Shield for filament in an ion source

Patent metadata

Field	Value
Publication number	US-12046443-B2
Application number	US-202117532358-A
Country	US
Kind code	B2
Filing date	Nov 22, 2021
Priority date	Nov 22, 2021
Publication date	Jul 23, 2024
Grant date	Jul 23, 2024

Abstract

A Bernas ion source having a shield is disclosed. The shield is disposed between the distal portion of the filament and the first end of the chamber and serves to confine the plasma to the region between the shield and the second end of the chamber. The shield may be electrically connected to the negative leg of the filament so as to be the most negatively biased component in the chamber. In other embodiments, the shield may be electrically floating. In this embodiment, the shield may self-bias. The shield is typically made of a refractory metal. The use of the shield may reduce back heating of the filament by the plasma and reduce the possibility for thermal runaway. This may allow denser plasmas to be generated within the chamber.

First claim

What is claimed is:

1. An ion source comprising:
a chamber comprising a first end, a second end and walls connecting the first end and the second end, the second end having an extraction aperture;
a filament disposed in the chamber, comprising a first pair of filament elements and a second pair of filament elements, wherein each filament element has a negative leg, a second leg and a distal portion connected to the negative leg and the second leg, wherein each distal portion is directly exposed to a plasma disposed in the chamber;
wherein the first pair of filament elements and the second pair of filament elements extend into the chamber from the first end, wherein distal portions of the first pair of filament elements extend further into the chamber than distal portions of the second pair of filament elements, wherein the distal portion of each filament element comprises a semicircle and wherein the distal portions of each pair of filament elements form a portion of a circumference of a circle; wherein the circle formed by the first pair of filament elements has a diameter, smaller than a diameter of the circle formed by second pair of filament elements;
a filament power supply in communication with the negative leg and the second leg of each filament element; and
a shield, wherein the shield is a refractory metal and comprises a lower tier comprising a cylinder having a first height and a first diameter, disposed between the first end and the distal portion of the second pair of filament elements; and an upper tier, disposed above the lower tier, which extends further into the chamber than the lower tier, comprising a concentric cylinder which is an uppermost portion of the shield, the concentric cylinder having a second height and a second diameter, smaller than the first diameter; wherein the upper tier does not extend into the chamber past the distal portion of the first pair of filament elements and wherein the first diameter extends radially further than the distal portion of the filament elements such that the first diameter is greater than a distance between the negative leg and a corresponding second leg of each filament element and wherein the second diameter is smaller than the diameter of the circle formed by the first pair of filament elements.

2. The ion source of claim 1 , wherein the ion source is a multicusp ion source and comprises magnets disposed along the walls.

3. The ion source of claim 1 , wherein the shield is electrically connected to the negative leg such that the shield is a most negatively biased component in the chamber.

4. The ion source of claim 1 , wherein the shield is electrically floating.

5. The ion source of claim 1 , further comprising:
an electrode disposed outside the chamber and proximate the extraction aperture, having an electrode aperture; and
an electrode power supply to provide a voltage to the electrode.

6. The ion source of claim 5 , wherein the electrode is biased positively relative to the chamber so as to attract negative ions and electrons through the extraction aperture.

7. The ion source of claim 1 , wherein the shield comprises a round plate.

8. The ion source of claim 1 , wherein the shield comprises a metal mesh or a plate comprising a plurality of holes.

9. An ion implantation system, comprising:
the ion source of claim 1 ;
a mass analyzer to receive ions extracted from the ion source; and
a tandem accelerator to accelerate ions exiting the mass analyzer.

10. The ion source of claim 1 , wherein the second height is less than a distance from the second end to the distal portions of the first pair of filament elements.

Assignees

• Applied Materials Inc

Inventors

• Becker Klaus
• Amato Luigi G
• Gomez Elvis
• Burgdorf David
• Theriault Victor
• Stewart Thomas

Classifications

• H01J37/3171

  for ion implantation · CPC title

• H01J37/09

  Diaphragms; Shields associated with electron or ion-optical arrangements; Compensation of disturbing fields · CPC title

• H01J2237/31701

  Ion implantation · CPC title

• H01J27/02

  Ion sources; Ion guns {(for examination or processing discharge tubes H01J37/08; ion sources, ion guns for particle spectrometer or separator tubes H01J49/10; ion propulsion F03H1/00)} · CPC title

• H01J2237/026

  Shields · CPC title