Metal surface protection

US11857997B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-11857997-B2
Application numberUS-202016905463-A
CountryUS
Kind codeB2
Filing dateJun 18, 2020
Priority dateJun 18, 2020
Publication dateJan 2, 2024
Grant dateJan 2, 2024

How to read this patent

A practical reading order for non-experts. Skip the full description unless you need deep technical detail.

  1. Title

    What the patent document calls the invention.

  2. Abstract

    A short plain-language summary of the technical disclosure.

  3. Assignees and inventors

    Who owns or filed the patent and who is credited as inventor.

  4. Key dates

    Filing, priority, publication, and grant dates set the timeline.

  5. First independent claim

    The legal scope of protection — read this for what is actually claimed.

  6. CPC / IPC classifications

    Technology tags used to group this patent with similar filings.

  7. Citations and related patents

    Prior art links and similar publications in this corpus.

Abstract

Official abstract text for this publication.

Techniques regarding methods and/or apparatuses for protecting metal substrates during one or more lithography processes are provided. For example, one or more embodiments described herein can comprise a method that can include coating a metal substrate with a polymer film that self-assembles on a metal oxide positioned on a surface of the metal substrate. The method can also include covalently bonding the polymer film to the metal oxide.

First claim

Opening claim text (preview).

What is claimed is: 1. A method, comprising: providing a metal substrate having a plurality of metal oxide surfaces native to the metal substrate and positioned at multiple, non-continous locations of surfaces on the metal substrate, wherein the metal substrate has a thickness between 20 nanometers and 5 micrometers; coating the metal oxide surfaces with a polymer film that self-assembles one or more layers on the metal oxide surfaces, wherein the coating is performed via immersion of the metal oxide surfaces in an aqueous solution comprising the polymer film; covalently bonding the polymer film to the plurality of metal oxide surfaces by heating the metal substrate and the plurality of metal oxide surfaces on a hot plate at a temperature greater than or equal to 100 degrees Celsius and less than or equal to 140 degrees Celsius for between one and five minutes, and wherein the heating evaporates one or more solvents or surfactants from the aqueous solutions and catalyzes one or more interactions between the polymer film and the plurality of the metal oxide surfaces. 2. The method of claim 1 , wherein the polymer film comprises an organic polymer comprising at least one functional group selected from the group consisting of: a pendant phosphonic acid group, a hydroxamic acid group, and a carboxylic acid group. 3. The method of claim 2 , wherein the organic polymer is selected from the group consisting of poly(styrenephosphonic) acid and poly(vinylphosphonic acid). 4. The method of claim 1 , wherein the polymer film comprises an organic co-polymer comprising at least one functional group selected from the group consisting of: a pendant phosphonic acid group, a hydroxamic acid group, and a carboxylic acid group. 5. The method of claim 4 , wherein the organic co-polymer is-co-poly(styrene-vinylphosphonic acid). 6. The method of claim 1 , wherein the polymer film is comprised within an aqueous solution that further includes a solvent and co-polymers, wherein the heating removes the solvent from the plurality of metal oxide surfaces, and wherein the metal oxide surfaces are between 1 nanometer and 3 nanometers thick. 7. The method of claim 1 , further comprising: applying, after the coating and the heating, a lithography process to the polymer film, and wherein the polymer film protects the metal substrate from chemically reacting with a base compound of the lithography process. 8. The method of claim 7 , wherein the polymer film protects at least a portion of the metal substrate from reacting with a basic solution of the lithography process.

Assignees

Inventors

Classifications

  • B05D1/18Primary

    performed by dipping · CPC title

  • Spin coating · CPC title

  • performed by spraying · CPC title

  • Pretreatment for allowing a non-conductive substrate to be electrostatically coated · CPC title

  • Pretreatment · CPC title

Patent family

Related publications grouped by family.

External sources

Frequently asked questions

Answers are generated from the same data shown on this page.

What does patent US11857997B2 cover?
Techniques regarding methods and/or apparatuses for protecting metal substrates during one or more lithography processes are provided. For example, one or more embodiments described herein can comprise a method that can include coating a metal substrate with a polymer film that self-assembles on a metal oxide positioned on a surface of the metal substrate. The method can also include covalently…
Who is the assignee on this patent?
IBM
What technology area does this patent fall under?
Primary CPC classification B05D1/18. Mapped technology areas include Operations & Transport.
When was this patent published?
Publication date Tue Jan 02 2024 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 4 related publications on this page (citations in our corpus or others sharing the same primary CPC).