Magnetoresistance effect element

US12048251B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-12048251-B2
Application numberUS-202117345084-A
CountryUS
Kind codeB2
Filing dateJun 11, 2021
Priority dateNov 14, 2017
Publication dateJul 23, 2024
Grant dateJul 23, 2024

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

Provided is a magnetoresistance effect element that suppresses re-adhesion of impurities during preparation and allows a write current to easily flow. The magnetoresistance effect element includes a first ferromagnetic layer, a second ferromagnetic layer; and a nonmagnetic layer interposed between the first ferromagnetic layer and the second ferromagnetic layer. In the magnetoresistance effect element, the nonmagnetic layer is a tunnel barrier layer constituted by an insulator, a side surface of the first ferromagnetic layer, a side surface of the second ferromagnetic layer and a side surface of the nonmagnetic layer form a continuous inclined surface in any side surface, and a thickness of inside the nonmagnetic layer is thicker than a thickness of outside the nonmagnetic layer.

First claim

Opening claim text (preview).

What is claimed is: 1. A magnetoresistance effect element, comprising: a first ferromagnetic layer; a second ferromagnetic layer; and a nonmagnetic layer interposed between the first ferromagnetic layer and the second ferromagnetic layer, wherein the nonmagnetic layer is constituted by a metal, a side surface of the first ferromagnetic layer, a side surface of the second ferromagnetic layer and a side surface of the nonmagnetic layer form a continuous inclined surface in any side surface, and a thickness of inside the nonmagnetic layer is thicker than a thickness of outside the nonmagnetic layer. 2. The magnetoresistance effect element according to claim 1 , wherein, in a first direction extending the first ferromagnetic layer, the second ferromagnetic layer, and the nonmagnetic layer, an inclination angle of a first inclined surface including a first side surface of the first ferromagnetic layer, a first side surface of the second ferromagnetic layer and a first side surface of the nonmagnetic layer with respect to a lamination direction is greater than an inclination angle of a second inclined surface including a second side surface of the first ferromagnetic layer, a second side surface of the second ferromagnetic layer and a second side surface of the nonmagnetic layer, which intersect the first direction, with respect to the lamination direction. 3. The magnetoresistance effect element according to claim 1 , wherein in a first direction extending the first ferromagnetic layer, the second ferromagnetic layer, and the nonmagnetic layer, an inclination angle of a first inclined surface including a first side surface of the first ferromagnetic layer, a first side surface of the second ferromagnetic layer and a first side surface of the nonmagnetic layer with respect to a lamination direction is 45° or greater. 4. The magnetoresistance effect element according to claim 2 , wherein in the first direction an inclination angle of the first inclined surface with respect to the lamination direction is 45° or greater.

Assignees

Inventors

Classifications

  • H10N50/85Primary

    Materials of the active region · CPC title

  • details concerning the memory cell structure, e.g. the layers of the ferromagnetic memory cell · CPC title

  • Constructional details · CPC title

  • H10N50/10Primary

    Magnetoresistive devices · CPC title

  • Constructional details · CPC title

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What does patent US12048251B2 cover?
Provided is a magnetoresistance effect element that suppresses re-adhesion of impurities during preparation and allows a write current to easily flow. The magnetoresistance effect element includes a first ferromagnetic layer, a second ferromagnetic layer; and a nonmagnetic layer interposed between the first ferromagnetic layer and the second ferromagnetic layer. In the magnetoresistance effect …
Who is the assignee on this patent?
Tdk Corp
What technology area does this patent fall under?
Primary CPC classification H10N50/85. Mapped technology areas include Electricity.
When was this patent published?
Publication date Tue Jul 23 2024 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).