Support unit and substrate treating apparatus including the same

Patent metadata

Field	Value
Publication number	US-11961748-B2
Application number	US-202117380339-A
Country	US
Kind code	B2
Filing date	Jul 20, 2021
Priority date	Jul 24, 2020
Publication date	Apr 16, 2024
Grant date	Apr 16, 2024

Abstract

A support unit for supporting a substrate includes a heating member and a reflector, and the reflector includes a curved surface that reflects thermal energy generated by the heating member toward an edge region of the substrate.

First claim

What is claimed is:

1. A support apparatus for supporting a substrate, the support apparatus comprising:
a plurality of heating lamps; and
a reflector,
wherein the reflector includes a curved surface configured to reflect thermal energy generated by at least one of the heating lamps toward an edge region of the substrate,
wherein the reflector includes:
a base disposed under the plurality of heating lamps; and
a protrusion protruding upward from the base,

wherein the protrusion includes the curved surface,
wherein the protrusion is arranged between an outermost heating lamp and an adjacent heating lamp to the outermost heating lamp,
and
wherein the curved surface is configured to face a perimeter of the substrate,
wherein the protrusion includes:
a first protrusion including a first curved surface configured to reflect the thermal energy toward a first position on the edge region of the substrate; and
a second protrusion including a second curved surface configured to reflect the thermal energy toward a second position on the edge region of the substrate, the second position being different from the first position.

2. The support apparatus of claim 1 , wherein the curved surface forms part of a virtual ellipse when the support apparatus is viewed from a front side view.

3. The support apparatus of claim 2 , wherein the virtual ellipse has a first focal point and a second focal point, and
wherein the outermost heating lamp is located to overlap one of the first focal point and the second focal point when viewed from the front side view.

4. The support apparatus of claim 3 , wherein the edge region of the substrate overlaps the other one of the first focal point and the second focal point when viewed from the front side view.

5. The support apparatus of claim 1 , wherein the adjacent heating lamp to the outermost heating lamp is a lamp closest to the outermost heating lamp.

6. The support apparatus of claim 5 , wherein at least some of the plurality of heating lamps have ring shapes with different radii and are concentric with one another.

7. The support apparatus of claim 6 ,
wherein the base and the protrusion includes the curved surface.

8. The support apparatus of claim 1 , wherein the first curved surface forms part of a first virtual ellipse when viewed from a front side view, and
wherein the second curved surface, when viewed from the front side view, forms part of a second virtual ellipse having different focal points from the first virtual ellipse.

9. The support apparatus of claim 8 , wherein the support apparatus further comprises:
a chuck configured to support the substrate; and
a spin actuator configured to rotate the chuck.

10. The support apparatus of claim 9 , wherein the reflector and the plurality of heating lamps are independent from rotation of the chuck.

11. An apparatus for treating a substrate, the apparatus comprising:
a support plate configured to support the substrate; and
a liquid supplier configured to dispense a treatment liquid onto the substrate supported on the support plate,
wherein the support plate includes:
a chuck configured to support the substrate;
a plurality of heating lamps configured to emit light to heat the substrate supported on the chuck; and
a reflector,
wherein the reflector includes a curved surface configured to reflect the light generated by at least one of the heating lamps towards an edge region of the substrate supported on the chuck,
wherein the reflector includes:
a base disposed under the heating lamps; and
a protrusion protruding upward from the base,

wherein the protrusion includes the curved surface,
wherein the protrusion is arranged between an outermost heating lamp and an adjacent heating lamp to the outermost heating lamp, and
wherein the curved surface is configured to face a perimeter of the substrate,
wherein the protrusion includes:
a first protrusion including a first curved surface configured to reflect thermal energy toward a first position on the edge region of the substrate; and
a second protrusion including a second curved surface configured to reflect the thermal energy toward a second position on the edge region of the substrate, the second position being different from the first position.

12. The apparatus of claim 11 , wherein the curved surface forms part of a virtual ellipse when viewed from a front side view of the support plate.

13. The apparatus of claim 12 , wherein the virtual ellipse has a first focal point and a second focal point,
wherein the center of the outermost heating lamp overlaps one of the first focal point and the second focal point when viewed from the front side view, and
wherein the edge region of the substrate supported on the chuck overlaps the other one of the first focal point and the second focal point when viewed from the front side view.

14. The apparatus of claim 13 ,
wherein the base and the protrusions each include the curved surface.

15. The apparatus of claim 13 , wherein the treatment liquid includes a chemical to etch a film on the substrate, and
wherein the reflector is formed of a material containing at least one of aluminum, copper, quartz, gold, or silver.

16. An apparatus for treating a substrate, the apparatus comprising:
a support plate configured to support the substrate; and
a liquid supplier configured to dispense a treatment liquid onto the substrate supported on the support plate,
wherein the support plate includes:
a chuck configured to support the substrate;
a plurality of heating lamps provided inside the chuck and configured to emit light to heat the substrate supported on the chuck; and
a reflector configured to reflect the light toward an edge region of the substrate,
wherein the reflector includes a curved surface configured to form part of a virtual ellipse having a first focal point and a second focal point, when viewed from a front side view of the support plate,
wherein the reflector includes:
a base disposed under the plurality of heating lamps; and
a protrusion protruding upward from the base,
wherein the protrusion includes the curved surface and the curved surface is configured to face a perimeter of the substrate,
wherein the protrusion is arranged between an outermost heating lamp and an adjacent heating lamp to the outermost heating lamp,
wherein the first focal point is in agreement with the center of the outermost heating lamp when viewed from the front side view, and
wherein the second focal point, when viewed from the front side view, overlaps the edge region of the substrate supported on the chuck,
wherein the protrusion includes:
a first protrusion including a first curved d surface configured to reflect thermal energy toward a first position on the edge region of the substrate; and
a second protrusion including a second curved surface configured to reflect the thermal energy toward a second position on the edge region of the substrate, the second position being different from the first position.

17. The apparatus of claim 16 ,
wherein the first protrusion and the second protrusion protruding upward from the base and including the curved surface together with the base,
wherein the first protrusion and the second protrusion have an arc shape, and
wherein the first and the second protrusion are spaced apart from each other to form a circular shape when viewed from above.

18. The apparatus of claim 17 , wherein the curved surfaces reflect the light toward different positions on the substrate supported on the support

Assignees

• Semes Co Ltd

Inventors

• Yun Kangseop
• Lee Youngil
• Choi Jungbong

Classifications

• H10P72/7604

  the wafers being placed on a susceptor, stage or support · CPC title

• H10P72/0424

  using mainly spraying means, e.g. nozzles · CPC title

• H10P72/0436 Primary

  mainly by radiation · CPC title

• H10P72/7608

  characterised by a plurality of separate clamping members, e.g. clamping fingers · CPC title

• H10P72/0406

  for cleaning followed by drying, rinsing, stripping, blasting or the like · CPC title