Vertically oriented plasma reactor

US12048910B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-12048910-B2
Application numberUS-201917258881-A
CountryUS
Kind codeB2
Filing dateJul 11, 2019
Priority dateJul 11, 2018
Publication dateJul 30, 2024
Grant dateJul 30, 2024

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

A vertically oriented plasma reactor is provided. In another aspect, a plasma reactor includes a vertically elongated vacuum chamber, a wall internally projecting within a middle section of the housing, magnets, electrodes and a radio frequency source. A further aspect employs a workpiece-entry port and an opposite workpiece material-exit port, with one located adjacent a top end and the other adjacent a bottom end of a vertically elongated reactor housing or vacuum chamber. Yet another aspect employs a moving or falling-bed plasma reactor for use in activating biochar material.

First claim

Opening claim text (preview).

What is claimed is: 1. A falling-bed plasma reactor comprising: an outer housing elongated in a substantially vertical direction; a wall internally projecting within a middle section of the housing, the wall having an upper surface offset angled relative to the vertical direction and a horizontal direction; magnets located adjacent at least one of: the wall and the housing, the magnets being vertically spaced apart from each other; electrodes located adjacent or being part of at least one of: the wall and the housing; a radio frequency source configured to generate an RF electrical field within the outer housing; a workpiece material-entry port located adjacent one of: a top end or a bottom end, of the housing; and a workpiece material-exit port located adjacent the other of: the top end or the bottom end, of the housing opposite the entry port. 2. The reactor of claim 1 , wherein the wall is part of a spiral slide which spirals around a central elongated axis substantially parallel to the vertical direction, and at least portions of the spiral slide are substantially surrounded by the magnets which are arcuate. 3. The reactor of claim 1 , wherein the wall is part of a series of overlapping and oppositely projecting baffles creating a substantially serpentine workpiece-flow path therealong, and at least some of the baffles are magnetized by the magnets. 4. The reactor of claim 1 , wherein one of the electrodes is a central rod which is substantially vertically elongated and laterally spaced inboard of the outer housing, and the electrodes are always spaced apart from each other. 5. The reactor of claim 4 , wherein a first of the electrodes is coupled to the radio frequency source and a second of the electrodes is electrically grounded such that a primary middle vector of an internal magnetic field is substantially perpendicular to an electric field within the outer housing. 6. The reactor of claim 1 , further comprising: reactive gas flows from a gas tank into a vacuum chamber within the outer housing; biochar being activated by plasma as it moves through the outer housing and contacts the wall; and a magnetic field from the magnets increasing plasma density which speeds up activation of the biochar within the vacuum chamber, and strength of the magnetic field being 100-2,000 Gauss. 7. The reactor of claim 1 , wherein at least one of the electrodes has an arcuate cross-sectional shape, is vertically elongated and is adjacent to the outer housing, and the electrodes being internal to the magnets. 8. A plasma reactor system comprising: an outer housing elongated in a substantially vertical direction; a baffle surface or slide surface internally projecting within the housing; permanent magnets located adjacent or being part of at least one of: the baffle surface, the slide surface, and the housing; electrodes located adjacent or being part of at least one of: the baffle surface, the slide surface, and the housing; a material-entry port located adjacent a top end or a bottom end of the housing; a material-exit port located adjacent one of the ends of the housing opposite the entry port; and biochar material vertically moving within the housing between the ports, contacting the baffle surface or the slide surface, and being activated with the assistance of the magnets and the electrodes. 9. The reactor system of claim 8 , further comprising a radio frequency source connected to at least one of the electrodes, and the magnets being vertically spaced apart from each other. 10. The reactor system of claim 9 , wherein a first of the electrodes is coupled to the radio frequency source and a second of the electrodes is electrically grounded such that a primary middle vector of an internal magnetic field is substantially perpendicular to an electric field within the outer housing, and the electrodes are internal to the magnets. 