IC including capacitor having segmented bottom plate

US11961879B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-11961879-B2
Application numberUS-202318309999-A
CountryUS
Kind codeB2
Filing dateMay 1, 2023
Priority dateAug 23, 2021
Publication dateApr 16, 2024
Grant dateApr 16, 2024

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

An IC includes a substrate including circuitry configured to provide a receiver or a transmitter circuit. A metal stack is over the semiconductor surface including a top metal layer and a plurality of lower metal layers. An isolation capacitor includes the top metal layer as a top plate that is electrically connected to a first node; and a top dielectric layer on the top plate with a top plate dielectric aperture. One of the plurality of lower metal layers provides a bottom plate that includes a plurality of spaced apart segments. A capacitor dielectric layer is between the top and bottom plate. The segments include a first segment electrically connected to a second node and at least a second segment electrically connected to a third node, with separation regions located between adjacent spaced apart segments. The top plate covers at least a portion of each of the separation regions.

First claim

Opening claim text (preview).

What is claimed is: 1. A method of forming an integrated circuit (IC), comprising: forming stacked metal layers on a semiconductor substrate including circuitry with nodes, the stacked metal layers including a first metal layer and a second metal layers located under the first metal layer; and forming a segmented isolation capacitor, including: forming a bottom plate of the segmented isolation capacitor based on the second metal layer, the bottom plate including a plurality of spaced apart segments, wherein a first segment of the plurality of spaced apart segments is electrically connected to a first node of the nodes, and wherein a second segment of the plurality of spaced apart segments is electrically connected to a second node of the nodes; forming a capacitor dielectric layer of the segmented isolation capacitor over the bottom plate; and forming a top plate of the segmented isolation capacitor based on the first metal layer, the top plate covering at least a portion of the plurality of spaced apart segments, wherein the top plate is electrically connected to a third node of the nodes. 2. The method of claim 1 , wherein the IC further comprises another isolation capacitor. 3. The method of claim 1 , further comprising: forming an isolation ring based on the second metal layer, the isolation ring surrounding the plurality of spaced apart segments, wherein the isolation ring is electrically connected to a ground of the IC. 4. The method of claim 1 , further comprising: forming a top dielectric layer over the top plate, wherein the top dielectric layer includes an aperture exposing a portion of the top plate. 5. The method of claim 4 , wherein the top dielectric layer comprises a first dielectric layer on a second dielectric layer. 6. The method of claim 1 , wherein the first metal layer corresponds to a topmost metal layer of the stacked metal layers. 7. The method of claim 1 , wherein the circuitry includes a receiver circuit or a transmitter circuit. 8. A method, comprising: forming a bottom plate of a segmented capacitor using a first metal layer over a semiconductor substrate including circuitry with nodes, wherein: the bottom plate includes a plurality of spaced apart segments; a first segment of the plurality of spaced apart segments is electrically connected to a first node of the nodes; and a second segment of the plurality of spaced apart segments is electrically connected to a second node of the nodes; forming a dielectric layer of the segmented capacitor over the bottom plate; and forming a top plate of the segmented capacitor over the dielectric layer using a second metal layer, wherein: the top plate is electrically connected to a third node of the nodes; and the top plate covers at least a portion of the plurality of spaced apart segments. 9. The method of claim 8 , wherein forming the bottom plate includes forming an isolation ring using the first metal layer, wherein: the isolation ring surrounds the plurality of spaced apart segments; and the isolation ring is electrically connected to a ground of the circuitry. 10. The method of claim 8 , wherein the second metal layer is a topmost metal layer of a plurality of metal layers over the semiconductor substrate. 11. The method of claim 8 , wherein the dielectric layer includes a first dielectric layer on a second dielectric layer. 12. The method of claim 8 , wherein the dielectric layer is a first dielectric layer, the method further comprising: forming a second dielectric layer over the top plate, wherein the second dielectric layer includes an aperture exposing a portion of the top plate. 13. The method of claim 8 , wherein the segmented capacitor is a first capacitor, the method further comprising forming a second capacitor over the semiconductor substrate. 14. The method of claim 8 , wherein the circuitry includes a receiver circuit or a transmitter circuit. 15. The method of claim 8 , wherein at least two adjacent segments of the plurality of spaced apart segments are separated by a gap ranging between 0.5 μm to 5 μm. 16. The method of claim 8 , wherein the segmented capacitor has a total capacitance of 10 to 1,000 fF. 17. The method of claim 8 , wherein a thickness of the dielectric layer is at least 4 μm. 18. The method of claim 8 , wherein the dielectric layer includes silicon dioxide. 19. The method of claim 8 , further comprising: connecting a bond wire between the top plate and a pin external to the semiconductor substrate. 20. The method of claim 19 , further comprising: encapsulating the semiconductor substrate, the segmented capacitor, and the bond wire using a mold compound.

Assignees

Inventors

Classifications

  • Die-attach connectors and bond wires · CPC title

  • between a chip and a stacked lead frame, conducting package substrate or heat sink · CPC title

  • between laterally-adjacent chips · CPC title

  • relative to the surface, e.g. recessed, protruding · CPC title

  • Bond pads specially adapted therefor · CPC title

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What does patent US11961879B2 cover?
An IC includes a substrate including circuitry configured to provide a receiver or a transmitter circuit. A metal stack is over the semiconductor surface including a top metal layer and a plurality of lower metal layers. An isolation capacitor includes the top metal layer as a top plate that is electrically connected to a first node; and a top dielectric layer on the top plate with a top plate …
Who is the assignee on this patent?
Texas Instruments Inc
What technology area does this patent fall under?
Primary CPC classification H10W20/496. Mapped technology areas include Electricity.
When was this patent published?
Publication date Tue Apr 16 2024 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 9 related publications on this page (citations in our corpus or others sharing the same primary CPC).