Hybrid ion source for aluminum ion generation using organoaluminium compounds and a solid target

US12040154B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-12040154-B2
Application numberUS-202217740854-A
CountryUS
Kind codeB2
Filing dateMay 10, 2022
Priority dateMay 10, 2022
Publication dateJul 16, 2024
Grant dateJul 16, 2024

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

An ion source that is capable of different modes of operation is disclosed. A solid target may be disposed in the arc chamber. The ion source may have several gas inlets, in communication with different gasses. When operating in a first mode, the ion source may supply a first gas, such as a halogen containing gas. When operating in a second mode, the ion source may supply an organoaluminium gas. Ions having single charges may be created in the first mode, while ions having multiple charges may be created in the second mode. In some embodiments, the solid target may be retractable.

First claim

Opening claim text (preview).

What is claimed is: 1. An indirectly heated cathode ion source, comprising: an arc chamber, comprising a plurality of walls and adapted to contain a solid target; an indirectly heated cathode disposed in the arc chamber; a first valve in communication with the arc chamber and a first gas source; a second valve in communication with the arc chamber and a second gas source; and a controller in communication with the first valve and the second valve so as to operate the indirectly heated cathode ion source in one of a plurality of modes, wherein the plurality of modes comprises a single charge mode to create ions of a species having a single charge and a multicharge mode to create ions of the species having two or more charges. 2. The indirectly heated cathode ion source of claim 1 , wherein the species comprises a metal. 3. The indirectly heated cathode ion source of claim 1 , wherein in the single charge mode, the controller opens the first valve and closes the second valve. 4. The indirectly heated cathode ion source of claim 1 , wherein in the multicharge mode, the controller closes the first valve and opens the second valve. 5. The indirectly heated cathode ion source of claim 1 , further comprising the solid target. 6. The indirectly heated cathode ion source of claim 5 , wherein the solid target is mounted on one of the plurality of walls. 7. The indirectly heated cathode ion source of claim 5 , wherein the solid target is mounted on an end of the arc chamber opposite the indirectly heated cathode. 8. The indirectly heated cathode ion source of claim 5 , wherein the solid target comprises a ceramic material comprising a metal and the metal is also a component of a second gas contained in the second gas source. 9. The indirectly heated cathode ion source of claim 8 , wherein the metal is aluminum and the ceramic material is aluminum oxide or aluminum nitride. 10. The indirectly heated cathode ion source of claim 1 , wherein the first gas source contains a halogen containing species and the second gas source contains dimethylaluminum chloride or trimethylaluminum chloride. 11. The indirectly heated cathode ion source of claim 1 , further comprising a retractable arm on which the solid target is disposed, and wherein the plurality of modes comprises a second single charge mode to create ions of a species having a single charge, wherein in the second single charge mode, the controller retracts the retractable arm and opens the second valve. 12. A method of operating an indirectly heated cathode ion source in a plurality of modes, wherein the indirectly heated cathode ion source comprises a controller, and an arc chamber adapted to contain a solid target comprising a metal, the method comprising: selecting a desired mode of operation; and using the controller to configure the indirectly heated cathode ion source to operate in the desired mode, wherein to operate in a multicharge mode, wherein the multicharge mode is used to create ions of a species having two or more charges, the solid target is disposed in the arc chamber and the controller enables a flow of a first gas containing the metal into the arc chamber; and wherein to operate in a single charge mode, wherein the single charge mode is to create ions of the species having a single charge, the controller either removes the solid target from the arc chamber or uses a second gas to generate a plasma. 13. The method of claim 12 , wherein the second gas comprises a halogen containing species. 14. The method of claim 12 , wherein the metal is aluminum and the solid target is aluminum oxide or aluminum nitride. 15. The method of claim 14 , wherein the first gas containing the metal comprises DMAC or TMAC. 16. An indirectly heated cathode ion source, comprising: an arc chamber, comprising a plurality of walls and adapted to contain a solid target; an indirectly heated cathode disposed in the arc chamber, wherein the indirectly heated cathode is used to generate a plasma in the arc chamber; and a controller configured to operate the indirectly heated cathode ion source in one of a plurality of modes, wherein the plurality of modes comprises a single change mode and a multicharged mode, and wherein in multicharge mode, the controller configures the indirectly heated cathode ion source such that two sources of a metal are used in a generation of a plasma. 17. The indirectly heated cathode ion source of claim 16 , wherein the metal is aluminum, the solid target comprises aluminum oxide or aluminum nitride and wherein a gas containing aluminum and carbon is introduced into the arc chamber when operating in the multicharge mode. 18. The indirectly heated cathode ion source of claim 16 , wherein the controller controls an actuator so as to insert and remove the solid target from the arc chamber. 19. The indirectly heated cathode ion source of claim 16 , wherein in a single charge mode, only one of the two sources is introduced into the arc chamber.

Assignees

Inventors

Classifications

  • Gas supply means · CPC title

  • Electron sources · CPC title

  • with electrons, e.g. electron impact ionisation, electron attachment · CPC title

  • H01J37/08Primary

    Ion sources; Ion guns · CPC title

Patent family

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Frequently asked questions

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What does patent US12040154B2 cover?
An ion source that is capable of different modes of operation is disclosed. A solid target may be disposed in the arc chamber. The ion source may have several gas inlets, in communication with different gasses. When operating in a first mode, the ion source may supply a first gas, such as a halogen containing gas. When operating in a second mode, the ion source may supply an organoaluminium gas…
Who is the assignee on this patent?
Applied Materials Inc
What technology area does this patent fall under?
Primary CPC classification H01J37/3244. Mapped technology areas include Electricity.
When was this patent published?
Publication date Tue Jul 16 2024 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 12 related publications on this page (citations in our corpus or others sharing the same primary CPC).