Molybdenum (0) precursors for deposition of molybdenum films

US12060370B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-12060370-B2
Application numberUS-202117146878-A
CountryUS
Kind codeB2
Filing dateJan 12, 2021
Priority dateJan 12, 2021
Publication dateAug 13, 2024
Grant dateAug 13, 2024

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

Molybdenum(0) coordination complexes comprising ligands which each coordinate to the metal center by nitrogen or phosphorous are described. Methods for depositing molybdenum-containing films on a substrate are described. The substrate is exposed to a molybdenum precursor and a reactant to form the molybdenum-containing film (e.g., elemental molybdenum, molybdenum oxide, molybdenum carbide, molybdenum silicide, molybdenum nitride). The exposures can be sequential or simultaneous.

First claim

Opening claim text (preview).

What is claimed is: 1. A metal coordination complex consisting of a molybdenum(0) precursor having a general formula of Mo(L) z , wherein z is 2, and L is selected from the group consisting of and wherein each R may be independently selected from Me-, Et-, iPr-, and tBu-.

Assignees

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Classifications

  • by heating · CPC title

  • Physical treatment to alter the texture of the surface, e.g. scratching or polishing · CPC title

  • by cleaning or etching · CPC title

  • After-treatment · CPC title

  • characterized by the ALD cycle, e.g. different flows or temperatures during half-reactions, unusual pulsing sequence, use of precursor mixtures or auxiliary reactants or activations · CPC title

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What does patent US12060370B2 cover?
Molybdenum(0) coordination complexes comprising ligands which each coordinate to the metal center by nitrogen or phosphorous are described. Methods for depositing molybdenum-containing films on a substrate are described. The substrate is exposed to a molybdenum precursor and a reactant to form the molybdenum-containing film (e.g., elemental molybdenum, molybdenum oxide, molybdenum carbide, moly…
Who is the assignee on this patent?
Applied Materials Inc, Nat Univ Singapore
What technology area does this patent fall under?
Primary CPC classification C07F11/00. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Tue Aug 13 2024 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 1 related publication on this page (citations in our corpus or others sharing the same primary CPC).