Dynamic precursor dosing for atomic layer deposition

Patent metadata

Field	Value
Publication number	US-11970772-B2
Application number	US-202117451534-A
Country	US
Kind code	B2
Filing date	Oct 20, 2021
Priority date	Aug 22, 2014
Publication date	Apr 30, 2024
Grant date	Apr 30, 2024

Abstract

Methods and apparatuses for controlling precursor flow in a semiconductor processing tool are disclosed. A method may include flowing gas through a gas line, opening an ampoule valve(s), before a dose step, to start a flow of precursor from the ampoule to a process chamber through the gas line, closing the ampoule valve(s) to stop the precursor from flowing out of the ampoule, opening a process chamber valve, at the beginning of the dose step, to allow the flow of precursor to enter the process chamber, and closing the process chamber valve, at the end of the dose step, to stop the flow of precursor from entering the process chamber. A controller may include at least one memory and at least one processor and the at least one memory may store instructions for controlling the at least one processor to control precursor flow in a semiconductor processing tool.

First claim

What is claimed is:

1. A method for controlling precursor delivery in a semiconductor processing tool, the method comprising:
(a) starting a flow of a precursor from a precursor source to a process chamber before a dose step by an amount of time that is substantially equal to a line charge time, wherein the line charge time is the time required for precursor to flow from the precursor source to the process chamber;
(b) stopping the precursor from flowing out of the precursor source;
(c) opening a process chamber valve, at the beginning of the dose step, to allow the flow of precursor to enter the process chamber; and
(d) closing the process chamber valve, at the end of the dose step, to stop the flow of precursor from entering the process chamber,
wherein, prior to (a), a gas flows through a gas line without the presence of the precursor, and wherein, during (a), the gas flows to cause the precursor to move through the gas line to the processing chamber.

2. The method of claim 1 , wherein the precursor is in a liquid state.

3. The method of claim 1 , wherein the precursor is in a vapor state.

4. The method of claim 1 , wherein the gas comprises one or more of:
an inert gas or a non-inert gas.

5. The method of claim 1 , wherein the precursor comprises one or more materials for depositing a layer of a metal, an oxide, silicon, and a silicon dioxide.

6. A method for controlling precursor flow in a semiconductor processing tool, the method comprising:
(a) prior to (b), flowing gas through a gas line;
(b) opening one or more valves of an ampoule, before a process step during which precursor is delivered to a wafer in a process chamber by an amount of time that is substantially equal to a line charge time, to start a flow of precursor from the ampoule to the process chamber through the gas line, wherein the line charge time is the time required for precursor to flow from the ampoule to the process chamber;
(c) closing the one or more valves of the ampoule to stop the precursor from flowing out of the ampoule;
(d) opening a process chamber valve, at the beginning of the process step during which precursor is delivered to the wafer in the process chamber, to allow the flow of precursor to enter the process chamber; and
(e) closing the process chamber valve, at the end of the process step during which precursor is delivered to the wafer in the process chamber, to stop the flow of precursor from entering the process chamber,
wherein, during (b), the gas flows to cause the precursor to move through the gas line to the processing chamber.

7. The method of claim 6 , wherein the process step comprises adsorption of the precursor on the wafer.

8. The method of claim 6 , wherein the process step comprises conversion of the precursor to a film or layer.

9. The method of claim 8 , wherein the process step further comprises using a plasma to activate a reaction of the precursor.

10. The method of claim 8 , wherein:
the process step further comprises flowing a second process gas to the process chamber, and
the second process gas causes activation of a reaction of the precursor.

Assignees

• Lam Res Corp

Inventors

• Kumar Purushottam
• Lavoie Adrien
• Qian Jun
• Kang Hu
• Karim Ishtak
• Ou Fung Suong

Classifications

• H10P14/6339

  deposition by cyclic CVD, e.g. ALD, ALE or pulsed CVD · CPC title

• H10P14/43

  Chemical deposition, e.g. chemical vapour deposition [CVD] · CPC title

• H10P14/24

  using chemical vapour deposition [CVD] · CPC title

• C23C16/45527 Primary

  characterized by the ALD cycle, e.g. different flows or temperatures during half-reactions, unusual pulsing sequence, use of precursor mixtures or auxiliary reactants or activations · CPC title

• C23C16/45561

  Gas plumbing upstream of the reaction chamber · CPC title