Enhanced base die heat path using through-silicon vias

US12057369B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-12057369-B2
Application numberUS-202218088478-A
CountryUS
Kind codeB2
Filing dateDec 23, 2022
Priority dateFeb 19, 2020
Publication dateAug 6, 2024
Grant dateAug 6, 2024

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

Embodiments of the present disclosure may generally relate to systems, apparatuses, techniques, and/or processes directed to packages that include stacked dies that use thermal conductivity features including thermally conductive through silicon vias (TSVs) filled with thermally conductive material located in passive areas of a first die to route heat from a first die away from a second die that is coupled with the first die. In embodiments, the first die may be referred to as a base die. Embodiments may include thermal blocks in the form of dummy dies that include TSVs at least partially filled with thermal energy conducting material such as copper, solder, or other alloy.

First claim

Opening claim text (preview).

What is claimed is: 1. A stacked die package, comprising: a substrate; a base die coupled to the substrate by solder; a top die vertically over the base die, the top die coupled to the base die with interconnects, the top die having a first sidewall and a second sidewall, the second sidewall laterally opposite the first sidewall; a first dummy die laterally spaced apart from the first sidewall of the top die, the first dummy die vertically over the base die, and the first dummy die comprising silicon; a second dummy die laterally spaced apart from the second sidewall of the top die, the second dummy die vertically over the base die, and the second dummy die comprising silicon; and a heat spreader vertically over the top die, over the first dummy die and over the second dummy die. 2. The stacked die package of claim 1 , wherein the base die is a thermal energy generating die. 3. The stacked die package of claim 1 , wherein the top die is a thermal energy generating die. 4. The stacked die package of claim 1 , wherein the top die, the first dummy die and the second dummy die are within a footprint of the base die. 5. The stacked die package of claim 1 , further comprising: a thermal interface material between the heat spreader and the top die. 6. The stacked die package of claim 1 , wherein the heat spreader is further laterally spaced apart from a side of the first dummy die and laterally spaced apart from a side of the second dummy die. 7. The stacked die package of claim 1 , wherein the first dummy die and the second dummy die include through silicon vias. 8. The stacked die package of claim 1 , wherein the first dummy die and the second dummy die route thermal energy from the base die away from the top die. 9. A stacked die package, comprising: a substrate; a first thermal energy generating die coupled to the substrate by solder; a second thermal energy generating die vertically over the first thermal energy generating die, the second thermal energy generating die coupled to the first thermal energy generating die with interconnects, the second thermal energy generating die having a first sidewall and a second sidewall, the second sidewall laterally opposite the first sidewall; a first die laterally spaced apart from the first sidewall of the second thermal energy generating die, the first die vertically over the first thermal energy generating die, and the first die comprising silicon; a second die laterally spaced apart from the second sidewall of the second thermal energy generating die, the second die vertically over the first thermal energy generating die, and the second die comprising silicon; and a heat spreader vertically over the second thermal energy generating die, over the first die and over the second die. 10. The stacked die package of claim 9 , wherein the second thermal energy generating die, the first die and the second die are within a footprint of the first thermal energy generating die. 11. The stacked die package of claim 9 , wherein the heat spreader is further laterally spaced apart from a side of the first die and laterally spaced apart from a side of the second die, the stacked die package of claim 1 , further comprising: a thermal interface material between the heat spreader and the second thermal energy generating die. 12. The stacked die package of claim 9 , wherein the first die and the second die include through silicon vias, and wherein the first die and the second die route thermal energy from the first thermal energy generating die away from the second thermal energy generating die. 13. A method of fabricating a stacked die package, the method comprising: coupling a base die coupled to a substrate by solder; coupling a top die to the base die with interconnects, the top die vertically over the base die, the top die having a first sidewall and a second sidewall, the second sidewall laterally opposite the first sidewall; providing a first dummy die laterally spaced apart from the first sidewall of the top die, the first dummy die vertically over the base die, and the first dummy die comprising silicon; providing a second dummy die laterally spaced apart from the second sidewall of the top die, the second dummy die vertically over the base die, and the second dummy die comprising silicon; and forming a heat spreader vertically over the top die, over the first dummy die and over the second dummy die. 14. The method of claim 13 , wherein the base die is a thermal energy generating die. 15. The method of claim 13 , wherein the top die is a thermal energy generating die. 16. The method of claim 13 , wherein the top die, the first dummy die and the second dummy die are with a footprint of the base die. 17. The method of claim 13 , further comprising: forming a thermal interface material between the heat spreader and the top die. 18. The method of claim 13 , wherein the heat spreader is further along a side of the first dummy die and along a side of the second dummy die. 19. The method of claim 13 , wherein the first dummy die and the second dummy die include through silicon vias. 20. The method of claim 13 , wherein the first dummy die and the second dummy die route thermal energy from the base die away from the top die.

Assignees

Inventors

Classifications

  • characterised by arrangements for thermal management of the stacked chips · CPC title

  • Package configurations · CPC title

  • H10W40/22Primary

    characterised by their shape, e.g. having conical or cylindrical projections · CPC title

  • at least one of the stacked chips being laterally offset from a neighbouring stacked chip, e.g. chip stacks having a staircase shape · CPC title

  • between a chip and a stacked insulating package substrate, interposer or RDL · CPC title

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What does patent US12057369B2 cover?
Embodiments of the present disclosure may generally relate to systems, apparatuses, techniques, and/or processes directed to packages that include stacked dies that use thermal conductivity features including thermally conductive through silicon vias (TSVs) filled with thermally conductive material located in passive areas of a first die to route heat from a first die away from a second die tha…
Who is the assignee on this patent?
Intel Corp
What technology area does this patent fall under?
Primary CPC classification H10W40/22. Mapped technology areas include Electricity.
When was this patent published?
Publication date Tue Aug 06 2024 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 12 related publications on this page (citations in our corpus or others sharing the same primary CPC).