Distance measurement between gas distribution device and substrate support at high temperatures

Patent metadata

Field	Value
Publication number	US-12050112-B2
Application number	US-202217877170-A
Country	US
Kind code	B2
Filing date	Jul 29, 2022
Priority date	Jan 3, 2019
Publication date	Jul 30, 2024
Grant date	Jul 30, 2024

Abstract

A substrate processing system includes a laser triangulation sensor configured to transmit and receive light through a window of an exterior wall of a substrate processing chamber. A controller is configured to: position the laser triangulation sensor such that the laser triangulation sensor transmits light onto a measurement feature arranged between a first surface of a substrate support and a second surface of a gas distribution device, where the second surface faces the first surface; and while the laser triangulation sensor transmits light onto the measurement feature, determine a first distance between the first and second surfaces based on a difference between: a second distance between the laser triangulation sensor and the first surface measured using the laser triangulation sensor; and a third distance between the laser triangulation sensor and the second surface measured using the laser triangulation sensor.

First claim

What is claimed is:

1. A substrate processing system comprising:
a distance sensor configured to transmit and receive light through a window of an exterior wall of a substrate processing chamber; and
a controller configured to, while the distance sensor transmits light onto a measurement feature arranged between a first surface of a substrate support and a second surface of a gas distribution device, determine a first distance between the first and second surfaces based on a difference between:
a second distance between the distance sensor and the first surface measured using the distance sensor; and
a third distance between the distance sensor and the second surface measured using the distance sensor,

wherein the second surface faces the first surface.

2. The substrate processing system of claim 1 wherein the measurement feature is configured to:
reflect light from the distance sensor onto the first surface when the distance sensor outputs light to a first surface of the measurement feature; and
reflect light from the distance sensor onto the second surface when the distance sensor outputs light to a second surface of the measurement feature.

3. The substrate processing system of claim 1 wherein the measurement feature includes a knife edge prism including a mirror coating.

4. The substrate processing system of claim 1 wherein the controller is configured to increase a temperature within the substrate processing chamber greater than or equal to a predetermined processing temperature,
wherein the controller is configured to determine the first distance while the temperature is greater than or equal to the predetermined processing temperature.

5. The substrate processing system of claim 4 wherein the predetermined processing temperature is at least 80 degrees Celsius.

6. The substrate processing system of claim 1 further comprising:
an adjustment mechanism configured to raise and lower a portion of the gas distribution device.

7. The substrate processing system of claim 6 wherein the controller is configured to selectively actuate the adjustment mechanism based on the first distance.

8. The substrate processing system of claim 7 wherein the controller is configured to selectively actuate the adjustment mechanism to adjust the first distance toward a first target distance.

9. The substrate processing system of claim 1 wherein the controller is further configured to, while the distance sensor transmits light onto a second measurement feature arranged between the first surface of the substrate support and the second surface of the gas distribution device, determine a fourth distance between the first and second surfaces based on a second difference between:
a fifth distance between the distance sensor and the first surface measured using the distance sensor; and
a sixth distance between the distance sensor and the second surface measured using the distance sensor.

10. The substrate processing system of claim 9 wherein the controller is further configured to, while the distance sensor transmits light onto a third measurement feature arranged between the first surface of the substrate support and the second surface of the gas distribution device, determine a seventh distance between the first and second surfaces based on a third difference between:
an eighth distance between the distance sensor and the first surface measured using the distance sensor; and
a ninth distance between the distance sensor and the second surface measured using the distance sensor.

11. The substrate processing system of claim 10 further comprising:
a first adjustment mechanism configured to raise and lower a first point on the gas distribution device;
a second adjustment mechanism configured to, independently of the first adjustment mechanism, raise and lower a second point on the gas distribution device; and
a third adjustment mechanism configured to, independently of the first and second adjustment mechanisms, raise and lower a third point on the gas distribution device.

12. The substrate processing system of claim 11 wherein the controller is configured to selectively actuate at least one of the first, second, and third adjustment mechanisms based on at least one of the first, second, and third distances.

13. A substrate processing method comprising:
by a distance sensor, transmitting and receiving light through a window of an exterior wall of a substrate processing chamber; and
while the distance sensor transmits light onto a measurement feature arranged between a first surface of a substrate support and a second surface of a gas distribution device, determining a first distance between the first and second surfaces based on a difference between:
a second distance between the distance sensor and the first surface measured using the distance sensor; and
a third distance between the distance sensor and the second surface measured using the distance sensor,

wherein the second surface faces the first surface.

14. The substrate processing method of claim 13 further comprising, by the measurement feature:
reflecting light from the distance sensor onto the first surface when the distance sensor outputs light to a first surface of the measurement feature; and
reflecting light from the distance sensor onto the second surface when the distance sensor outputs light to a second surface of the measurement feature.

15. The substrate processing method of claim 13 wherein the measurement feature includes a knife edge prism including a mirror coating.

16. The substrate processing method of claim 13 further comprising increasing a temperature within the substrate processing chamber greater than or equal to a predetermined processing temperature,
wherein the determining the first distance includes determining the first distance while the temperature is greater than or equal to the predetermined processing temperature.

17. The substrate processing method of claim 16 wherein the predetermined processing temperature is at least 80 degrees Celsius.

18. The substrate processing method of claim 13 further comprising:
raising and lowering a portion of the gas distribution device.

19. The substrate processing method of claim 18 wherein the raising and lowering includes at least one of raising and lowering the portion of the gas distribution device based on the first distance.

20. The substrate processing method of claim 19 wherein the raising and lowering includes at least one of raising and lowering the portion of the gas distribution device to adjust the first distance toward a first target distance.

21. The substrate processing method of claim 13 further comprising, while the distance sensor is transmitting light onto a second measurement feature arranged between the first surface of the substrate support and the second surface of the gas distribution device, determining a fourth distance between the first and second surfaces based on a second difference between:
a fifth distance between the distance sensor and the first surface measured using the distance sensor; and
a sixth distance between the distance sensor and the second surface measured using the distance sensor.

22. The substrate processing method of claim 21 further comprising, while the distance sensor is transmitting light onto a third measurement feature arranged between the first surface of the substrate support and the second surface of the gas distribution device, determine a seventh distance between t

Assignees

• Lam Res Corp

Inventors

• Emerson Mark E
• Linebarger Jr Nick Ray

Classifications

• C23C16/45544

  characterized by the apparatus · CPC title

• G01B11/14

  for measuring distance or clearance between spaced objects or spaced apertures (G01B11/26 takes precedence; rangefinders G01C3/00) · CPC title

• G01B11/02

  for measuring length, width or thickness (G01B11/08 takes precedence) · CPC title

• H01J37/32009

  Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources (plasma generation in general H05H1/24) · CPC title

• C23C16/455

  characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber · CPC title