11. The reactor system of claim 8 , wherein the surface is part of a spiral slide which spirals around a central elongated axis substantially parallel to the vertical direction, and at least portions of the spiral slide are substantially surrounded by the magnets. 12. The reactor system of claim 8 , wherein: the surface is part of a series of overlapping and oppositely projecting baffles creating a substantially serpentine biochar material-flow path therealong; at least some of the baffles are magnetized by the magnets; a magnetic field from the magnets increasing plasma density which speeds up activation of the biochar within the vacuum chamber; and strength of the magnetic field being 100-2,000 Gauss. 13. A plasma reactor comprising: a vacuum chamber elongated in a substantially vertical direction; a set of alternating baffles each having an upper surface offset angled relative to the vertical direction and a horizontal direction; magnets located adjacent at least some of the baffles; at least one of the baffles being coupled to or acting as an electrode; and a workpiece material-entry port located adjacent a top end of a housing. 14. The reactor of claim 13 , wherein the magnets are permanent magnets which are mounted within at least some of the baffles adjacent the upper surfaces thereof. 15. The reactor of claim 13 , wherein the alternating baffles are overlapping and oppositely projecting baffles creating a substantially serpentine flow path therealong for biochar which is activated in a plasma created within the vacuum chamber, and the magnets are spaced apart from each other in a workpiece direction of flow. 16. The reactor of claim 13 , further comprising: a radio frequency source connected to at least one of the baffles; and multiple of the baffles acting as the electrodes. 17. The reactor of claim 13 , further comprising magnetically conductive shunts located between wider bases of at least some of the baffles and a wall of the vacuum chamber. 18. The reactor of claim 13 , wherein the magnets are located between a wider bases of some of the baffles and a vertically elongated outer electrode. 19. The reactor of claim 13 , wherein at least some of the baffles each include a lower surface and a wider base surface, the surfaces create a triangular shape with an apex facing inwardly and the base outwardly in the vacuum chamber. 20. A falling-bed plasma reactor comprising: a vacuum chamber elongated in a substantially vertical direction; permanent magnets located adjacent the vacuum chamber; a central electrode located centrally within the vacuum chamber and being elongated in the substantially vertical direction; an outer electrode located outside of the vacuum chamber and being elongated in the substantially vertical direction; the electrodes always being spaced apart from each other; a radio frequency source connected to at least one of the electrodes; a biochar-entry port located adjacent a top end or a bottom end of the vacuum chamber; and a biochar-exit port located adjacent an end of the vacuum chamber substantially opposite the entry port. 21. The reactor of claim 20 , further comprising a spiral slide which spirals around the central electrode, at least a portion of the spiral slide and the central electrode being substantially surrounded by the outer electrode and the magnets. 22. The reactor of claim 21 , wherein the slide is part of a rotatable auger. 23. A method of using a plasma reactor, the method comprising: (a) vertically moving workpiece material through a vacuum chamber

Assignees

Inventors

Classifications

  • Processes carried out in the presence of a plasma · CPC title

  • of sorbents or filter aids comprising free carbon, e.g. activated carbon · CPC title

  • comprising free carbon; comprising carbon obtained by carbonising processes · CPC title

  • Baffles · CPC title

  • using capacitive coupling means, e.g. electrodes · CPC title

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What does patent US12048910B2 cover?
A vertically oriented plasma reactor is provided. In another aspect, a plasma reactor includes a vertically elongated vacuum chamber, a wall internally projecting within a middle section of the housing, magnets, electrodes and a radio frequency source. A further aspect employs a workpiece-entry port and an opposite workpiece material-exit port, with one located adjacent a top end and the other …
Who is the assignee on this patent?
Univ Michigan State
What technology area does this patent fall under?
Primary CPC classification B01J19/088. Mapped technology areas include Operations & Transport.
When was this patent published?
Publication date Tue Jul 30 2024 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 12 related publications on this page (citations in our corpus or others sharing the same primary CPC).