Three-terminal electro-chemical memory cell with vertical structure for neuromorphic computation and memory cell array including the same

US11963372B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-11963372-B2
Application numberUS-202117469372-A
CountryUS
Kind codeB2
Filing dateSep 8, 2021
Priority dateMay 18, 2021
Publication dateApr 16, 2024
Grant dateApr 16, 2024

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

Disclosed is a three-terminal electro-chemical memory cell with a vertical structure for neuromorphic computation, including a circumferential hole, first and second conductive electrode layers sequentially stacked along an outer surface of the circumferential hole, an electrolyte layer formed along an inner surface of the circumferential hole and connected to one end of each of the first and second conductive electrode layers, and a gate electrode disposed parallel to the electrolyte layer in an inner surface direction of the circumferential hole.

First claim

Opening claim text (preview).

What is claimed is: 1. A three-terminal electro-chemical memory device with a vertical structure for neuromorphic computation, comprising: a circumferential hole; first and second conductive electrode layers sequentially stacked along an outer surface of the circumferential hole; an electrolyte layer formed along an inner surface of the circumferential hole and connected to one end of each of the first and second conductive electrode layers; a gate electrode layer disposed parallel to the electrolyte layer in an inner surface direction of the circumferential hole; and an insulator filled in an inner surface of the gate electrode layer. 2. The three-terminal electro-chemical memory cell of claim 1 , wherein the first and second conductive electrode layers constitute a disk shape in contact with the outer surface of the circumferential hole, and are spaced apart through another insulator. 3. The three-terminal electro-chemical memory cell of claim 1 , wherein the electrolyte layer is formed as a circumferential surface inside a circumferential channel layer in contact with the inner surface of the circumferential hole. 4. The three-terminal electro-chemical memory cell of claim 3 , further comprising: an ion reservoir layer in contact with the inner surface of the electrolyte layer and formed as the circumferential surface. 5. The three-terminal electro-chemical memory cell of claim 4 , wherein the ion reservoir layer is made of Mo oxide. 6. A three-terminal electro-chemical memory cell with a vertical structure for neuromorphic computation, comprising: a circumferential hole; first and second conductive electrode layers sequentially stacked along an outer surface of the circumferential hole; a channel layer formed along an inner surface of the circumferential hole and connected to one end of each of the first and second conductive electrode layers; and a gate electrode layer disposed parallel to the channel layer in an inner surface direction of the circumferential hole; and an insulator filled in an inner surface of the gate electrode layer. 7. The three-terminal electro-chemical memory cell of claim 6 , wherein the first and second conductive electrode layers constitute a disk shape in contact with the outer surface of the circumferential hole, and are spaced apart through another insulator. 8. The three-terminal electro-chemical memory cell of claim 6 , wherein the channel layer is formed between the inner surface of the circumferential hole and an outer surface of an electrolyte layer formed as a circumferential surface. 9. The three-terminal electro-chemical memory cell of claim 8 , further comprising: an ion reservoir layer in contact with the inner surface of the electrolyte layer and formed as the circumferential surface. 10. The three-terminal electro-chemical memory cell of claim 9 , wherein the ion reservoir layer is made of Mo oxide. 11. A circumferential three-terminal memory cell with a vertical structure for neuromorphic computation, comprising: a channel layer, an electrolyte layer, and a gate electrode layer sequentially forming a circumferential surface toward an inside; first and second conductive electrode layers sequentially stacked in a disk shape on an outside of the circumferential surface; and an insulator filled in an inner surface of the gate electrode layer. 12. An array of three-terminal memory cell with a vertical structure for neuromorphic computation, comprising: a channel layer, an electrolyte layer, and a gate electrode layer sequentially forming a circumferential surface toward an inside; first and second conductive electrode layers sequentially stacked in a disk shape on an outside of the circumferential surface; a drain line connected to the first conductive electrode layer; a source line connected to the second conductive electrode layer; a gate line connected to the gate electrode layer; and an insulator filled in an inner surface of the gate electrode layer.

Assignees

Inventors

Classifications

  • H10B63/845Primary

    the switching components being connected to a common vertical conductor · CPC title

  • using electronic means · CPC title

  • of the vertical channel field-effect transistor type · CPC title

  • based on migration or redistribution of ionic species, e.g. anions, vacancies · CPC title

  • H10B63/84Primary

    arranged in a direction perpendicular to the substrate, e.g. 3D cell arrays · CPC title

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What does patent US11963372B2 cover?
Disclosed is a three-terminal electro-chemical memory cell with a vertical structure for neuromorphic computation, including a circumferential hole, first and second conductive electrode layers sequentially stacked along an outer surface of the circumferential hole, an electrolyte layer formed along an inner surface of the circumferential hole and connected to one end of each of the first and s…
Who is the assignee on this patent?
Seoul Nat Univ R&Db Foundation
What technology area does this patent fall under?
Primary CPC classification H10B63/845. Mapped technology areas include Electricity.
When was this patent published?
Publication date Tue Apr 16 2024 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 2 related publications on this page (citations in our corpus or others sharing the same primary CPC).