Ion source crucible for solid feed materials

Patent metadata

Field	Value
Publication number	US-10600611-B2
Application number	US-201816190649-A
Country	US
Kind code	B2
Filing date	Nov 14, 2018
Priority date	Dec 12, 2017
Publication date	Mar 24, 2020
Grant date	Mar 24, 2020

Abstract

An ion source with a crucible is disclosed. In some embodiments, the crucible is disposed in one of the ends of the ions source, opposite the cathode. In other embodiments, the crucible is disposed in one of the side walls. A feed material, which may be in solid form is disposed in the crucible. In certain embodiments, the feed material is sputtered by ions and electrons in the plasma. In other embodiments, the feed material is heated so that it vaporizes. The ion source may be oriented so that the crucible is disposed in the lowest wall so that gravity retains the feed material in the crucible.

First claim

What is claimed is:

1. An indirectly heated cathode ion source, comprising:
an arc chamber, comprising a plurality of electrically conductive side walls connecting a first end and a second end;
an indirectly heated cathode disposed on the first end of the arc chamber; and
a crucible disposed on the second end of the arc chamber, wherein the crucible comprises a target holder having a recessed cavity into which a feed material is disposed.

2. The indirectly heated cathode ion source of claim 1 , further comprising an electrode disposed on one of the plurality of electrically conductive side walls; wherein a voltage is applied to the electrode relative to a voltage applied to the plurality of electrically conductive side walls of the arc chamber.

3. The indirectly heated cathode ion source of claim 1 , wherein the arc chamber is oriented so that gravity retains the feed material in the crucible.

4. The indirectly heated cathode ion source of claim 1 , wherein the crucible comprises a heated crucible in which the feed material is heated.

5. The indirectly heated cathode ion source of claim 4 , further comprising a cover having a small opening disposed on a top of the recessed cavity.

6. The indirectly heated cathode ion source of claim 4 , wherein a filament is used to heat the feed material.

7. The ion source of claim 1 , wherein a top surface of the crucible is flush with the second end.

8. The ion source of claim 1 , wherein the crucible rests the second end.

9. An indirectly heated cathode ion source, comprising:
an arc chamber, comprising a plurality of electrically conductive side walls connecting a first end and a second end;
an indirectly heated cathode disposed on the first end of the arc chamber; and
a crucible disposed on a second side wall, opposite a first side wall, wherein the crucible comprises a target holder having a recessed cavity into which a feed material is disposed.

10. The indirectly heated cathode ion source of claim 9 , further comprising an electrode disposed on the first side wall; wherein a voltage is applied to the electrode relative to a voltage applied to the plurality of electrically conductive side walls of the arc chamber.

11. The indirectly heated cathode ion source of claim 9 , wherein the arc chamber is oriented so that gravity retains the feed material in the crucible.

12. The indirectly heated cathode ion source of claim 9 , wherein the crucible comprises a heated crucible, in which the feed material is heated.

13. The indirectly heated cathode ion source of claim 12 , wherein a filament is used to heat the feed material.

14. The indirectly heated cathode ion source of claim 9 , further comprising a second crucible disposed on the second side wall.

15. The ion source of claim 9 , wherein a top surface of the crucible is flush with the second side wall.

16. The ion source of claim 9 , wherein the crucible rests on the second side wall.

17. An ion source, comprising:
an arc chamber, having a plurality of walls in which a plasma is generated; and
a crucible disposed on one of the plurality of walls, to hold a feed material;
wherein the arc chamber is oriented so that gravity retains the feed material in the crucible, wherein the crucible comprises a target holder having a recessed cavity into which the feed material is disposed and wherein a top surface of the crucible is flush with the one of the plurality of walls.

18. The ion source of claim 17 , wherein the crucible comprises a heated crucible, in which the feed material is heated.

19. The ion source of claim 18 , wherein a filament is used to heat the feed material.

20. The ion source of claim 17 , wherein the plasma is generated using an indirectly heated cathode.

21. The ion source of claim 17 , wherein the plasma is generated using an RF ion source.

Assignees

• Applied Materials Inc

Inventors

• Becker Klaus
• Alvarado Daniel
• St Peter Michael
• Wright Graham

Classifications

• H01J37/3435

  Target holders (includes backing plates and endblocks) · CPC title

• H01J37/08 Primary

  Ion sources; Ion guns · CPC title

• H01J2237/081

  Sputtering sources · CPC title

• H01J37/32055

  Arc discharge · CPC title

• H01J37/3438

  Electrodes other than cathode · CPC title