Random copolymer and pinning composition comprising the same

Patent metadata

Field	Value
Publication number	US-12006384-B2
Application number	US-201816652565-A
Country	US
Kind code	B2
Filing date	Oct 29, 2018
Priority date	Oct 27, 2017
Publication date	Jun 11, 2024
Grant date	Jun 11, 2024

Abstract

The present application relates to a pinning composition, a laminate comprising the same, and a method for producing the same. The pinning composition of the present application can impart directionality and location selection properties to a polymer membrane comprising a self-assembly structure of a block copolymer. The pinning composition of the present application exhibits excellent reaction selectivity, whereby it can form a vertical lamella structure with a high degree of alignment. In addition, the pinning composition of the present application may be suitable for application to low temperature processes.

First claim

The invention claimed is:

1. A random copolymer comprising a unit represented by Formula 1 below and a unit represented by Formula 3-1 or 4 below:

wherein, in Formula 1, R is hydrogen or an alkyl group, A is an oxygen atom, a sulfur atom, —S(═O) 2 —, a carbonyl group, —C(═O)—X 1 — or —X 1 —C(═O)—, where X 1 is an oxygen atom or a sulfur atom, B is an alkylene group, an alkenylene group or an alkynylene group, and C is represented by Formula 2 below,

wherein, L is a single bond or an oxygen atom,

wherein, in Formula 3-1, R is hydrogen or an alkyl group, X is a single bond, R 1 to R 5 are each independently hydrogen, an alkyl group, a haloalkyl group or a halogen atom, and at least one halogen atom is included in at least one of R 1 , R 2 , R 3 , R 4 , or R 5 ,

wherein, in Formula 4, R is hydrogen or an alkyl group, and X is a single bond, an oxygen atom, —S(═O) 2 —, a carbonyl group, an alkylene group, an alkenylene group, an alkynylene group, —C(═O)—X 1 ′—, or —X 1 ′—C(═O)—, where X 1 ′ is an oxygen atom, a sulfur atom, an alkylene group, an alkenylene group or an alkynylene group, and Y is a monovalent substituent including a ring structure to which a linear chain having eight or more chain-forming atoms is linked.

2. The random copolymer according to claim 1 , wherein in Formula 3-1, at least one fluorine atom is included in at least one of R 1 , R 2 , R 3 , R 4 , or R 5 .

3. The random copolymer according to claim 1 , wherein in Formula 4, the ring structure of Y is an aromatic ring structure or an alicyclic ring structure.

4. The random copolymer according to claim 1 , wherein the unit represented by Formula 3-1 or 4 is contained in the entire random copolymer in a ratio of 80 wt % to 99.9 wt %.

5. The random copolymer according to claim 1 , which the unit represented by Formula 1 is contained in an amount of 1 part by weight to 30 parts by weight relative to 100 parts by weight of the unit represented by Formula 3-1 or 4.

6. A pinning composition comprising the random copolymer of claim 1 .

7. The pinning composition according to claim 6 , wherein the random copolymer is contained in a ratio of 0.1 wt % to 20 wt %.

8. A substrate comprising a base layer; and a pinning layer present on the surface of the base layer, wherein the pinning layer comprises the random copolymer of claim 1 .

9. The substrate according to claim 8 , wherein the pinning layer forms a stripe pattern on the surface of the base layer.

10. The substrate according to claim 8 , further comprising a neutral layer present on the surface of the base layer, wherein the neutral layer and the pinning layer form alternately repeated stripe patterns.

11. The substrate according to claim 8 , further comprising a polymer membrane formed on the pinning layer or the pinning layer and the neutral layer, wherein the polymer membrane comprises a block copolymer including a first block and a second block different from the first block.

12. The substrate according to claim 11 , wherein the block copolymer forms a sphere, cylinder, gyroid or lamella structure.

13. The substrate according to claim 11 , wherein the first block or the second block of the block copolymer comprises the unit of Formula 3 or the unit of Formula 4.

14. A method for producing a patterned substrate comprising a step of coating the pinning composition of claim 6 on a base layer and annealing it at a temperature of less than 130° C. to form a pinning layer.

15. The method for producing a patterned substrate according to claim 14 , wherein a neutral layer is formed on the base layer to be annealed.

16. The method for producing a patterned substrate according to claim 14 , further comprising a step of forming a polymer membrane, which comprises a block copolymer including a first block and a second block different from the first block, in a self-assembled state on the pinning layer.

17. The method for producing a patterned substrate according to claim 16 , further comprising a step of selectively removing the first block or the second block of the block copolymer from the polymer membrane.

18. The substrate according to claim 10 , wherein the neutral layer comprises a random copolymer including a unit represented by Formula 3 below and a unit represented by Formula 4 below:

wherein, in Formula 3 and 4, R is hydrogen or an alkyl group, and X is a single bond, an oxygen atom, —S(═O) 2 —, a carbonyl group, an alkylene group, an alkenylene group, an alkynylene group, —C(═O)—X 1 ′—, or —X 1 ′—C(═O)—, where X 1 ′ is an oxygen atom, a sulfur atom, an alkylene group, an alkenylene group or an alkynylene group, and in Formula 3, W is an aryl group containing at least one halogen atom, and in Formula 4, Y is a monovalent substituent including a ring structure to which a linear chain having eight or more chain-forming atoms is linked.

19. The substrate according to claim 18 , wherein the random copolymer contained in the neutral layer comprises the unit represented by Formula 4 in a ratio of 9 mol% to 32 mol%.

20. The substrate according to claim 18 , wherein the ratio (B/A) of the mole number (B) of the unit represented by Formula 3 to the mole number (A) of the unit represented by Formula 4 is in a range of 2 to 10.

Assignees

• Lg Chemical Ltd

Inventors

• Ku Se Jin
• Lee Mi Sook
• Kang na na
• Lee Eung Chang
• Yoon Sung Soo
• Park No Jin
• Lee Je Gwon
• Choi Eun Young
• Ryu Hyung Ju
• Hur Yoon Hyung

Classifications

• H10P76/20

  of masks comprising organic materials · CPC title

• C08F220/325

  containing glycidyl radical, e.g. glycidyl (meth)acrylate · CPC title

• C08F220/301

  and one oxygen in the alcohol moiety · CPC title

• C09D153/00

  Coating compositions based on block copolymers containing at least one sequence of a polymer obtained by reactions only involving carbon-to-carbon unsaturated bonds; Coating compositions based on derivatives of such polymers · CPC title

• C09D133/20

  Homopolymers or copolymers of acrylonitrile (C09D155/02 takes precedence) · CPC title