chamber to thereby produce the water containing dissolved gas, and the degree of vacuum in the gas phase chamber is equal to or less than −90 kPa. 2. The process according to claim 1 , wherein the connection port has a pressure gauge measuring the degree of vacuum in the gas phase chamber.
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Operations & Transport · mapped topic
Processes · CPC title
Operations & Transport · mapped topic
Operations & Transport · mapped topic
Operations & Transport · mapped topic
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- What does patent US9302298B2 cover?
- A device for supplying water containing dissolved gas includes a gas permeable film module that is partitioned into a gas phase chamber having a connection port at a bottom part and a liquid phase chamber by a gas permeable film, a feed unit feeding water to be treated to the liquid phase chamber, a gas supply unit supplying gas to the gas phase chamber, and a vacuum evacuation unit, connected …
- Who is the assignee on this patent?
- Tokoshima Hiroto, Seo Keita, Kurita Water Ind Ltd
- What technology area does this patent fall under?
- Primary CPC classification B08B3/08. Mapped technology areas include Operations & Transport.
- When was this patent published?
- Publication date Tue Apr 05 2016 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
- What related patents are in patentsdb?
- We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).